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Patent
D741823
Priority
Jul 10 2013
Filed
Jan 09 2014
Issued
Oct 27 2015
Expiry
Oct 27 2029
Assg.orig
Entity
unknown
42
26
n/a
The ornamental design for a vaporizer for substrate processing apparatus, as shown and described.
FIG. 1 is a front, perspective view of a vaporizer for substrate processing apparatus showing our new design;
FIG. 2 is a front, bottom perspective view thereof;
FIG. 3 is a front elevational view thereof, the back elevation view being the same therefore omitted;
FIG. 4 is a left side elevational view thereof, the right side elevation view being the same therefore omitted;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is a cross-sectional view taken along line 7 -7 in FIG. 5 .
The back elevational view is the same as the front elevational view and has, therefore, been omitted; the right side elevational view is the same as the left side elevational view and has, therefore been omitted.
Tateno, Hideto , Hara, Daisuke , Joda, Takuya , Okuno, Masahisa
Patent
Priority
Assignee
Title
D795315 ,
Dec 12 2014
Ebara Corporation
Dresser disk
D797067 ,
Apr 21 2015
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D798248 ,
Jun 18 2015
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D801942 ,
Apr 16 2015
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D802545 ,
Jun 12 2015
HITACHI HIGH-TECH CORPORATION
Lower chamber for a plasma processing apparatus
D803917 ,
Jun 16 2015
KOKUSAI ELECTRIC CORPORATION
Heat reflector for substrate processing apparatus
D804556 ,
Jun 16 2015
KOKUSAI ELECTRIC CORPORATION
Heat reflector for substrate processing apparatus
D825504 ,
Apr 21 2015
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D825505 ,
Jun 18 2015
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D836572 ,
Sep 30 2016
Applied Materials, Inc.; Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D837755 ,
Apr 16 2015
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D851613 ,
Oct 05 2017
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D858468 ,
Mar 16 2018
Applied Materials, Inc
Collimator for a physical vapor deposition chamber
D859333 ,
Mar 16 2018
Applied Materials, Inc
Collimator for a physical vapor deposition chamber
D868124 ,
Dec 11 2017
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D869409 ,
Sep 30 2016
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D875053 ,
Apr 28 2017
Applied Materials, Inc
Plasma connector liner
D875054 ,
Apr 28 2017
Applied Materials, Inc
Plasma connector liner
D875055 ,
Apr 28 2017
Applied Materials, Inc
Plasma connector liner
D877101 ,
Mar 09 2018
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D894137 ,
Oct 05 2017
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D902165 ,
Mar 09 2018
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D908645 ,
Aug 26 2019
Applied Materials, Inc
Sputtering target for a physical vapor deposition chamber
D923241 ,
May 29 2018
PAX LABS, INC
Vaporizer cartridge container
D933725 ,
Feb 08 2019
Applied Materials, Inc
Deposition ring for a substrate processing chamber
D936187 ,
Feb 12 2020
Applied Materials, Inc
Gas distribution assembly lid
D937329 ,
Mar 23 2020
Applied Materials, Inc
Sputter target for a physical vapor deposition chamber
D940765 ,
Dec 02 2020
Applied Materials, Inc
Target profile for a physical vapor deposition chamber target
D941371 ,
Mar 20 2020
Applied Materials, Inc
Process shield for a substrate processing chamber
D941372 ,
Mar 20 2020
Applied Materials, Inc
Process shield for a substrate processing chamber
D942516 ,
Feb 08 2019
Applied Materials, Inc
Process shield for a substrate processing chamber
D946638 ,
Dec 11 2017
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D966357 ,
Dec 02 2020
Applied Materials, Inc.
Target profile for a physical vapor deposition chamber target
D970566 ,
Mar 23 2020
Applied Materials, Inc.
Sputter target for a physical vapor deposition chamber
D971167 ,
Aug 28 2019
Applied Materials, Inc.
Lower shield for a substrate processing chamber
ER1922 ,
ER2428 ,
ER2449 ,
ER2608 ,
ER3761 ,
ER511 ,
ER6877 ,
Patent
Priority
Assignee
Title
3026587 ,
4803948 ,
Apr 14 1986
Dainippon Screen Mfg. Co., Ltd.
Heat processing apparatus for semiconductor manufacturing
4906207 ,
Apr 24 1989
W L GORE & ASSOCIATES, INC
Dielectric restrainer
6746240 ,
Mar 15 2002
ASM International N.V.
Process tube support sleeve with circumferential channels
6815352 ,
Nov 09 1999
Shin-Etsu Chemical Co., Ltd.
Silicon focus ring and method for producing the same
8617672 ,
Jul 13 2005
Applied Materials, Inc
Localized surface annealing of components for substrate processing chambers
20030066484 ,
20070113783 ,
D404370 ,
Aug 20 1997
Tokyo Electron Limited
Cap for use in a semiconductor wafer heat processing apparatus
D404372 ,
Aug 20 1997
Tokyo Electron Limited
Ring for use in a semiconductor wafer heat processing apparatus
D556704 ,
Aug 25 2005
HITACHI HIGH-TECH CORPORATION
Grounded electrode for a plasma processing apparatus
D557226 ,
Aug 25 2005
HITACHI HIGH-TECH CORPORATION
Electrode cover for a plasma processing apparatus
D559993 ,
Mar 30 2005
Tokyo Electron Limited
Cover ring
D559994 ,
Mar 30 2005
Tokyo Electron Limited
Cover ring
D588078 ,
Jun 16 2006
Tokyo Electron Limited
Heat dissipation deterrence link for semiconductor manufacture
D600722 ,
May 07 2008
Komatsu Ltd
Fan shroud for construction machinery
D605206 ,
May 07 2008
Komatsu Ltd
Fan shroud for construction machinery
D699199 ,
Sep 30 2011
Tokyo Electron Limited
Electrode plate for a plasma processing apparatus
D699200 ,
Sep 30 2011
Tokyo Electron Limited
Electrode member for a plasma processing apparatus
D703160 ,
Jan 27 2011
HITACHI HIGH-TECH CORPORATION
Grounded electrode for a plasma processing apparatus
D709536 ,
Sep 30 2011
Tokyo Electron Limited
Focusing ring
D709537 ,
Sep 30 2011
Tokyo Electron Limited
Focusing ring
D709538 ,
Sep 30 2011
Tokyo Electron Limited
Focusing ring
D709539 ,
Sep 30 2011
Tokyo Electron Limited
Focusing ring
D711331 ,
Nov 07 2013
Applied Materials, Inc
Upper chamber liner
D713363 ,
Dec 31 2013
CELADON SYSTEMS, INC
Support for a probe test core
Date
Maintenance Fee Events
n/a
Date
Maintenance Schedule
n/a