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I claim the ornamental design for exhaust ring for manufacturing semiconductors, as shown and described.
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FIG. 1 is a front/top perspective view of an exhaust ring for manufacturing semiconductors showing my new design;
FIG. 2 is a top plan view thereof, the bottom plan view being a mirror image and, therefore, not shown;
FIG. 3 is a front elevational view thereof, the left-side elevational view being a mirror image and, therefore, not shown;
FIG. 4 is a right-side elevational view thereof;
FIG. 5 is a rear elevational view thereof;
FIG. 6 is a reference front elevational view thereof;
FIG. 7 is a right-side cross-sectional view taken along line 7--7 in FIG. 6; and,
FIG. 8 is an enlarged, partial, cross-sectional view taken along line 8--8 in FIG. 7.
The exhaust ring for manufacturing semiconductors is used in a vacuum vessel for manufacturing semiconductors.
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Jun 12 2003 | Tokyo Electron Limited | (assignment on the face of the patent) | / | |||
Jun 25 2003 | DOBA, SHIGEKI | Tokyo Electron Limited | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 014377 | /0817 |
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