Patent
   D703160
Priority
Jan 27 2011
Filed
Jul 14 2011
Issued
Apr 22 2014
Expiry
Apr 22 2028
Assg.orig
Entity
unknown
24
13
n/a
I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.

FIG. 1 is a front and bottom perspective view of a grounded electrode for a plasma processing apparatus showing our/my new design;

FIG. 2 is a front elevational view thereof with explanatory cut lines 8-8;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along 8-8.

Tanimura, Hidenobu

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Executed onAssignorAssigneeConveyanceFrameReelDoc
May 17 2011TANIMURA, HIDENOBUHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0265880569 pdf
Jul 14 2011Hitachi High-Technologies Corporation(assignment on the face of the patent)
Feb 12 2020Hitachi High-Technologies CorporationHITACHI HIGH-TECH CORPORATIONCHANGE OF NAME AND ADDRESS0522590227 pdf
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