Patent
   D655258
Priority
Oct 21 2010
Filed
Apr 13 2011
Issued
Mar 06 2012
Expiry
Mar 06 2026
Assg.orig
Entity
unknown
11
14
n/a
The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof; and,

FIG. 7 is a bottom view thereof.

Honma, Manabu, Hishiya, Katsuyuki

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 13 2011Tokyo Electron Limited(assignment on the face of the patent)
May 17 2011HONMA, MANABUTokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263590726 pdf
May 17 2011HISHIYA, KATSUYUKITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263590726 pdf
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