PTO Wrapper PDF
Dossier Espace Google
Patent
   D908645
Priority
Aug 26 2019
Filed
Aug 26 2019
Issued
Jan 26 2021
Expiry
Jan 26 2036
Inventors
Savandaiah…
Assg.orig
Applied Ma…
Assg.curr
Applied Ma…
Entity
unknown
Referenced by
18
References
118
Maint.:
n/a
We claim the ornamental design for a sputtering target for a physical vapor deposition chamber, as shown and described.

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom perspective view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a right side plan view thereof.

FIG. 6 is a left side plan view thereof.

FIG. 7 is a front view thereof.

FIG. 8 is a back view thereof.

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

FIG. 10 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.

FIG. 11 is a bottom perspective view thereof.

FIG. 12 is a top plan view thereof.

FIG. 13 is a bottom plan view thereof.

FIG. 14 is a right side plan view thereof.

FIG. 15 is a left side plan view thereof.

FIG. 16 is a front view thereof.

FIG. 17 is a back view thereof; and,

FIG. 18 is an enlarged cross sectional view taken along line 18-18 in FIG. 13.

The broken lines show portions of a sputtering target for a physical vapor deposition chamber which form no part of the claimed design.

INVENTORS:

Savandaiah, Kirankumar Neelasandra, Gunther, David, Hoi, Siew Kit

THIS PATENT IS REFERENCED BY THESE PATENTS:
Patent Priority Assignee Title
11581166, Jul 31 2020 Applied Materials, Inc Low profile deposition ring for enhanced life
11842917, May 20 2019 Applied Materials, Inc. Process kit ring adaptor
D933725, Feb 08 2019 Applied Materials, Inc Deposition ring for a substrate processing chamber
D933726, Jul 31 2020 Applied Materials, Inc Deposition ring for a semiconductor processing chamber
D937329, Mar 23 2020 Applied Materials, Inc Sputter target for a physical vapor deposition chamber
D940765, Dec 02 2020 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D946638, Dec 11 2017 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D949116, May 03 2019 LUMILEDS HOLDING B.V.; LUMILEDS HOLDING B V Flexible circuit board with connectors
D966357, Dec 02 2020 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D970566, Mar 23 2020 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
D980176, Jun 02 2020 Applied Materials, Inc Substrate processing system carrier
D981970, Mar 04 2021 KOKUSAI ELECTRIC CORPORATION Substrate mounting plate for substrate processing apparatus
D989012, Sep 17 2020 Ebara Corporation Elastic membrane
ER1441,
ER4518,
ER6877,
ER6966,
ER8863,
THIS PATENT REFERENCES THESE PATENTS:
Patent Priority Assignee Title
10442056, Jun 29 2012 Ebara Corporation Substrate holding apparatus and polishing apparatus
10662520, Mar 29 2017 Applied Materials, Inc. Method for recycling substrate process components
10811232, Aug 08 2017 Applied Materials, Inc Multi-plate faceplate for a processing chamber
5320728, Mar 30 1990 Applied Materials, Inc. Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity
6086725, Apr 02 1998 Applied Materials, Inc. Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life
6114216, Nov 13 1996 Applied Materials, Inc Methods for shallow trench isolation
6390905, Mar 31 2000 Novellus Systems, Inc Workpiece carrier with adjustable pressure zones and barriers
6659850, Mar 31 2000 Novellus Systems, Inc Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece
6815352, Nov 09 1999 Shin-Etsu Chemical Co., Ltd. Silicon focus ring and method for producing the same
7402098, Oct 27 2006 Novellus Systems, Inc. Carrier head for workpiece planarization/polishing
8371904, Aug 08 2008 CHARTERED SEMICONDUCTOR MANUFACTURING PTE LTD ; GLOBALFOUNDRIES SINGAPORE PTE LTD Polishing with enhanced uniformity
8398833, Apr 14 2009 Honeywell International Inc Use of DC magnetron sputtering systems
9475996, Oct 17 2012 Centrifugal fluid ring plasma reactor
20040149567,
20050152089,
20050193952,
20070076345,
20080173541,
20080308416,
20090260982,
20100096261,
20100108500,
20100170786,
20120033340,
20130316628,
20140261180,
20150170888,
20150357169,
20160002776,
20160002788,
20160035547,
CN206573738,
D351450, May 19 1993 RITEFLITE PTY LIMITED Target for shooting
D363464, Aug 27 1992 Tokyo Electron Limited Electrode for a semiconductor processing apparatus
D376744, Aug 03 1994 Gerd Eisenblatter GmbH Support plate
D381030, Nov 21 1995 Applied Materials, Inc Sputtering target
D411516, Mar 15 1996 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
D423026, Aug 20 1997 Tokyo Electron Limited Quartz cover
D446231, Aug 21 2000 KOMATSU INDUSTRIES CORPORATION Nozzle for a plasma arc torch
D487254, May 24 2002 Nichia Corporation Light emitting diode
D496951, Jan 30 2003 Victor Equipment Company Mechanized cap for a plasma arc torch
D503729, Oct 31 2003 Nordson Corporation Nozzle for dispensing adhesives and sealants
D553104, Apr 21 2004 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
D557226, Aug 25 2005 HITACHI HIGH-TECH CORPORATION Electrode cover for a plasma processing apparatus
D559066, Oct 26 2004 JSR Corporation Polishing pad
D559993, Mar 30 2005 Tokyo Electron Limited Cover ring
D559994, Mar 30 2005 Tokyo Electron Limited Cover ring
D562856, Mar 30 2006 SULZER METCO US , INC Plasma gun anode
D570310, Aug 01 2006 Tokyo Electron Limited Attracting plate of an electrostatic chuck for semiconductor manufacturing
D571383, Jul 29 2005 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
D571831, Jul 29 2005 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
D571833, Jul 29 2005 Tokyo Electron Limited Top panel for microwave introduction window of plasma processing apparatus
