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Patent
D699200
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Priority
Sep 30 2011
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Filed
Mar 29 2012
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Issued
Feb 11 2014
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Expiry
Feb 11 2028
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Assg.orig
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Entity
unknown
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30
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22
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n/a
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The ornamental design for a electrode member for a plasma processing apparatus, as shown and described.
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FIG. 1 is a front view of an electrode member for a plasma processing apparatus showing my new design, the rear view being identical.
FIG. 2 is a right side view of the electrode member for a plasma processing apparatus of FIG. 1, the left side view being identical.
FIG. 3 is a top plan view of the electrode member for a plasma processing apparatus of FIG. 1.
FIG. 4 is a bottom plan view of the electrode member for a plasma processing apparatus of FIG. 1.
FIG. 5 is a cross sectional view of the electrode member for a plasma processing apparatus of FIG. 1 taken along line 1-1 of FIG. 3; and,
FIG. 6 is a perspective view of the electrode member for a plasma processing apparatus of FIG. 1.
Nagakubo, Keiichi
Patent |
Priority |
Assignee |
Title |
D715235, |
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D827592, |
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D836573, |
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HITACHI HIGH-TECH CORPORATION |
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D943539, |
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D981459, |
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D986190, |
Mar 19 2020 |
Applied Materials, Inc. |
Confinement plate for a substrate processing chamber |
Patent |
Priority |
Assignee |
Title |
6815352, |
Nov 09 1999 |
Shin-Etsu Chemical Co., Ltd. |
Silicon focus ring and method for producing the same |
6818097, |
Apr 22 2002 |
Nisshinbo Industries, Inc |
Highly heat-resistant plasma etching electrode and dry etching device including the same |
7479304, |
Feb 14 2002 |
Applied Materials, Inc |
Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
20030066484, |
|
|
|
D363464, |
Aug 27 1992 |
Tokyo Electron Limited |
Electrode for a semiconductor processing apparatus |
D404370, |
Aug 20 1997 |
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Cap for use in a semiconductor wafer heat processing apparatus |
D404372, |
Aug 20 1997 |
Tokyo Electron Limited |
Ring for use in a semiconductor wafer heat processing apparatus |
D546784, |
Sep 29 2005 |
Tokyo Electron Limited |
Attracting disc for an electrostatic chuck for semiconductor production |
D548705, |
Sep 29 2005 |
Tokyo Electron Limited |
Attracting disc for an electrostatic chuck for semiconductor production |
D556704, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Grounded electrode for a plasma processing apparatus |
D557226, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D606952, |
Jan 16 2009 |
ASM KOREA LTD |
Plasma inducing plate for semiconductor deposition apparatus |
D609652, |
Jul 22 2008 |
Tokyo Electron Limited |
Wafer attracting plate |
D609655, |
Oct 03 2008 |
NGK Insulators, Ltd. |
Electrostatic chuck |
D614593, |
Jul 21 2008 |
ASM KOREA LTD |
Substrate support for a semiconductor deposition apparatus |
D648289, |
Oct 21 2010 |
Novellus Systems, Inc |
Electroplating flow shaping plate having offset spiral hole pattern |
D654883, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D654884, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D655257, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D655259, |
Oct 21 2010 |
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Top plate for reactor for manufacturing semiconductor |
TW201001525, |
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TW471052, |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a