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Patent
   D699200
Priority
Sep 30 2011
Filed
Mar 29 2012
Issued
Feb 11 2014
Expiry
Feb 11 2028
Inventors
Nagakubo, …
Assg.orig
Tokyo Elec…
Assg.curr
Tokyo Elec…
Entity
unknown
Referenced by
32
References
22
Maint.:
n/a
The ornamental design for a electrode member for a plasma processing apparatus, as shown and described.

FIG. 1 is a front view of an electrode member for a plasma processing apparatus showing my new design, the rear view being identical.

FIG. 2 is a right side view of the electrode member for a plasma processing apparatus of FIG. 1, the left side view being identical.

FIG. 3 is a top plan view of the electrode member for a plasma processing apparatus of FIG. 1.

FIG. 4 is a bottom plan view of the electrode member for a plasma processing apparatus of FIG. 1.

FIG. 5 is a cross sectional view of the electrode member for a plasma processing apparatus of FIG. 1 taken along line 1-1 of FIG. 3; and,

FIG. 6 is a perspective view of the electrode member for a plasma processing apparatus of FIG. 1.
INVENTORS:

Nagakubo, Keiichi

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ER489,
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THIS PATENT REFERENCES THESE PATENTS:
Patent Priority Assignee Title
6815352, Nov 09 1999 Shin-Etsu Chemical Co., Ltd. Silicon focus ring and method for producing the same
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ASSIGNMENT RECORDS    Assignment records on the USPTO
//
Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 29 2012Tokyo Electron Limited(assignment on the face of the patent)
Apr 17 2012NAGAKUBO, KEIICHITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0282450021 pdf
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