| Patent | 
	  	 Priority | 
	  	 Assignee | 
	  	 Title | 
	  
	      
	 | 10014170,  | 
	 May 14 2015 | 
	 Lam Research Corporation | 
	 Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity | 
	 
    
	 | 10023960,  | 
	 Sep 12 2012 | 
	 ASM IP Holdings B.V. | 
	 Process gas management for an inductively-coupled plasma deposition reactor | 
	 
    
	 | 10032628,  | 
	 May 02 2016 | 
	 ASM IP HOLDING B V  | 
	 Source/drain performance through conformal solid state doping | 
	 
    
	 | 10043661,  | 
	 Jul 13 2015 | 
	 ASM IP Holding B.V. | 
	 Method for protecting layer by forming hydrocarbon-based extremely thin film | 
	 
    
	 | 10083836,  | 
	 Jul 24 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Formation of boron-doped titanium metal films with high work function | 
	 
    
	 | 10087522,  | 
	 Apr 21 2016 | 
	 ASM IP HOLDING B V  | 
	 Deposition of metal borides | 
	 
    
	 | 10087525,  | 
	 Aug 04 2015 | 
	 ASM IP Holding B.V. | 
	 Variable gap hard stop design | 
	 
    
	 | 10090316,  | 
	 Sep 01 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 3D stacked multilayer semiconductor memory using doped select transistor channel | 
	 
    
	 | 10094034,  | 
	 Aug 28 2015 | 
	 Lam Research Corporation | 
	 Edge flow element for electroplating apparatus | 
	 
    
	 | 10103040,  | 
	 Mar 31 2017 | 
	 ASM IP HOLDING B V  | 
	 Apparatus and method for manufacturing a semiconductor device | 
	 
    
	 | 10134757,  | 
	 Nov 07 2016 | 
	 ASM IP Holding B.V. | 
	 Method of processing a substrate and a device manufactured by using the method | 
	 
    
	 | 10167557,  | 
	 Mar 18 2014 | 
	 ASM IP Holding B.V. | 
	 Gas distribution system, reactor including the system, and methods of using the same | 
	 
    
	 | 10177025,  | 
	 Jul 28 2016 | 
	 ASM IP HOLDING B V  | 
	 Method and apparatus for filling a gap | 
	 
    
	 | 10179947,  | 
	 Nov 26 2013 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition | 
	 
    
	 | 10190213,  | 
	 Apr 21 2016 | 
	 ASM IP HOLDING B V  | 
	 Deposition of metal borides | 
	 
    
	 | 10190230,  | 
	 Jul 02 2010 | 
	 Novellus Systems, Inc. | 
	 Cross flow manifold for electroplating apparatus | 
	 
    
	 | 10211308,  | 
	 Oct 21 2015 | 
	 ASM IP Holding B.V. | 
	 NbMC layers | 
	 
    
	 | 10229833,  | 
	 Nov 01 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures | 
	 
    
	 | 10233556,  | 
	 Jul 02 2010 | 
	 Lam Research Corporation | 
	 Dynamic modulation of cross flow manifold during electroplating | 
	 
    
	 | 10236177,  | 
	 Aug 22 2017 | 
	 ASM IP HOLDING B V  | 
	 Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures | 
	 
    
	 | 10249524,  | 
	 Aug 09 2017 | 
	 ASM IP Holding B.V. | 
	 Cassette holder assembly for a substrate cassette and holding member for use in such assembly | 
	 
    
	 | 10249577,  | 
	 May 17 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method | 
	 
    
	 | 10262859,  | 
	 Mar 24 2016 | 
	 ASM IP Holding B.V. | 
	 Process for forming a film on a substrate using multi-port injection assemblies | 
	 
    
	 | 10269558,  | 
	 Dec 22 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of forming a structure on a substrate | 
	 
    
	 | 10276355,  | 
	 Mar 12 2015 | 
	 ASM IP Holding B.V. | 
	 Multi-zone reactor, system including the reactor, and method of using the same | 
	 
    
	 | 10283353,  | 
	 Mar 29 2017 | 
	 ASM IP HOLDING B V  | 
	 Method of reforming insulating film deposited on substrate with recess pattern | 
	 
    
	 | 10290508,  | 
	 Dec 05 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming vertical spacers for spacer-defined patterning | 
	 
    
	 | 10301739,  | 
	 May 01 2013 | 
	 Lam Research Corporation | 
	 Anisotropic high resistance ionic current source (AHRICS) | 
	 
    
	 | 10312055,  | 
	 Jul 26 2017 | 
	 ASM IP Holding B.V. | 
	 Method of depositing film by PEALD using negative bias | 
	 
    
	 | 10312129,  | 
	 Sep 29 2015 | 
	 ASM IP Holding B.V. | 
	 Variable adjustment for precise matching of multiple chamber cavity housings | 
	 
    
	 | 10319588,  | 
	 Oct 10 2017 | 
	 ASM IP HOLDING B V  | 
	 Method for depositing a metal chalcogenide on a substrate by cyclical deposition | 
	 
    
	 | 10322384,  | 
	 Nov 09 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Counter flow mixer for process chamber | 
	 
    
	 | 10340125,  | 
	 Mar 08 2013 | 
	 ASM IP Holding B.V. | 
	 Pulsed remote plasma method and system | 
	 
    
	 | 10340135,  | 
	 Nov 28 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride | 
	 
    
	 | 10343920,  | 
	 Mar 18 2016 | 
	 ASM IP HOLDING B V  | 
	 Aligned carbon nanotubes | 
	 
    
	 | 10361201,  | 
	 Sep 27 2013 | 
	 ASM IP Holding B.V. | 
	 Semiconductor structure and device formed using selective epitaxial process | 
	 
    
	 | 10364496,  | 
	 Jun 27 2011 | 
	 ASM IP Holding B.V. | 
	 Dual section module having shared and unshared mass flow controllers | 
	 