D572733, Jul 29 2005 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
D582949, Dec 15 2006 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
D584591, Oct 26 2004 JSR Corporation Polishing pad
D592029, Oct 26 2004 JSR Corporation Polishing pad
D592030, Oct 26 2004 JSR Corporation Polishing pad
D600660, Mar 28 2008 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
D600989, Oct 26 2004 JSR Corporation Polishing pad
D614593, Jul 21 2008 ASM KOREA LTD Substrate support for a semiconductor deposition apparatus
D616389, Oct 20 2008 Ebara Corporation Vacuum contact pad
D616390, Mar 06 2009 Tokyo Electron Limited Quartz cover for manufacturing semiconductor wafers
D633452, Aug 27 2009 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
D649126, Oct 20 2008 Ebara Corporation Vacuum contact pad
D669509, Oct 19 2011 Kjellberg Stiftung, rechtsfahige Stiftung des burge rlichen Rechts; KJELLBERG STIFTUNG, RECHTSFAHIGE STIFTUNG DES BURGERLICHEN RECHTS Nozzle for torch
D678745, Jul 07 2011 Spinning insert polishing pad
D683806, Jan 12 2012 SureFire, LLC Front plate for a firearm sound suppressor
D687790, Mar 20 2012 Veeco Instruments INC Keyed wafer carrier
D687791, Mar 20 2012 Veeco Instruments INC Multi-keyed wafer carrier
D691974, Dec 22 2011 Tokyo Electron Limited Holding pad for transferring a wafer
D694790, Sep 20 2011 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
D703162, Oct 17 2012 Sumitomo Electric Industries, Ltd. Wafer holder for stepper
D716742, Sep 13 2013 ASM IP Holding B.V. Substrate supporter for semiconductor deposition apparatus
D724553, Sep 13 2013 ASM IP Holding B.V. Substrate supporter for semiconductor deposition apparatus
D732094, Jul 20 2012 Ivoclar Vivadent AG Firing plate for a dental furnace
D732145, Feb 04 2014 ASM IP Holding B.V. Shower plate
D733843, Feb 04 2014 ASM IP Holding, B.V. Shower plate
D741823, Jul 10 2013 KOKUSAI ELECTRIC CORPORATION Vaporizer for substrate processing apparatus
D741921, Apr 15 2014 Q-LINEA AB Positive mold for manufacturing a sample holding disc
D750728, Dec 02 2014 Laser target
D767234, Mar 02 2015 MORGAN STANLEY SENIOR FUNDING, INC Wafer support ring
D769200, May 15 2013 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
D770992, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Electrode cover for a plasma processing apparatus
D790039, Apr 08 2016 Applied Materials, Inc Showerhead for a semiconductor processing chamber
D790041, Jan 08 2016 ASM IP Holding B.V. Gas dispersing plate for semiconductor manufacturing apparatus
D793572, Jun 10 2015 Tokyo Electron Limited Electrode plate for plasma processing apparatus
D794753, Apr 08 2016 Applied Materials, Inc Showerhead for a semiconductor processing chamber
D795208, Aug 18 2015 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
D796458, Jan 08 2016 ASM IP Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
D797067, Apr 21 2015 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D797691, Apr 14 2016 Applied Materials, Inc Composite edge ring
D798248, Jun 18 2015 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D801942, Apr 16 2015 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D808349, May 15 2013 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
D810705, Apr 01 2016 VEECO INSTRUMENTS, INC Self-centering wafer carrier for chemical vapor deposition
D813181, Jul 26 2016 KOKUSAI ELECTRIC CORPORATION Cover of seal cap for reaction chamber of semiconductor
D825504, Apr 21 2015 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D825505, Jun 18 2015 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D830435, Dec 28 2015 NTN Corporation Inner ring for tapered roller bearing
D830981, Apr 07 2017 ASM IP HOLDING B V ; ASM IP Holding B.V. Susceptor for semiconductor substrate processing apparatus
D836572, Sep 30 2016 Applied Materials, Inc.; Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D837755, Apr 16 2015 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D839224, Dec 12 2016 Ebara Corporation Elastic membrane for semiconductor wafer polishing
D846514, May 03 2018 KOKUSAI ELECTRIC CORPORATION Boat of substrate processing apparatus
D851613, Oct 05 2017 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D868124, Dec 11 2017 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D869409, Sep 30 2016 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D877101, Mar 09 2018 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D888903, Dec 17 2018 Applied Materials, Inc Deposition ring for physical vapor deposition chamber
D891382, Feb 08 2019 Applied Materials, Inc Process shield for a substrate processing chamber
D893441, Jun 28 2019 Applied Materials, Inc Base plate for a processing chamber substrate support
D894137, Oct 05 2017 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1420846,
JP1421157,
JP1422692,
TW146490,
TW223429,
TW223430,
ASSIGNMENT RECORDS    Assignment records on the USPTO
/////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Aug 26 2019Applied Materials, Inc.(assignment on the face of the patent)
Aug 29 2019HOI, SIEW KITAPPLIED MATERIALS SINGAPORE TECHNOLOGY PTE LTD ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0502940566 pdf
Sep 11 2019SAVANDAIAH, KIRANKUMAR NEELASANDRAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0511640241 pdf
Oct 03 2019APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE LTD Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509170604 pdf
Nov 22 2019GUNTHER, DAVIDApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0511640241 pdf
MAINTENANCE FEES AND DATES:    Maintenance records on the USPTO
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule