Patent
   D869409
Priority
Sep 30 2016
Filed
Nov 30 2018
Issued
Dec 10 2019
Expiry
Dec 10 2034
Assg.orig
Entity
unknown
15
73
n/a
The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a front elevation view thereof;

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged cross sectional view taken along line 8-8 in FIG. 2.

The dashed lines in FIGS. 1-8 represent disclaimed subject matter and form no part of the claimed design.

Wang, Xiaodong, Zhang, Fuhong, Riker, Martin Lee

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Sep 30 2016RIKER, MARTIN LEEApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0476820254 pdf
Sep 30 2016ZHANG, FUHONGApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0476820254 pdf
Sep 30 2016WANG, XIAODONGApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0476820254 pdf
Nov 30 2018Applied Materials, Inc.(assignment on the face of the patent)
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