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Patent
   D937329
Priority
Mar 23 2020
Filed
Mar 23 2020
Issued
Nov 30 2021
Expiry
Nov 30 2036
Inventors
Savandaiah…
Assg.orig
Applied Ma…
Assg.curr
Applied Ma…
Entity
unknown
Referenced by
16
References
168
Maint.:
n/a
We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right elevation view thereof.

FIG. 5 is a left elevation view thereof.

FIG. 6 is a front elevation view thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.

The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.
INVENTORS:

Savandaiah, Kirankumar Neelasandra, Yedla, Srinivasa Rao, Lavitsky, Ilya, Riker, Martin, Fruchterman, William

THIS PATENT IS REFERENCED BY THESE PATENTS:
Patent Priority Assignee Title
D966357, Dec 02 2020 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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ASSIGNMENT RECORDS    Assignment records on the USPTO
//////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 23 2020Applied Materials, Inc.(assignment on the face of the patent)
Mar 24 2020RIKER, MARTINApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020FRUCHTERMAN, WILLIAMApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020LAVITSKY, ILYAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020YEDLA, SRINIVASA RAOApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
Mar 30 2020SAVANDAIAH, KIRANKUMAR NEELASANDRAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522910791 pdf
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