Patent
   D699199
Priority
Sep 30 2011
Filed
Mar 29 2012
Issued
Feb 11 2014
Expiry
Feb 11 2028
Assg.orig
Entity
unknown
14
21
n/a
The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

FIG. 1 is a front view of an electrode plate for a plasma processing apparatus showing our new design, the rear view being identical;

FIG. 2 is a right side view thereof, the left side view being identical;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is an enlarged view of a portion of the electrode plate for a plasma processing apparatus of FIG. 1 taken along line 1-1 and line 2-2 of FIG. 3;

FIG. 6 is an enlarged cross sectional view thereof, taken along line 3-3 of FIG. 5; and,

FIG. 7 is a perspective view of the electrode plate for a plasma processing apparatus of FIG. 1.

The features shown only in broken lines depict environmental subject matter only and form no part of the claimed design.

Nagakubo, Keiichi, Kuwabara, Yusei

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 29 2012Tokyo Electron Limited(assignment on the face of the patent)
Apr 18 2012KUWABARA, YUSEITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0282400305 pdf
Apr 18 2012NAGAKUBO, KEIICHITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0282400305 pdf
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