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Patent
D790490
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Priority
Sep 04 2015
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Filed
Mar 02 2016
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Issued
Jun 27 2017
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Expiry
Jun 27 2032
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Assg.orig
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Entity
unknown
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4
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28
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n/a
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The ornamental design for a reaction tube, as shown and described.
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FIG. 1 is a rear, top, and left side perspective view of a reaction tube showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross sectional view take along line 8-8 in FIG. 2 thereof;
FIG. 9 is a cross sectional view take along line 9-9 in FIG. 2 thereof;
FIG. 10 is a cross sectional view view taken along line 10-10 in FIG. 5; and,
FIG. 11 is a cross sectional view view taken along line 11-11 in FIG. 5.
The dashed-dot-dashed lines represent the boundary lines of the claimed design.
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.
Takewaki, Motoya, Osaka, Akihiro, Yamaguchi, Hideto
Patent |
Priority |
Assignee |
Title |
4950870, |
Nov 21 1987 |
Tokyo Electron Limited |
Heat-treating apparatus |
5948300, |
Sep 12 1997 |
Kokusai Semiconductor Equipment Corporation |
Process tube with in-situ gas preheating |
6251189, |
Feb 18 1999 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and substrate processing method |
20030221779, |
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20080083372, |
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20090194521, |
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20090250005, |
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D405062, |
Aug 20 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
D405429, |
Jan 31 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
D405431, |
Aug 20 1997 |
Tokyo Electron Limited |
Tube for use in a semiconductor wafer heat processing apparatus |
D406113, |
Jan 31 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
D417438, |
Jan 31 1997 |
Tokyo Electron Limited |
Quartz outer tube |
D423463, |
Jan 31 1997 |
Tokyo Electron Limited |
Quartz process tube |
D424024, |
Jan 31 1997 |
Tokyo Electron Limited |
Quartz process tube |
D586768, |
Oct 12 2006 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D600659, |
Sep 12 2006 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D610559, |
May 30 2008 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D611013, |
Mar 28 2008 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D618638, |
May 09 2008 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D619630, |
May 08 2007 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D711843, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D719114, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D720707, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D725053, |
Nov 18 2011 |
Tokyo Electron Limited |
Outer tube for process tube for manufacturing semiconductor wafers |
D725055, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D739832, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D770993, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D772824, |
Feb 25 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a