Patent
   D970566
Priority
Mar 23 2020
Filed
Oct 26 2021
Issued
Nov 22 2022
Expiry
Nov 22 2037
Assg.orig
Entity
unknown
4
135
n/a
We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right elevation view thereof.

FIG. 5 is a left elevation view thereof.

FIG. 6 is a front elevation view thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.

The dashed lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.

Savandaiah, Kirankumar Neelasandra, Yedla, Srinivasa Rao, Lavitsky, Ilya, Riker, Martin, Fruchterman, William

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Oct 26 2021Applied Materials, Inc.(assignment on the face of the patent)
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