Showerhead for a semiconductor processing chamber

Abstract

Description

FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevational view thereof indicated by lines 5-5 of FIG. 3, the rear elevational view being a mirror image.

FIG. 6 is a side elevational view thereof indicated by lines 6-6 of FIG. 3, the opposite side elevational view being a mirror image.

FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3.

FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 3.

FIG. 9 is an enlarged view of a portion of FIG. 7.

FIG. 10 is an enlarged view of another portion of FIG. 7; and,

FIG. 11 is an enlarged view of a portion of FIG. 8.

Claims

The ornamental design for a showerhead for a semiconductor processing chamber, as shown and described.