Gas flow control plate for semiconductor manufacturing apparatus

Abstract

Description

FIG. 1 is a perspective view of a gas flow control plate for a semiconductor manufacturing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross sectional perspective view taken along line 8-8 of FIG. 6; and,

FIG. 9 is a cross sectional view taken along line 9-9 of FIG. 6.

The broken lines shown in the drawings represent portions of the gas flow control plate for a semiconductor manufacturing apparatus, that form no part of the claimed design.

Claims

The ornamental design for a gas flow control plate for a semiconductor manufacturing apparatus, as shown and described.