Exhaust flow control ring for semiconductor deposition apparatus

Exhaust flow control ring for semiconductor deposition apparatus
D876504

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Patent D876504
Priority Apr 03 2017
Filed May 15 2017
Issued Feb 25 2020
Expiry Feb 25 2035
Inventors Kim, Seung…
Assg.orig ASM IP HOL…
Assg.curr ASM IP Hol… ASM IP HOL…
Entity unknown
Referenced by 260
References 635
Maint.: n/a

The ornamental design for an exhaust flow control ring for semiconductor deposition apparatus, as shown and described.

FIG. 1 is a perspective view of an exhaust flow control ring for semiconductor deposition apparatus,

FIG. 2 is a front elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 3 is a rear elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 4 is a left side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 5 is a right side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 6 is another view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 7 is another view of the exhaust flow control ring for semiconductor deposition apparatus; and,

FIG. 8 is a rear perspective view of the exhaust flow control ring for semiconductor deposition apparatus.

INVENTORS:

Kim, Seung Wook, Jung, Dong Rak, Lee, Julll, Jun, Sung Hoon

THIS PATENT IS REFERENCED BY THESE PATENTS:

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10844484,	Sep 22 2017	ASM IP Holding B.V.; ASM IP HOLDING B V	Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
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11004977,	Jul 19 2017	ASM IP Holding B.V.	Method for depositing a group IV semiconductor and related semiconductor device structures
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D979506,	Aug 22 2019	ASM IP Holding B.V.	Insulator
D979524,	Mar 19 2020	Applied Materials, Inc	Confinement liner for a substrate processing chamber
D980813,	May 11 2021	ASM IP HOLDING B V	Gas flow control plate for substrate processing apparatus
D980814,	May 11 2021	ASM IP HOLDING B V	Gas distributor for substrate processing apparatus
D981459,	Jun 16 2021	Ebara Corporation	Retaining ring for substrate
D981973,	May 11 2021	ASM IP HOLDING B V	Reactor wall for substrate processing apparatus
D986190,	Mar 19 2020	Applied Materials, Inc.	Confinement plate for a substrate processing chamber
ER287,
ER3866,
ER3967,
ER4489,
ER6015,
ER6328,
ER8750,
ER9340,

THIS PATENT REFERENCES THESE PATENTS:

Patent	Priority	Assignee	Title
10018920,	Mar 04 2016	TAIWAN SEMICONDUCTOR MANUFACTURING CO , LTD	Lithography patterning with a gas phase resist
10047435,	Apr 16 2014	ASM IP HOLDING B V	Dual selective deposition
10106892,	Aug 31 2017	GLOBALFOUNDRIES U S INC	Thermal oxide equivalent low temperature ALD oxide for dual purpose gate oxide and method for producing the same
10121671,	Aug 28 2015	Applied Materials, Inc	Methods of depositing metal films using metal oxyhalide precursors
10147600,	Nov 04 2011	ASM International N.V.	Methods for forming doped silicon oxide thin films
10177025,	Jul 28 2016	ASM IP HOLDING B V	Method and apparatus for filling a gap
10179947,	Nov 26 2013	ASM IP Holding B.V.; ASM IP HOLDING B V	Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition
10186420,	Nov 29 2016	ASM IP Holding B.V.	Formation of silicon-containing thin films
10190213,	Apr 21 2016	ASM IP HOLDING B V	Deposition of metal borides
10211308,	Oct 21 2015	ASM IP Holding B.V.	NbMC layers
10229833,	Nov 01 2016	ASM IP Holding B.V.; ASM IP HOLDING B V	Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
10236177,	Aug 22 2017	ASM IP HOLDING B V	Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures
10249524,	Aug 09 2017	ASM IP Holding B.V.	Cassette holder assembly for a substrate cassette and holding member for use in such assembly
10249577,	May 17 2016	ASM IP Holding B.V.; ASM IP HOLDING B V	Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method
10262859,	Mar 24 2016	ASM IP Holding B.V.	Process for forming a film on a substrate using multi-port injection assemblies
10269558,	Dec 22 2016	ASM IP Holding B.V.; ASM IP HOLDING B V	Method of forming a structure on a substrate
10276355,	Mar 12 2015	ASM IP Holding B.V.	Multi-zone reactor, system including the reactor, and method of using the same
10283353,	Mar 29 2017	ASM IP HOLDING B V	Method of reforming insulating film deposited on substrate with recess pattern
10290508,	Dec 05 2017	ASM IP Holding B.V.; ASM IP HOLDING B V	Method for forming vertical spacers for spacer-defined patterning
10312055,	Jul 26 2017	ASM IP Holding B.V.	Method of depositing film by PEALD using negative bias
10312129,	Sep 29 2015	ASM IP Holding B.V.	Variable adjustment for precise matching of multiple chamber cavity housings
10319588,	Oct 10 2017	ASM IP HOLDING B V	Method for depositing a metal chalcogenide on a substrate by cyclical deposition
10322384,	Nov 09 2015	ASM IP Holding B.V.; ASM IP HOLDING B V	Counter flow mixer for process chamber
10340125,	Mar 08 2013	ASM IP Holding B.V.	Pulsed remote plasma method and system
10340135,	Nov 28 2016	ASM IP Holding B.V.; ASM IP HOLDING B V	Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
10343920,	Mar 18 2016	ASM IP HOLDING B V	Aligned carbon nanotubes
10361201,	Sep 27 2013	ASM IP Holding B.V.	Semiconductor structure and device formed using selective epitaxial process
2266416,
3263502,
3913058,
4721533,	Aug 01 1986	VESUVIUS CRUCIBLE COMPANY, A PA CORP	Protective structure for an immersion pyrometer
4749416,	Aug 01 1986	VESUVIUS CRUCIBLE COMPANY, A PA CORP	Immersion pyrometer with protective structure for sidewall use
5002632,	Nov 22 1989	Texas Instruments Incorporated	Method and apparatus for etching semiconductor materials
5053247,	Feb 28 1989	Moore Epitaxial, Inc.; MOORE EPITAXIAL, INC	Method for increasing the batch size of a barrel epitaxial reactor and reactor produced thereby
5069591,	Mar 24 1988	Tokyo Electron Limited	Semiconductor wafer-processing apparatus
5082517,	Aug 23 1990	Texas Instruments Incorporated	Plasma density controller for semiconductor device processing equipment
5084126,	Dec 29 1988	Texas Instruments Incorporated	Method and apparatus for uniform flow distribution in plasma reactors
5158128,	Sep 01 1988	Sumitec, Inc.; Sumitomo Metal Industries, Ltd.	Thermocouple for a continuous casting machine
5273609,	Sep 12 1990	Texas Instruments Incorporated	Method and apparatus for time-division plasma chopping in a multi-channel plasma processing equipment
5281274,	Jun 22 1990	The United States of America as represented by the Secretary of the Navy	Atomic layer epitaxy (ALE) apparatus for growing thin films of elemental semiconductors
5305417,	Mar 26 1993	Texas Instruments Incorporated	Apparatus and method for determining wafer temperature using pyrometry
5320218,	Apr 07 1992	MURATEC AUTOMATION CO , LTD	Closed container to be used in a clean room
5338362,	Aug 29 1992	Tokyo Electron Limited	Apparatus for processing semiconductor wafer comprising continuously rotating wafer table and plural chamber compartments
5348774,	Aug 11 1993	AlliedSignal Inc.	Method of rapidly densifying a porous structure
5388945,	Aug 04 1992	International Business Machines Corporation	Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers
5397395,	Oct 29 1990	Canon Kabushiki Kaisha	Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same
5423942,	Jun 20 1994	Texas Instruments Incorporated	Method and apparatus for reducing etching erosion in a plasma containment tube
5431734,	Apr 28 1994	International Business Machines Corporation	Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control
5447294,	Jan 21 1993	Tokyo Electron Limited	Vertical type heat treatment system
5463176,	Jan 03 1994		Liquid waste oxygenation
5480818,	Feb 10 1992	Fujitsu Limited	Method for forming a film and method for manufacturing a thin film transistor
5482559,	Oct 21 1993	Tokyo Electron Limited	Heat treatment boat
5484484,	Jul 03 1993	Tokyo Electron Limited	Thermal processing method and apparatus therefor
5531218,	Apr 17 1993	INO Therapeutics GmbH	Apparatus for the monitored metering of no into patients' respiratory air
5586585,	Feb 27 1995	CROSSING AUTOMATION, INC	Direct loadlock interface
5667592,	Apr 16 1996	Novellus Systems, Inc	Process chamber sleeve with ring seals for isolating individual process modules in a common cluster
5685912,	Jun 20 1995	Sony Corporation	Pressure control system for semiconductor manufacturing equipment
5728425,	Mar 18 1992	Fujitsu Limited	Method for chemical vapor deposition of semiconductor films by separate feeding of source gases and growing of films
5730802,	May 20 1994	Sharp Kabushiki Kaisha	Vapor growth apparatus and vapor growth method capable of growing good productivity
5801945,	Jun 28 1996	Lam Research Corporation	Scheduling method for robotic manufacturing processes
5827420,	Jul 29 1997	World Precision Instruments, Inc.	Method and apparatus for the generation of nitric oxide
5863123,	Apr 24 1996	Samsung Electronics Co., Ltd.	Profile thermocouple of a transverse-type diffusion furnace
5866795,	Mar 17 1997	Applied Materials, Inc.	Liquid flow rate estimation and verification by direct liquid measurement
5879459,	Aug 29 1997	EUGENUS, INC	Vertically-stacked process reactor and cluster tool system for atomic layer deposition
5893741,	Feb 07 1997	National Science Council	Method for simultaneously forming local interconnect with silicided elevated source/drain MOSFET's
5904170,	May 14 1997	Applied Materials, Inc.	Pressure flow and concentration control of oxygen/ozone gas mixtures
5915562,	Jul 12 1996	ENTERGIS, INC	Transport module with latching door
5939886,	Oct 24 1994	Advanced Energy Industries, Inc	Plasma monitoring and control method and system
5992453,	Oct 17 1995		Flow-dividing arrangement
6000732,	Sep 22 1995	Entegris, Inc	Arrangement for locking and unlocking a door of a container
6035804,	Nov 07 1997	Tokyo Electron Limited	Process chamber apparatus
6053983,	May 08 1997	Tokyo Electron, Ltd.	Wafer for carrying semiconductor wafers and method detecting wafers on carrier
6072163,	Mar 05 1998	FSI International, Inc	Combination bake/chill apparatus incorporating low thermal mass, thermally conductive bakeplate
6074154,	Aug 29 1996	Tokyo Electron Limited	Substrate treatment system, substrate transfer system, and substrate transfer method
6079356,	Dec 02 1997	Applied Materials, Inc.	Reactor optimized for chemical vapor deposition of titanium
6079927,	Apr 22 1998	Varian Semiconductor Equipment Associates, Inc	Automated wafer buffer for use with wafer processing equipment
6095083,	Jun 27 1991	Applied Materials, Inc	Vacuum processing chamber having multi-mode access
6106625,	Dec 02 1997	Applied Materials, Inc.	Reactor useful for chemical vapor deposition of titanium nitride
6119710,	May 26 1999	PIVOTAL SYSTEMS CORPORATION	Method for wide range gas flow system with real time flow measurement and correction
6120008,	Apr 28 1998	LIFE INTERNATIONAL PRODUCTS, INC	Oxygenating apparatus, method for oxygenating a liquid therewith, and applications thereof
6143082,	Oct 08 1998	Novellus Systems, Inc.; Novellus Systems, Inc	Isolation of incompatible processes in a multi-station processing chamber
6143659,	Nov 18 1997	Samsung Electronics, Co., Ltd.	Method for manufacturing aluminum metal interconnection layer by atomic layer deposition method
6190037,	Feb 19 1999	Applied Materials, Inc	Non-intrusive, on-the-fly (OTF) temperature measurement and monitoring system
6190457,	Mar 22 1996	Taiyo Nippon Sanso Corporation	CVD system and CVD process
6203969,	Sep 14 1998	Tokyo Electron Limited	Resist processing apparatus which measures temperature of heat-sensing substrate and measuring method therein
6231290,	Mar 23 1998	Tokyo Electron	Processing method and processing unit for substrate
6238734,	Jul 08 1999	VERSUM MATERIALS US, LLC	Liquid precursor mixtures for deposition of multicomponent metal containing materials
6287988,	Mar 18 1997	TOSHIBA MEMORY CORPORATION	Semiconductor device manufacturing method, semiconductor device manufacturing apparatus and semiconductor device
6296710,	Oct 06 1999	Advanced Micro Devices, