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Patent
   D741823
Priority
Jul 10 2013
Filed
Jan 09 2014
Issued
Oct 27 2015
Expiry
Oct 27 2029
Inventors
Tateno, Hi…
Assg.orig
Hitachi Ko…
Assg.curr
KOKUSAI EL…
Entity
unknown
Referenced by
42
References
26
Maint.:
n/a
The ornamental design for a vaporizer for substrate processing apparatus, as shown and described.

FIG. 1 is a front, perspective view of a vaporizer for substrate processing apparatus showing our new design;

FIG. 2 is a front, bottom perspective view thereof;

FIG. 3 is a front elevational view thereof, the back elevation view being the same therefore omitted;

FIG. 4 is a left side elevational view thereof, the right side elevation view being the same therefore omitted;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a cross-sectional view taken along line 7-7 in FIG. 5.

The back elevational view is the same as the front elevational view and has, therefore, been omitted; the right side elevational view is the same as the left side elevational view and has, therefore been omitted.
INVENTORS:

Tateno, Hideto, Hara, Daisuke, Joda, Takuya, Okuno, Masahisa

THIS PATENT IS REFERENCED BY THESE PATENTS:
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D802545, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Lower chamber for a plasma processing apparatus
D803917, Jun 16 2015 KOKUSAI ELECTRIC CORPORATION Heat reflector for substrate processing apparatus
D804556, Jun 16 2015 KOKUSAI ELECTRIC CORPORATION Heat reflector for substrate processing apparatus
D825504, Apr 21 2015 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D825505, Jun 18 2015 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D836572, Sep 30 2016 Applied Materials, Inc.; Applied Materials, Inc Target profile for a physical vapor deposition chamber target
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D941371, Mar 20 2020 Applied Materials, Inc Process shield for a substrate processing chamber
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D946638, Dec 11 2017 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D966357, Dec 02 2020 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D970566, Mar 23 2020 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
D971167, Aug 28 2019 Applied Materials, Inc. Lower shield for a substrate processing chamber
ER1922,
ER2428,
ER2449,
ER2608,
ER3761,
ER511,
ER6877,
THIS PATENT REFERENCES THESE PATENTS:
Patent Priority Assignee Title
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ASSIGNMENT RECORDS    Assignment records on the USPTO
//////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Dec 24 2013TATENO, HIDETOHitachi Kokusai Electric IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0320300119 pdf
Dec 24 2013HARA, DAISUKEHitachi Kokusai Electric IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0320300119 pdf
Dec 24 2013OKUNO, MASAHISAHitachi Kokusai Electric IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0320300119 pdf
Dec 24 2013JODA, TAKUYAHitachi Kokusai Electric IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0320300119 pdf
Jan 09 2014HITACHI KOKUSAI ELECTRIC INC.(assignment on the face of the patent)
Mar 29 2019Hitachi Kokusai Electric IncKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0491960764 pdf
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