Patent
   D937329
Priority
Mar 23 2020
Filed
Mar 23 2020
Issued
Nov 30 2021
Expiry
Nov 30 2036
Assg.orig
Entity
unknown
12
168
n/a
We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right elevation view thereof.

FIG. 5 is a left elevation view thereof.

FIG. 6 is a front elevation view thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.

The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.

Savandaiah, Kirankumar Neelasandra, Yedla, Srinivasa Rao, Lavitsky, Ilya, Riker, Martin, Fruchterman, William

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 23 2020Applied Materials, Inc.(assignment on the face of the patent)
Mar 24 2020RIKER, MARTINApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020FRUCHTERMAN, WILLIAMApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020LAVITSKY, ILYAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020YEDLA, SRINIVASA RAOApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020SAVANDAIAH, KIRANKUMAR NEELASANDRAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
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