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Patent
D709539
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Priority
Sep 30 2011
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Filed
Mar 29 2012
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Issued
Jul 22 2014
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Expiry
Jul 22 2028
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Assg.orig
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Entity
unknown
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19
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34
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n/a
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The ornamental design for a focusing ring, as shown and described.
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FIG. 1 is a front view of a focusing ring of the present invention.
FIG. 2 is a right side view of the focusing ring of FIG. 1.
FIG. 3 is a top plan view of the focusing ring of FIG. 1.
FIG. 4 is a bottom view of the focusing ring of FIG. 1.
FIG. 5 is an enlarged sectional view of the 1-3 intersection of lines 1 and 3 of the focusing ring of FIG. 3.
FIG. 6 is an enlarged sectional view of the 2-3 intersection of lines 2 and 3 of the focusing ring of FIG. 3; and,
FIG. 7 is a perspective view of the focusing ring of FIG. 1.
The rear view is the same as the front view.
The left side view is the same as the right side view.
Nagakubo, Keiichi, Kuwabara, Yusei
Patent |
Priority |
Assignee |
Title |
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Jun 06 2013 |
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Patent |
Priority |
Assignee |
Title |
6068441, |
Nov 21 1997 |
ASM America, Inc |
Substrate transfer system for semiconductor processing equipment |
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Nov 09 1999 |
Shin-Etsu Chemical Co., Ltd. |
Silicon focus ring and method for producing the same |
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Apr 22 2002 |
Nisshinbo Industries, Inc |
Highly heat-resistant plasma etching electrode and dry etching device including the same |
7001482, |
Nov 12 2003 |
Tokyo Electron Limited |
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Ring for use in a semiconductor wafer heat processing apparatus |
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Tokyo Electron Limited |
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Rubbermaid Incorporated |
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ASM KOREA LTD |
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ASM KOREA LTD |
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Electroplating flow shaping plate having offset spiral hole pattern |
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Tokyo Electron Limited |
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Tokyo Electron Limited |
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Tokyo Electron Limited |
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Tokyo Electron Limited |
Baffle plate |
TW201001525, |
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TW471052, |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a