Patent
   D423463
Priority
Jan 31 1997
Filed
Jul 24 1997
Issued
Apr 25 2000
Expiry
Apr 25 2014
Assg.orig
Entity
unknown
25
4
n/a
The ornamental design for a quartz process tube, as shown.

FIG. 1 a perspective view of a quartz process tube.

FIG. 2 a front elevational view thereof.

FIG. 3 a top plan view thereof.

FIG. 4 a bottom plan view thereof.

FIG. 5 a cross sectional view thereof taken along line 5--5 in FIG. 2.

FIG. 6 a rear elevational view thereof.

FIG. 7 a left side view thereof.

FIG. 8 a right side view thereof.

FIG. 9 a cross sectional view thereof taken along line 9--9 in FIG. 3; and,

FIG. 10 a cross sectional view thereof taken along line 10--10 in FIG. 3.

Watanabe, Shingo, Hanagata, Testuya

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Patent Priority Assignee Title
5303671, Feb 07 1992 Tokyo Electron Limited System for continuously washing and film-forming a semiconductor wafer
5458685, Aug 12 1992 Tokyo Electron Limited Vertical heat treatment apparatus
5520742, Mar 03 1993 Tokyo Electron Limited Thermal processing apparatus with heat shielding member
5536918, Aug 16 1991 Tokyo Electron Limited Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jul 24 1997Tokyo Electron Limited(assignment on the face of the patent)
Nov 07 1997HANAGATA, TETSUYATokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0088020990 pdf
Nov 07 1997WATANABE, SHINGOTokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0088020990 pdf
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