Discharge chamber for a plasma processing apparatus

Abstract

Description

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application No. 29/610,995, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application No. 29/610,996, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application No. 29/610,998, filed herewith and entitled “Ring for a Plasma Processing Apparatus”; and

Application No. 29/610,999, filed herewith and entitled “Cover Ring for a Plasma Processing Apparatus”.

FIG. 1 is a front and left side perspective view of a discharge chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a rear elevational view of a discharge chamber for a plasma processing apparatus, rotated 180°;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view of a discharge chamber for a plasma processing apparatus, rotated 180°;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 1; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8.

Claims

The ornamental design for a discharge chamber for a plasma processing apparatus, as shown and described.