    
	 | 10364505,  | 
	 May 24 2016 | 
	 Lam Research Corporation | 
	 Dynamic modulation of cross flow manifold during elecroplating | 
	 
    
	 | 10366864,  | 
	 Mar 18 2013 | 
	 ASM IP Holding B.V. | 
	 Method and system for in-situ formation of intermediate reactive species | 
	 
    
	 | 10367080,  | 
	 May 02 2016 | 
	 ASM IP HOLDING B V  | 
	 Method of forming a germanium oxynitride film | 
	 
    
	 | 10378106,  | 
	 Nov 14 2008 | 
	 ASM IP Holding B.V. | 
	 Method of forming insulation film by modified PEALD | 
	 
    
	 | 10381219,  | 
	 Oct 25 2018 | 
	 ASM IP Holding B.V. | 
	 Methods for forming a silicon nitride film | 
	 
    
	 | 10381226,  | 
	 Jul 27 2016 | 
	 ASM IP Holding B.V. | 
	 Method of processing substrate | 
	 
    
	 | 10388509,  | 
	 Jun 28 2016 | 
	 ASM IP Holding B.V. | 
	 Formation of epitaxial layers via dislocation filtering | 
	 
    
	 | 10388513,  | 
	 Jul 03 2018 | 
	 ASM IP Holding B.V. | 
	 Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | 
	 
    
	 | 10395919,  | 
	 Jul 28 2016 | 
	 ASM IP HOLDING B V  | 
	 Method and apparatus for filling a gap | 
	 
    
	 | 10403504,  | 
	 Oct 05 2017 | 
	 ASM IP HOLDING B V  | 
	 Method for selectively depositing a metallic film on a substrate | 
	 
    
	 | 10410943,  | 
	 Oct 13 2016 | 
	 ASM IP Holding B.V. | 
	 Method for passivating a surface of a semiconductor and related systems | 
	 
    
	 | 10435790,  | 
	 Nov 01 2016 | 
	 ASM IP Holding B.V. | 
	 Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap | 
	 
    
	 | 10438965,  | 
	 Dec 22 2014 | 
	 ASM IP Holding B.V. | 
	 Semiconductor device and manufacturing method thereof | 
	 
    
	 | 10446393,  | 
	 May 08 2017 | 
	 ASM IP Holding B.V. | 
	 Methods for forming silicon-containing epitaxial layers and related semiconductor device structures | 
	 
    
	 | 10458018,  | 
	 Jun 26 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Structures including metal carbide material, devices including the structures, and methods of forming same | 
	 
    
	 | 10468251,  | 
	 Feb 19 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming spacers using silicon nitride film for spacer-defined multiple patterning | 
	 
    
	 | 10468261,  | 
	 Feb 15 2017 | 
	 ASM IP HOLDING B V  | 
	 Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures | 
	 
    
	 | 10468262,  | 
	 Feb 15 2017 | 
	 ASM IP Holding B.V. | 
	 Methods for forming a metallic film on a substrate by a cyclical deposition and related semiconductor device structures | 
	 
    
	 | 10480072,  | 
	 Apr 06 2009 | 
	 ASM IP HOLDING B V  | 
	 Semiconductor processing reactor and components thereof | 
	 
    
	 | 10483099,  | 
	 Jul 26 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming thermally stable organosilicon polymer film | 
	 
    
	 | 10501866,  | 
	 Mar 09 2016 | 
	 ASM IP Holding B.V. | 
	 Gas distribution apparatus for improved film uniformity in an epitaxial system | 
	 
    
	 | 10504742,  | 
	 May 31 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of atomic layer etching using hydrogen plasma | 
	 
    
	 | 10510536,  | 
	 Mar 29 2018 | 
	 ASM IP Holding B.V. | 
	 Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber | 
	 
    
	 | 10529542,  | 
	 Mar 11 2015 | 
	 ASM IP Holdings B.V. | 
	 Cross-flow reactor and method | 
	 
    
	 | 10529554,  | 
	 Feb 19 2016 | 
	 ASM IP Holding B.V. | 
	 Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | 
	 
    
	 | 10529563,  | 
	 Mar 29 2017 | 
	 ASM IP Holdings B.V. | 
	 Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures | 
	 
    
	 | 10535516,  | 
	 Feb 01 2018 | 
	 ASM IP Holdings B.V. | 
	 Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures | 
	 
    
	 | 10541173,  | 
	 Jul 08 2016 | 
	 ASM IP Holding B.V. | 
	 Selective deposition method to form air gaps | 
	 
    
	 | 10541333,  | 
	 Jul 19 2017 | 
	 ASM IP Holding B.V. | 
	 Method for depositing a group IV semiconductor and related semiconductor device structures | 
	 
    
	 | 10559458,  | 
	 Nov 26 2018 | 
	 ASM IP Holding B.V. | 
	 Method of forming oxynitride film | 
	 
    
	 | 10561975,  | 
	 Oct 07 2014 | 
	 ASM IP Holdings B.V. | 
	 Variable conductance gas distribution apparatus and method | 
	 
    
	 | 10566223,  | 
	 Aug 28 2012 | 
	 ASM IP Holdings B.V.; ASM IP HOLDING B V  | 
	 Systems and methods for dynamic semiconductor process scheduling | 
	 
    
	 | 10590535,  | 
	 Jul 26 2017 | 
	 ASM IP HOLDING B V  | 
	 Chemical treatment, deposition and/or infiltration apparatus and method for using the same | 
	 
    
	 | 10600673,  | 
	 Jul 07 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Magnetic susceptor to baseplate seal | 
	 
    
	 | 10604847,  | 
	 Mar 18 2014 | 
	 ASM IP Holding B.V. | 
	 Gas distribution system, reactor including the system, and methods of using the same | 
	 
    
	 | 10605530,  | 
	 Jul 26 2017 | 
	 ASM IP Holding B.V. | 
	 Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace | 
	 
    
	 | 10607895,  | 
	 Sep 18 2017 | 
	 ASM IP HOLDING B V  | 
	 Method for forming a semiconductor device structure comprising a gate fill metal | 
	 
    
	 | 10612136,  | 
	 Jun 29 2018 | 
	 ASM IP HOLDING B V ; ASM IP Holding, B.V. | 
	 Temperature-controlled flange and reactor system including same | 
	 
    
	 | 10612137,  | 
	 Jul 08 2016 | 
	 ASM IP HOLDING B V  | 
	 Organic reactants for atomic layer deposition | 
	 
    
	 | 10622375,  | 
	 Nov 07 2016 | 
	 ASM IP Holding B.V. | 
	 Method of processing a substrate and a device manufactured by using the method | 
	 
    
	 | 10643826,  | 
	 Oct 26 2016 | 
	 ASM IP HOLDING B V  | 
	 Methods for thermally calibrating reaction chambers | 
	 
    
	 | 10643904,  | 
	 Nov 01 2016 | 
	 ASM IP HOLDING B V  | 
	 Methods for forming a semiconductor device and related semiconductor device structures | 
	 
    
	 | 10644025,  | 
	 Nov 07 2016 | 
	 ASM IP Holding B.V. | 
	 Method of processing a substrate and a device manufactured by using the method | 
	 
    
	 | 10655221,  | 
	 Feb 09 2017 | 
	 ASM IP Holding B.V. | 
	 Method for depositing oxide film by thermal ALD and PEALD | 
	 
    
	 | 10658181,  | 
	 Feb 20 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of spacer-defined direct patterning in semiconductor fabrication | 
	 
    
	 | 10658205,  | 
	 Sep 28 2017 | 
	 ASM IP HOLDING B V  | 
	 Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber | 
	 
    
	 | 10662545,  | 
	 Dec 12 2012 | 
	 Novellus Systems, Inc. | 
	 Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating | 
	 
    
	 | 10665452,  | 
	 May 02 2016 | 
	 ASM IP Holdings B.V. | 
	 Source/drain performance through conformal solid state doping | 
	 
    
	 | 10672636,  | 
	 Aug 09 2017 | 
	 ASM IP Holding B.V. | 
	 Cassette holder assembly for a substrate cassette and holding member for use in such assembly | 
	 
    
	 | 10683571,  | 
	 Feb 25 2014 | 
	 ASM IP Holding B.V. | 
	 Gas supply manifold and method of supplying gases to chamber using same | 
	 
    
	 | 10685834,  | 
	 Jul 05 2017 | 
	 ASM IP Holdings B.V. | 
	 Methods for forming a silicon germanium tin layer and related semiconductor device structures | 
	 
    
	 | 10692741,  | 
	 Aug 08 2017 | 
	 ASM IP Holdings B.V.; ASM IP HOLDING B V  | 
	 Radiation shield | 
	 
    
	 | 10707106,  | 
	 Jun 06 2011 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules | 
	 
    
	 | 10714315,  | 
	 Oct 12 2012 | 
	 ASM IP Holdings B.V.; ASM IP HOLDING B V  | 
	 Semiconductor reaction chamber showerhead | 
	 
    
	 | 10714335,  | 
	 Apr 25 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of depositing thin film and method of manufacturing semiconductor device | 
	 
    
	 | 10714350,  | 
	 Nov 01 2016 | 
	 ASM IP Holdings, B.V.; ASM IP HOLDING B V  | 
	 Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures | 
	 
    
	 | 10714385,  | 
	 Jul 19 2016 | 
	 ASM IP Holding B.V. | 
	 Selective deposition of tungsten | 
	 
    
	 | 10720322,  | 
	 Feb 19 2016 | 
	 ASM IP Holding B.V. | 
	 Method for forming silicon nitride film selectively on top surface | 
	 
    
	 | 10720331,  | 
	 Nov 01 2016 | 
	 ASM IP Holdings, B.V. | 
	 Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures | 
	 
    
	 | 10731249,  | 
	 Feb 15 2018 | 
	 ASM IP HOLDING B V  | 
	 Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus | 
	 
    
	 | 10734223,  | 
	 Oct 10 2017 | 
	 ASM IP Holding B.V. | 
	 Method for depositing a metal chalcogenide on a substrate by cyclical deposition | 
	 
    
	 | 10734244,  | 
	 Nov 16 2017 | 
	 ASM IP Holding B.V. | 
	 Method of processing a substrate and a device manufactured by the same | 
	 
    
	 | 10734497,  | 
	 Jul 18 2017 | 
	 ASM IP HOLDING B V  | 
	 Methods for forming a semiconductor device structure and related semiconductor device structures | 
	 
    
	 | 10741385,  | 
	 Jul 28 2016 | 
	 ASM IP HOLDING B V  | 
	 Method and apparatus for filling a gap | 
	 
    
	 | 10755922,  | 
	 Jul 03 2018 | 
	 ASM IP HOLDING B V  | 
	 Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | 
	 
    
	 | 10755923,  | 
	 Jul 03 2018 | 
	 ASM IP Holding B.V. | 
	 Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | 
	 
    
	 | 10767789,  | 
	 Jul 16 2018 | 
	 ASM IP Holding B.V. | 
	 Diaphragm valves, valve components, and methods for forming valve components | 
	 
    
	 | 10770286,  | 
	 May 08 2017 | 
	 ASM IP Holdings B.V.; ASM IP HOLDING B V  | 
	 Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures | 
	 
    
	 | 10770336,  | 
	 Aug 08 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Substrate lift mechanism and reactor including same | 
	 
    
	 | 10781527,  | 
	 Sep 18 2017 | 
	 Lam Research Corporation | 
	 Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating | 
	 
