Patent
   D770992
Priority
Jun 12 2015
Filed
Oct 30 2015
Issued
Nov 08 2016
Expiry
Nov 08 2031
Assg.orig
Entity
unknown
73
26
n/a
The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

FIG. 1 is a front, top and right side enlarged perspective view of an electrode cover for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is an enlarged portion view taken along line 9-9 of FIG. 8.

Tauchi, Susumu, Uemura, Takashi, Sato, Kohei

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Oct 30 2015Hitachi High-Technologies Corporation(assignment on the face of the patent)
Dec 03 2015SATO, KOHEIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0373820187 pdf
Dec 04 2015TAUCHI, SUSUMUHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0373820187 pdf
Dec 04 2015UEMURA, TAKASHIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0373820187 pdf
Feb 12 2020Hitachi High-Technologies CorporationHITACHI HIGH-TECH CORPORATIONCHANGE OF NAME AND ADDRESS0522590227 pdf
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