Substrate support for a semiconductor deposition apparatus

Abstract

Description

FIG. 1 is a perspective view of a substrate support that may be positioned in a reaction space of a chamber in a semiconductor deposition apparatus, showing our new design, wherein the four small circles on the top surface of the support represent through-holes;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left-side view thereof;

FIG. 5 is a right-side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a perspective view of the substrate support cut along a line passing through the center of the support with a partial enlarged view showing a transition from a center recess on the top surface of the support and an outer shoulder at the outer portion of the support; and,

FIG. 9 is a cross-sectional view thereof, along a line passing through the center of the support.

The ornamental design which is claimed is shown in solid lines in the drawings.

Claims

The ornamental design for a substrate support for a semiconductor deposition apparatus, as shown and described.