    
	 | 10784102,  | 
	 Dec 22 2016 | 
	 ASM IP Holding B.V. | 
	 Method of forming a structure on a substrate | 
	 
    
	 | 10787741,  | 
	 Aug 21 2014 | 
	 ASM IP Holding B.V. | 
	 Method and system for in situ formation of gas-phase compounds | 
	 
    
	 | 10797133,  | 
	 Jun 21 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures | 
	 
    
	 | 10804098,  | 
	 Aug 14 2009 | 
	 ASM IP HOLDING B V  | 
	 Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species | 
	 
    
	 | 10811256,  | 
	 Oct 16 2018 | 
	 ASM IP Holding B.V. | 
	 Method for etching a carbon-containing feature | 
	 
    
	 | 10818758,  | 
	 Nov 16 2018 | 
	 ASM IP Holding B.V. | 
	 Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures | 
	 
    
	 | 10829852,  | 
	 Aug 16 2018 | 
	 ASM IP Holding B.V. | 
	 Gas distribution device for a wafer processing apparatus | 
	 
    
	 | 10832903,  | 
	 Oct 28 2011 | 
	 ASM IP Holding B.V. | 
	 Process feed management for semiconductor substrate processing | 
	 
    
	 | 10844484,  | 
	 Sep 22 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods | 
	 
    
	 | 10844486,  | 
	 Apr 06 2009 | 
	 ASM IP HOLDING B V  | 
	 Semiconductor processing reactor and components thereof | 
	 
    
	 | 10847365,  | 
	 Oct 11 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of forming conformal silicon carbide film by cyclic CVD | 
	 
    
	 | 10847366,  | 
	 Nov 16 2018 | 
	 ASM IP Holding B.V. | 
	 Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process | 
	 
    
	 | 10847371,  | 
	 Mar 27 2018 | 
	 ASM IP Holding B.V. | 
	 Method of forming an electrode on a substrate and a semiconductor device structure including an electrode | 
	 
    
	 | 10851456,  | 
	 Apr 21 2016 | 
	 ASM IP Holding B.V. | 
	 Deposition of metal borides | 
	 
    
	 | 10854498,  | 
	 Jul 15 2011 | 
	 ASM IP Holding B.V.; ASM JAPAN K K  | 
	 Wafer-supporting device and method for producing same | 
	 
    
	 | 10858737,  | 
	 Jul 28 2014 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Showerhead assembly and components thereof | 
	 
    
	 | 10865475,  | 
	 Apr 21 2016 | 
	 ASM IP HOLDING B V  | 
	 Deposition of metal borides and silicides | 
	 
    
	 | 10867786,  | 
	 Mar 30 2018 | 
	 ASM IP Holding B.V. | 
	 Substrate processing method | 
	 
    
	 | 10867788,  | 
	 Dec 28 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of forming a structure on a substrate | 
	 
    
	 | 10872771,  | 
	 Jan 16 2018 | 
	 ASM IP Holding B. V. | 
	 Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures | 
	 
    
	 | 10883175,  | 
	 Aug 09 2018 | 
	 ASM IP HOLDING B V  | 
	 Vertical furnace for processing substrates and a liner for use therein | 
	 
    
	 | 10886123,  | 
	 Jun 02 2017 | 
	 ASM IP Holding B.V. | 
	 Methods for forming low temperature semiconductor layers and related semiconductor device structures | 
	 
    
	 | 10892156,  | 
	 May 08 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Methods for forming a silicon nitride film on a substrate and related semiconductor device structures | 
	 
    
	 | 10896820,  | 
	 Feb 14 2018 | 
	 ASM IP HOLDING B V  | 
	 Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process | 
	 
    
	 | 10910262,  | 
	 Nov 16 2017 | 
	 ASM IP HOLDING B V  | 
	 Method of selectively depositing a capping layer structure on a semiconductor device structure | 
	 
    
	 | 10914004,  | 
	 Jun 29 2018 | 
	 ASM IP Holding B.V. | 
	 Thin-film deposition method and manufacturing method of semiconductor device | 
	 
    
	 | 10923340,  | 
	 May 14 2015 | 
	 Lam Research Corporation | 
	 Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity | 
	 
    
	 | 10923344,  | 
	 Oct 30 2017 | 
	 ASM IP HOLDING B V  | 
	 Methods for forming a semiconductor structure and related semiconductor structures | 
	 
    
	 | 10928731,  | 
	 Sep 21 2017 | 
	 ASM IP Holding B.V. | 
	 Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same | 
	 
    
	 | 10934619,  | 
	 Nov 15 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Gas supply unit and substrate processing apparatus including the gas supply unit | 
	 
    
	 | 10941490,  | 
	 Oct 07 2014 | 
	 ASM IP Holding B.V. | 
	 Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same | 
	 
    
	 | 10943771,  | 
	 Oct 26 2016 | 
	 ASM IP Holding B.V. | 
	 Methods for thermally calibrating reaction chambers | 
	 
    
	 | 10950432,  | 
	 Apr 25 2017 | 
	 ASM IP Holding B.V. | 
	 Method of depositing thin film and method of manufacturing semiconductor device | 
	 
    
	 | 10975470,  | 
	 Feb 23 2018 | 
	 ASM IP Holding B.V. | 
	 Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment | 
	 
    
	 | 11001925,  | 
	 Dec 19 2016 | 
	 ASM IP Holding B.V. | 
	 Substrate processing apparatus | 
	 
    
	 | 11001934,  | 
	 Aug 21 2017 | 
	 Lam Research Corporation | 
	 Methods and apparatus for flow isolation and focusing during electroplating | 
	 
    
	 | 11004977,  | 
	 Jul 19 2017 | 
	 ASM IP Holding B.V. | 
	 Method for depositing a group IV semiconductor and related semiconductor device structures | 
	 
    
	 | 11015245,  | 
	 Mar 19 2014 | 
	 ASM IP Holding B.V. | 
	 Gas-phase reactor and system having exhaust plenum and components thereof | 
	 
    
	 | 11018002,  | 
	 Jul 19 2017 | 
	 ASM IP Holding B.V. | 
	 Method for selectively depositing a Group IV semiconductor and related semiconductor device structures | 
	 
    
	 | 11018047,  | 
	 Jan 25 2018 | 
	 ASM IP Holding B.V. | 
	 Hybrid lift pin | 
	 
    
	 | 11022879,  | 
	 Nov 24 2017 | 
	 ASM IP Holding B.V. | 
	 Method of forming an enhanced unexposed photoresist layer | 
	 
    
	 | 11024523,  | 
	 Sep 11 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Substrate processing apparatus and method | 
	 
    
	 | 11031242,  | 
	 Nov 07 2018 | 
	 ASM IP Holding B.V. | 
	 Methods for depositing a boron doped silicon germanium film | 
	 
    
	 | 11047059,  | 
	 May 24 2016 | 
	 Lam Research Corporation | 
	 Dynamic modulation of cross flow manifold during elecroplating | 
	 
    
	 | 11049751,  | 
	 Sep 14 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Cassette supply system to store and handle cassettes and processing apparatus equipped therewith | 
	 
    
	 | 11053591,  | 
	 Aug 06 2018 | 
	 ASM IP Holding B.V. | 
	 Multi-port gas injection system and reactor system including same | 
	 
    
	 | 11056344,  | 
	 Aug 30 2017 | 
	 ASM IP HOLDING B V  | 
	 Layer forming method | 
	 
    
	 | 11056567,  | 
	 May 11 2018 | 
	 ASM IP Holding B.V. | 
	 Method of forming a doped metal carbide film on a substrate and related semiconductor device structures | 
	 
    
	 | 11069510,  | 
	 Aug 30 2017 | 
	 ASM IP Holding B.V. | 
	 Substrate processing apparatus | 
	 
    
	 | 11081345,  | 
	 Feb 06 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method of post-deposition treatment for silicon oxide film | 
	 
    
	 | 11087997,  | 
	 Oct 31 2018 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Substrate processing apparatus for processing substrates | 
	 
    
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	 Mar 29 2018 | 
	 ASM IP HOLDING B V  | 
	 Substrate rack and a substrate processing system and method | 
	 
    
	 | 11094546,  | 
	 Oct 05 2017 | 
	 ASM IP Holding B.V. | 
	 Method for selectively depositing a metallic film on a substrate | 
	 
    
	 | 11094582,  | 
	 Jul 08 2016 | 
	 ASM IP Holding B.V. | 
	 Selective deposition method to form air gaps | 
	 
    
	 | 11101370,  | 
	 May 02 2016 | 
	 ASM IP Holding B.V. | 
	 Method of forming a germanium oxynitride film | 
	 
    
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	 Jul 28 2016 | 
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	 ASM IP HOLDING B V ; Universiteit Gent | 
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	 Chemical source vessel with dip tube | 
	 
    
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	 Chemical treatment, deposition and/or infiltration apparatus and method for using the same | 
	 
    
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	 Substrate processing apparatus | 
	 
    
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	 Substrate processing apparatus and method | 
	 
    
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	 Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material | 
	 
    
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	 Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly | 
	 
    
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	 Method for forming precoat film and method for forming silicon-containing film | 
	 
    
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	 Thin film forming method | 
	 
    
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	 Substrate processing apparatus | 
	 
    
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	 Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film | 
	 
    
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	 ASM IP Holding B.V. | 
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	 Layer forming method and apparatus | 
	 
    
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
	 Substrate handling device with adjustable joints | 
	 
    
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	 ASM IP Holding B.V. | 
	 Substrate processing apparatus | 
	 
    
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	 Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures | 
	 
    
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	 Sequential infiltration synthesis apparatus and a method of forming a patterned structure | 
	 
    
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	 Substrate supporting unit and a substrate processing device including the same | 
	 
    
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	 Oct 22 2020 | 
	 ASM IP HOLDING B V  | 
	 Method of depositing vanadium metal | 
	 
    
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	 ASM IP Holding B.V. | 
	 Vertical batch furnace assembly | 
	 
    
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
	 Method of forming vanadium nitride layer and structure including the vanadium nitride layer | 
	 
    
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	 ASM IP Holding B.V. | 
	 Transition metal deposition method | 
	 
    
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	 Substrate retaining apparatus, system including the apparatus, and method of using same | 
	 
    
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	 ASM IP Holding B.V. | 
	 Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element | 
	 
    
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	 ASM IP Holding B.V. | 
	 Injector configured for arrangement within a reaction chamber of a substrate processing apparatus | 
	 
    
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	 Aug 23 2019 | 
	 ASM IP Holding B.V. | 
	 Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method of forming vanadium nitride-containing layer | 
	 
    
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	 Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer | 
	 
    
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	 ASM IP HOLDING B V  | 
	 Method and device for depositing silicon onto substrates | 
	 
    
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	 Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method | 
	 
    
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	 ASM IP Holding B.V. | 
	 Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface | 
	 
    
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	 ASM IP Holding B.V. | 
	 Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | 
	 
    
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	 ASM IP Holding B.V. | 
	 Substrate processing apparatus having electrostatic chuck and substrate processing method | 
	 
    
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	 ASM IP Holding B.V. | 
	 Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment | 
	 
    
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
	 Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material | 
	 
    
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	 ASM IP Holding B.V. | 
	 Atomic layer deposition of III-V compounds to form V-NAND devices | 
	 
    
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	 ASM IP HOLDING B V ; ASM IP Holding B.V. | 
	 Solid source precursor vessel | 
	 
    
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	 ASM IP Holding B.V. | 
	 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method for fabricating layer structure having target topological profile | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method for treatment of deposition reactor | 
	 
    
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	 ASM IP Holding B.V. | 
	 Sequential infiltration synthesis apparatus | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method for depositing a gap-fill layer by plasma-assisted deposition | 
	 
    
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	 ASM IP Holding B.V. | 
	 Gas supply assembly, components thereof, and reactor system including same | 
	 
    
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	 ASM IP Holding B.V. | 
	 Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus | 
	 
    
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	 ASM IP Holding B.V. | 
	 System dedicated for parts cleaning | 
	 
    
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
	 Substrate processing apparatus | 
	 
    
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
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	 ASM IP HOLDING B V ; ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
	 Rotating substrate support | 
	 
    
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	 ASM IP Holding B.V. | 
	 Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures | 
	 
    
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
	 Deposition method | 
	 
    
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
	 Precursor capsule, a vessel and a method | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method of forming structures using a neutral beam | 
	 
    
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	 ASM IP Holding B.V. | 
	 Vertical batch furnace assembly comprising a cooling gas supply | 
	 
    
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	 ASM IP Holding B.V. | 
	 Plasma treatment device having matching box | 
	 
    
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
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	 ASM IP Holding B.V. | 
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
	 Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus | 
	 
    
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	 ASM IP Holding B.V. | 
	 Method of depositing epitaxial material, structure formed using the method, and system for performing the method | 
	 
    
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	 ASM IP Holding B.V. | 
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	 Novellus Systems, Inc | 
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	 Jul 31 2012 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Apparatus and method for calculating a wafer position in a processing chamber under process conditions | 
	 
    
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	 ASM IP Holding B.V. | 
	 Radiation shielding for a substrate holder | 
	 
    
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	 Aug 28 2012 | 
	 ASM IP Holding B.V. | 
	 Systems and methods for mass flow controller verification | 
	 
    
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	 ASM IP Holdings B.V. | 
	 Semiconductor device dielectric interface layer | 
	 
    
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	 ASM IP HOLDING B V  | 
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	 ASM IP Holding B.V. | 
	 Method for treatment of deposition reactor | 
	 
    
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	 Sep 27 2013 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Semiconductor structure and device and methods of forming same using selective epitaxial process | 
	 
    
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	 Jun 27 2012 | 
	 ASM IP Holding B.V. | 
	 Susceptor heater and method of heating a substrate | 
	 
    
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	 Novellus Systems, Inc. | 
	 Method and apparatus for electroplating | 
	 
    
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	 Sep 26 2012 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same | 
	 
    
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	 ASM IP Holding B.V. | 
	 Chamber sealing member | 
	 
    
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	 Oct 27 2011 | 
	 ASM IP HOLDING B V  | 
	 Heater jacket for a fluid line | 
	 
    
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	 Apr 04 2012 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Metal oxide protective layer for a semiconductor device | 
	 
    
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	 Apr 06 2009 | 
	 ASM IP HOLDING B V  | 
	 Semiconductor processing reactor and components thereof | 
	 
    
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	 Novellus Systems, Inc. | 
	 Control of electrolyte hydrodynamics for efficient mass transfer during electroplating | 
	 
    
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	 Aug 14 2013 | 
	 ASM IP Holding B.V. | 
	 Methods of forming films including germanium tin and structures and devices including the films | 
	 
    
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	 ASM IP Holding B.V | 
	 Lockout tagout for semiconductor vacuum valve | 
	 
    
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	 Jul 22 2013 | 
	 ASM IP Holding B.V. | 
	 Semiconductor reaction chamber with plasma capabilities | 
	 
    
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	 Mar 18 2014 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for performing uniform processing in gas system-sharing multiple reaction chambers | 
	 
    
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	 May 29 2013 | 
	 Novellus Systems, Inc. | 
	 Apparatus for advanced packaging applications | 
	 
    
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	 Nov 10 2015 | 
	 ASM IP HOLDING B V  | 
	 Method for forming dielectric film in trenches by PEALD using H-containing gas | 
	 
    
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	 Jul 02 2010 | 
	 Novellus Systems, Inc. | 
	 Control of electrolyte hydrodynamics for efficient mass transfer during electroplating | 
	 
    
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	 Feb 13 2015 | 
	 ASM IP Holding B.V. | 
	 Method for forming film having low resistance and shallow junction depth | 
	 
    
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	 Mar 08 2013 | 
	 ASM IP Holding B.V. | 
	 Pulsed remote plasma method and system | 
	 
    
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	 Dec 12 2012 | 
	 Novellus Systems, Inc | 
	 Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating | 
	 
    
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	 Aug 01 2014 | 
	 ASM IP Holding B.V. | 
	 Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum | 
	 
    
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	 Oct 09 2013 | 
	 ASM IP Holding B.V; ASM IP HOLDING B V  | 
	 Method for forming Ti-containing film by PEALD using TDMAT or TDEAT | 
	 
    
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	 Jul 27 2012 | 
	 ASM IP HOLDING B V  | 
	 System and method for gas-phase sulfur passivation of a semiconductor surface | 
	 
    
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	 Mar 08 2013 | 
	 ASM IP Holding B.V. | 
	 Method and systems for in-situ formation of intermediate reactive species | 
	 
    
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	 Sep 12 2012 | 
	 ASM IP Holding B.V. | 
	 Process gas management for an inductively-coupled plasma deposition reactor | 
	 
    
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	 Nov 13 2013 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming conformal carbon films, structures conformal carbon film, and system of forming same | 
	 
    
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	 Dec 21 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming silicon oxide cap layer for solid state diffusion process | 
	 
    
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	 Jul 02 2010 | 
	 Novellus Systems, Inc | 
	 Cross flow manifold for electroplating apparatus | 
	 
    
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	 Dec 28 2015 | 
	 ASM IP Holding B.V. | 
	 Continuous process incorporating atomic layer etching | 
	 
    
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	 Dec 26 2012 | 
	 ASM IP Holding B.V. | 
	 Single-and dual-chamber module-attachable wafer-handling chamber | 
	 
    
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	 Aug 14 2015 | 
	 ASM IP Holding B.V. | 
	 Methods of forming highly p-type doped germanium tin films and structures and devices including the films | 
	 
    
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	 Oct 07 2014 | 
	 ASM IP Holding B.V. | 
	 Variable conductance gas distribution apparatus and method | 
	 
    
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	 Aug 28 2012 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Systems and methods for dynamic semiconductor process scheduling | 
	 
    
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	 May 01 2013 | 
	 Lam Research Corporation | 
	 Anisotropic high resistance ionic current source (AHRICS) | 
	 
    
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	 Aug 25 2015 | 
	 ASM IP HOLDING B V  | 
	 Method for forming aluminum nitride-based film by PEALD | 
	 
    
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	 Dec 28 2015 | 
	 ASM IP Holding B.V. | 
	 Method of atomic layer etching using functional group-containing fluorocarbon | 
	 
    
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	 Feb 19 2016 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | 
	 
    
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	 Jul 12 2013 | 
	 ASM IP Holding B.V. | 
	 Method and system to reduce outgassing in a reaction chamber | 
	 
    
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	 Aug 14 2013 | 
	 ASM IP Holding B.V. | 
	 Structures and devices including germanium-tin films and methods of forming same | 
	 
    
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	 Jul 14 2016 | 
	 ASM IP HOLDING B V  | 
	 Method of cyclic dry etching using etchant film | 
	 
    
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	 Jun 22 2011 | 
	 ASM Japan K.K. | 
	 Method for positioning wafers in multiple wafer transport | 
	 
    
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	 Jul 28 2016 | 
	 ASM IP HOLDING B V  | 
	 Method and apparatus for filling a gap | 
	 
    
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	 Mar 19 2015 | 
	 Lam Research Corporation | 
	 Control of electrolyte flow dynamics for uniform electroplating | 
	 
    
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	 Dec 12 2012 | 
	 Novellus Systems, Inc. | 
	 Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating | 
	 
    
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	 Jul 08 2016 | 
	 ASM IP HOLDING B V  | 
	 Selective film deposition method to form air gaps | 
	 
    
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	 Jul 28 2016 | 
	 ASM IP HOLDING B V  | 
	 Method and apparatus for filling a gap | 
	 
    
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	 Aug 21 2014 | 
	 ASM IP Holding B.V. | 
	 Method and system for in situ formation of gas-phase compounds | 
	 
    
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	 Nov 19 2014 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for depositing thin film | 
	 
    
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	 Oct 28 2011 | 
	 ASM IP HOLDING B V  | 
	 Process feed management for semiconductor substrate processing | 
	 
    
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	 May 29 2013 | 
	 Novellus Systems, Inc. | 
	 Apparatus for advanced packaging applications | 
	 
    
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	 Jul 13 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for protecting layer by forming hydrocarbon-based extremely thin film | 
	 
    
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	 Dec 22 2014 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Semiconductor device and manufacturing method thereof | 
	 
    
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	 Dec 01 2015 | 
	 ASM IP HOLDING B V  | 
	 Methods of forming silicon germanium tin films and structures and devices including the films | 
	 
    
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	 Oct 15 2015 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Method for depositing dielectric film in trenches by PEALD | 
	 
    
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	 Dec 15 2016 | 
	 ASM IP HOLDING B V  | 
	 Method of forming a structure on a substrate | 
	 
    
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	 Sep 29 2015 | 
	 ASM IP Holding B.V. | 
	 Variable adjustment for precise matching of multiple chamber cavity housings | 
	 
    
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	 Aug 01 2006 | 
	 Tokyo Electron Limited; SUMITOMO OSAKA CEMENT CO , LTD  | 
	 Attracting plate of an electrostatic chuck for semiconductor manufacturing | 
	 
    
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	 Oct 10 2007 | 
	 ASM IP HOLDING B V  | 
	 Reactant source vessel | 
	 
    
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	 Oct 21 2010 | 
	 Novellus Systems, Inc | 
	 Electroplating flow shaping plate having offset spiral hole pattern | 
	 
    
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	 Jan 20 2010 | 
	 CELADON SYSTEMS, INC  | 
	 Grooved wire support for a probe test core | 
	 
    
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	 Jul 01 2011 | 
	 Applied Materials, Inc | 
	 Flow blocker plate | 
	 
    
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	 Apr 21 2011 | 
	 Panasonic Corporation | 
	 Electrostatic atomized water particle generating module | 
	 
    
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	 Dec 31 2013 | 
	 CELADON SYSTEMS, INC  | 
	 Support for a probe test core | 
	 
    
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	 Mar 28 2013 | 
	 HIRATA CORPORATION | 
	 Top cover of a load lock chamber | 
	 
    
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	 Mar 01 2013 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Susceptor | 
	 
    
	 | D790489,  | 
	 Jul 08 2015 | 
	 Ebara Corporation | 
	 Vacuum contact pad | 
	 
    
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	 Aug 18 2015 | 
	 Tokyo Electron Limited | 
	 Electrostatic chuck for semiconductor manufacturing equipment | 
	 
    
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	 Aug 06 2015 | 
	 Pall Corporation | 
	 Electrostatic chuck for semiconductor manufacturing equipment | 
	 
    
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	 Aug 18 2015 | 
	 Tokyo Electron Limited | 
	 Electrostatic chuck for semiconductor manufacturing equipment | 
	 
    
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	 Apr 07 2017 | 
	 ASM IP HOLDING B V ; ASM IP Holding B.V. | 
	 Susceptor for semiconductor substrate processing apparatus | 
	 
    
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	 Dec 12 2016 | 
	 Ebara Corporation | 
	 Elastic membrane for semiconductor wafer polishing | 
	 
    
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	 Dec 11 2017 | 
	 Applied Materials, Inc | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
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	 Aug 31 2017 | 
	 HITACHI HIGH-TECH CORPORATION | 
	 Electrode plate for a plasma processing apparatus | 
	 
    
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	 Sep 30 2016 | 
	 Applied Materials, Inc. | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
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	 May 17 2016 | 
	 Electro Scientific Industries, Inc | 
	 Component carrier plate | 
	 
    
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	 Mar 09 2018 | 
	 Applied Materials, Inc | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
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	 Feb 01 2018 | 
	 ASM IP Holding B.V. | 
	 Gas supply plate for semiconductor manufacturing apparatus | 
	 
    
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	 Oct 05 2017 | 
	 Applied Materials, Inc. | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
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	 Aug 24 2017 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Heater electrical connector and adapter | 
	 
    
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	 Mar 09 2018 | 
	 Applied Materials, Inc. | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
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	 Jan 24 2018 | 
	 ASM IP HOLDING B V  | 
	 Metal clamp | 
	 
    
	 | D908645,  | 
	 Aug 26 2019 | 
	 Applied Materials, Inc | 
	 Sputtering target for a physical vapor deposition chamber | 
	 
    
	 | D913977,  | 
	 Dec 12 2016 | 
	 Ebara Corporation | 
	 Elastic membrane for semiconductor wafer polishing | 
	 
    
	 | D913980,  | 
	 Feb 01 2018 | 
	 ASM IP Holding B.V. | 
	 Gas supply plate for semiconductor manufacturing apparatus | 
	 
    
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	 Jun 05 2019 | 
	 ASM IP Holding B.V. | 
	 Device for controlling a temperature of a gas supply unit | 
	 
    
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	 Aug 22 2019 | 
	 ASM IP Holding B.V. | 
	 Gas distributor | 
	 
    
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	 Jun 27 2019 | 
	 ASM IP Holding B.V. | 
	 Showerhead vacuum transport | 
	 
    
	 | D935572,  | 
	 May 24 2019 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Gas channel plate | 
	 
    
	 | D937329,  | 
	 Mar 23 2020 | 
	 Applied Materials, Inc | 
	 Sputter target for a physical vapor deposition chamber | 
	 
    
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	 Dec 02 2020 | 
	 Applied Materials, Inc | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
	 | D940837,  | 
	 Aug 22 2019 | 
	 ASM IP Holding B.V. | 
	 Electrode | 
	 
    
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	 Jun 14 2019 | 
	 ASM IP Holding B.V. | 
	 Shower plate | 
	 
    
	 | D946638,  | 
	 Dec 11 2017 | 
	 Applied Materials, Inc. | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
	 | D947913,  | 
	 May 17 2019 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Susceptor shaft | 
	 
    
	 | D948463,  | 
	 Oct 24 2018 | 
	 ASM IP Holding B.V. | 
	 Susceptor for semiconductor substrate supporting apparatus | 
	 
    
	 | D949319,  | 
	 Aug 22 2019 | 
	 ASM IP Holding B.V. | 
	 Exhaust duct | 
	 
    
	 | D965044,  | 
	 Aug 19 2019 | 
	 ASM IP Holding B.V.; ASM IP HOLDING B V  | 
	 Susceptor shaft | 
	 
    
	 | D965524,  | 
	 Aug 19 2019 | 
	 ASM IP Holding B.V. | 
	 Susceptor support | 
	 
    
	 | D966357,  | 
	 Dec 02 2020 | 
	 Applied Materials, Inc. | 
	 Target profile for a physical vapor deposition chamber target | 
	 
    
	 | D970566,  | 
	 Mar 23 2020 | 
	 Applied Materials, Inc. | 
	 Sputter target for a physical vapor deposition chamber | 
	 
    
	 | D975665,  | 
	 May 17 2019 | 
	 ASM IP Holding B.V. | 
	 Susceptor shaft | 
	 
    
	 | D979506,  | 
	 Aug 22 2019 | 
	 ASM IP Holding B.V. | 
	 Insulator | 
	 
    
	 | D980813,  | 
	 May 11 2021 | 
	 ASM IP HOLDING B V  | 
	 Gas flow control plate for substrate processing apparatus | 
	 
    
	 | D980814,  | 
	 May 11 2021 | 
	 ASM IP HOLDING B V  | 
	 Gas distributor for substrate processing apparatus | 
	 
    
	 | D981973,  | 
	 May 11 2021 | 
	 ASM IP HOLDING B V  | 
	 Reactor wall for substrate processing apparatus | 
	 
    
	 | D984972,  | 
	 Mar 29 2021 | 
	 BEIJING NAURA MICROELECTRONICS EQUIPMENT CO , LTD  | 
	 Electrostatic chuck for semiconductor manufacture | 
	 
    
	 | ER1077,  | 
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	 | ER1413,  | 
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	 | ER1726,  | 
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	 | ER1922,  | 
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	 | ER195,  | 
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	 | ER2449,  | 
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	 | ER2608,  | 
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	 | ER2810,  | 
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	 | ER315,  | 
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	 | ER3883,  | 
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	 | ER3967,  | 
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	 | ER4264,  | 
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	 | ER4403,  | 
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	 | ER4489,  | 
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	 | ER4496,  | 
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	 | ER4646,  | 
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	 | ER4732,  | 
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	 | ER511,  | 
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	 | ER5378,  | 
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	 | ER6015,  | 
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	 | ER6103,  | 
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	 | ER6261,  | 
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	 | ER6328,  | 
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	 | ER6877,  | 
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	 | ER6881,  | 
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	 | ER7009,  | 
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	 | ER7365,  | 
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	 | ER7895,  | 
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	 | ER8714,  | 
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	 | ER8750,  | 
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	 | ER9386,  | 
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	 | ER9931,  | 
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