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Patent
D842824
Priority
Aug 09 2017
Filed
Jan 30 2018
Issued
Mar 12 2019
Expiry
Mar 12 2034
Assg.orig
Entity
unknown
3
37
n/a
The ornamental design for a reaction tube , as shown and described.
FIG. 1 is a front, top and right side perspective view of a reaction tube showing my new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross sectional view take along line 8 -8 in FIG. 2 thereof;
FIG. 9 is a cross sectional view take along line 9 -9 in FIG. 4 thereof; and,
FIG. 10 is an enlarged cross sectional view taken along line 10 -10 in FIG. 2 .
Sato, Akihiro
Patent
Priority
Assignee
Title
4950870 ,
Nov 21 1987
Tokyo Electron Limited
Heat-treating apparatus
5618349 ,
Jul 24 1993
Yamaha Corporation
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
5948300 ,
Sep 12 1997
Kokusai Semiconductor Equipment Corporation
Process tube with in-situ gas preheating
5968593 ,
Mar 20 1995
KOKUSAI ELECTRIC CO , LTD
Semiconductor manufacturing apparatus
6251189 ,
Feb 18 1999
KOKUSAI ELECTRIC CORPORATION
Substrate processing apparatus and substrate processing method
6402849 ,
Mar 17 2000
Samsung Electronics Co., Ltd.
Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device
7311520 ,
Sep 24 2002
Tokyo Electron Limited
Heat treatment apparatus
20030221779 ,
20070098605 ,
20080083372 ,
20090194521 ,
20090250005 ,
D404368 ,
Aug 20 1997
Tokyo Electron Limited
Outer tube for use in a semiconductor wafer heat processing apparatus
D405062 ,
Aug 20 1997
Tokyo Electron Limited
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D405429 ,
Jan 31 1997
Tokyo Electron Limited
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D405431 ,
Aug 20 1997
Tokyo Electron Limited
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D406113 ,
Jan 31 1997
Tokyo Electron Limited
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D417438 ,
Jan 31 1997
Tokyo Electron Limited
Quartz outer tube
D423463 ,
Jan 31 1997
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D424024 ,
Jan 31 1997
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D521464 ,
Nov 04 2003
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D521465 ,
Nov 04 2003
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D586768 ,
Oct 12 2006
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D600659 ,
Sep 12 2006
Tokyo Electron Limited
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D610559 ,
May 30 2008
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Reaction tube
D611013 ,
Mar 28 2008
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D618638 ,
May 09 2008
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D711843 ,
Jun 28 2013
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D719114 ,
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D724551 ,
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D725055 ,
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D739832 ,
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D770993 ,
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D772824 ,
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D778458 ,
Feb 23 2015
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D791090 ,
Sep 04 2015
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D800080 ,
Mar 30 2016
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Date
Maintenance Fee Events
n/a
Date
Maintenance Schedule
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