Patent
   D916038
Priority
Mar 19 2019
Filed
Sep 18 2019
Issued
Apr 13 2021
Expiry
Apr 13 2036
Assg.orig
Entity
unknown
5
11
n/a
The ornamental design for a grounded electrode for a plasma processing apparatus, as shown and described.

FIG. 1 is a front, top and right side perspective view of a grounded electrode for a plasma processing apparatus according to the design;

FIG. 2 is a rear, bottom and left side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 7; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Watanabe, Taku

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Patent Priority Assignee Title
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Sep 18 2019HITACHI HIGH-TECH CORPORATION(assignment on the face of the patent)
Nov 06 2019WATANABE, TAKUHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0510040590 pdf
Feb 12 2020Hitachi High-Technologies CorporationHITACHI HIGH-TECH CORPORATIONCHANGE OF NAME SEE DOCUMENT FOR DETAILS 0523980249 pdf
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