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Patent
D703160
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Priority
Jan 27 2011
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Filed
Jul 14 2011
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Issued
Apr 22 2014
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Expiry
Apr 22 2028
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Assg.orig
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Entity
unknown
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30
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13
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n/a
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I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.
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FIG. 1 is a front and bottom perspective view of a grounded electrode for a plasma processing apparatus showing our/my new design;
FIG. 2 is a front elevational view thereof with explanatory cut lines 8-8;
FIG. 3 is a right side elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a cross sectional view taken along 8-8.
Tanimura, Hidenobu
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| Date |
Maintenance Fee Events |
n/a
| Date |
Maintenance Schedule |
n/a