FIG. 1 is a front view of an electrode plate for a plasma processing apparatus showing our new design, the rear view being identical;
FIG. 2 is a right side view thereof, the left side view being identical;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is an enlarged view of a portion of the electrode plate for a plasma processing apparatus of FIG. 1 taken along line 1-1 and line 2-2 of FIG. 3;
FIG. 6 is an enlarged cross sectional view thereof, taken along line 3-3 of FIG. 5; and,
FIG. 7 is a perspective view of the electrode plate for a plasma processing apparatus of FIG. 1.
The features shown only in broken lines depict environmental subject matter only and form no part of the claimed design.
Nagakubo, Keiichi, Kuwabara, Yusei
Patent |
Priority |
Assignee |
Title |
D741823, |
Jul 10 2013 |
KOKUSAI ELECTRIC CORPORATION |
Vaporizer for substrate processing apparatus |
D778247, |
Apr 16 2015 |
Veeco Instruments Inc.; VEECO INSTRUMENTS, INC |
Wafer carrier with a multi-pocket configuration |
D789888, |
Jan 08 2016 |
ASM IP Holding B.V. |
Electrode plate for semiconductor manufacturing apparatus |
D793572, |
Jun 10 2015 |
Tokyo Electron Limited |
Electrode plate for plasma processing apparatus |
D793971, |
Mar 27 2015 |
Veeco Instruments INC |
Wafer carrier with a 14-pocket configuration |
D793972, |
Mar 27 2015 |
Veeco Instruments INC |
Wafer carrier with a 31-pocket configuration |
D795315, |
Dec 12 2014 |
Ebara Corporation |
Dresser disk |
D806046, |
Apr 16 2015 |
Veeco Instruments Inc. |
Wafer carrier with a multi-pocket configuration |
D827592, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D836573, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Ring for a plasma processing apparatus |
D840364, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D852762, |
Mar 27 2015 |
Veeco Instruments Inc. |
Wafer carrier with a 14-pocket configuration |
D870719, |
May 23 2018 |
ANNEX PRODUCTS PTY. LTD. |
Adhesive base |
D904305, |
Feb 25 2019 |
PETRAM TECHNOLOGIES INC |
Electrode cage for a plasma blasting probe |
Patent |
Priority |
Assignee |
Title |
6818097, |
Apr 22 2002 |
Nisshinbo Industries, Inc |
Highly heat-resistant plasma etching electrode and dry etching device including the same |
7479304, |
Feb 14 2002 |
Applied Materials, Inc |
Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
20030066484, |
|
|
|
D363464, |
Aug 27 1992 |
Tokyo Electron Limited |
Electrode for a semiconductor processing apparatus |
D404370, |
Aug 20 1997 |
Tokyo Electron Limited |
Cap for use in a semiconductor wafer heat processing apparatus |
D404372, |
Aug 20 1997 |
Tokyo Electron Limited |
Ring for use in a semiconductor wafer heat processing apparatus |
D411516, |
Mar 15 1996 |
Tokyo Electron Limited |
Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
D546784, |
Sep 29 2005 |
Tokyo Electron Limited |
Attracting disc for an electrostatic chuck for semiconductor production |
D548705, |
Sep 29 2005 |
Tokyo Electron Limited |
Attracting disc for an electrostatic chuck for semiconductor production |
D556704, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Grounded electrode for a plasma processing apparatus |
D557226, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D606952, |
Jan 16 2009 |
ASM KOREA LTD |
Plasma inducing plate for semiconductor deposition apparatus |
D609652, |
Jul 22 2008 |
Tokyo Electron Limited |
Wafer attracting plate |
D609655, |
Oct 03 2008 |
NGK Insulators, Ltd. |
Electrostatic chuck |
D614593, |
Jul 21 2008 |
ASM KOREA LTD |
Substrate support for a semiconductor deposition apparatus |
D648289, |
Oct 21 2010 |
Novellus Systems, Inc |
Electroplating flow shaping plate having offset spiral hole pattern |
D654883, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D654884, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D655257, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D655259, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
KR300335385, |
|
|
|
///
n/a
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |