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Patent
D837755
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Priority
Apr 16 2015
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Filed
Sep 21 2017
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Issued
Jan 08 2019
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Expiry
Jan 08 2034
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Assg.orig
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Entity
unknown
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23
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29
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n/a
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The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a left side elevation view thereof;
FIG. 6 is a front elevation view thereof;
FIG. 7 is a back elevation view thereof; and,
FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.
The broken lines in FIGS. 1-8 represent unclaimed matter that forms no part of the claimed design.
Liu, Yu, Zhang, Fuhong, Riker, Martin Lee
Patent |
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D908645, |
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D946638, |
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Patent |
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Mar 31 2000 |
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ASM IP Holding B.V. |
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KOKUSAI ELECTRIC CORPORATION |
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Mar 02 2015 |
MORGAN STANLEY SENIOR FUNDING, INC |
Wafer support ring |
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May 15 2013 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
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Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
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Aug 18 2015 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment |
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Apr 21 2015 |
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Target profile for a physical vapor deposition chamber target |
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Jun 18 2015 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D801942, |
Apr 16 2015 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D810705, |
Apr 01 2016 |
VEECO INSTRUMENTS, INC |
Self-centering wafer carrier for chemical vapor deposition |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a