Patent
   D986190
Priority
Mar 19 2020
Filed
Jan 24 2022
Issued
May 16 2023
Expiry
May 16 2038
Assg.orig
Entity
unknown
0
80
n/a
The ornamental design for a confinement plate for a substrate processing chamber, as shown and described.

FIG. 1 is a top isometric view of a confinement plate for a substrate processing chamber, showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a front elevation view thereof;

FIG. 5 is a rear elevation view thereof;

FIG. 6 is a right side elevation view thereof;

FIG. 7 is a left side elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 of FIG. 2.

The dashed lines in FIGS. 1-8 represent unclaimed environment forming no part of the claimed design.

Perry, Joseph

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Mar 20 2020PERRY, JOSEPHApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0588020638 pdf
Jan 24 2022Applied Materials, Inc.(assignment on the face of the patent)
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