Patent
   D655257
Priority
Oct 21 2010
Filed
Apr 13 2011
Issued
Mar 06 2012
Expiry
Mar 06 2026
Assg.orig
Entity
unknown
19
6
n/a
The ornamental design for top plate for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a top plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a reference front view indicating the plane upon which a sectional view is taken; and,

FIG. 9 is a sectional view taken along line 9-9-9 of FIG. 8.

Honma, Manabu, Hishiya, Katsuyuki

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 13 2011Tokyo Electron Limited(assignment on the face of the patent)
Apr 25 2011HUNG, CHEN-FURUEY RYH ENTERPRISE CO , LTD ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0261840121 pdf
May 17 2011HONMA, MANABUTokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263590680 pdf
May 17 2011HISHIYA, KATSUYUKITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263590680 pdf
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