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Patent
D818447
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Priority
Apr 28 2017
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Filed
Apr 28 2017
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Issued
May 22 2018
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Expiry
May 22 2033
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Assg.orig
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Entity
unknown
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4
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22
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n/a
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The ornamental design for a plasma feedthrough flange, as shown and described.
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FIG. 1 is an isometric top view of a plasma feedthrough flange, showing my new design;
FIG. 2 is an isometric bottom view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a side view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is another side view thereof;
FIG. 7 is another side view thereof;
FIG. 8 is another side view thereof;
FIG. 9 is a cross sectional view taken along lines 9-9 of FIG. 5;
FIG. 10 is a cross sectional view taken along lines 10-10 of FIG. 5; and,
FIG. 11 is a cross sectional view taken along lines 11-11 of FIG. 3.
Shono, Eric Kihara
Patent |
Priority |
Assignee |
Title |
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Metal seal flange assembly |
5119395, |
Nov 09 1990 |
Gas Research Institute |
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Flange cap for high vacuum system |
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May 29 2012 |
ASM IP Holding B.V. |
Plasma power transfer rod for a semiconductor deposition apparatus |
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Feb 26 2016 |
HITACHI HIGH-TECH CORPORATION |
Upper chamber for a plasma processing apparatus |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a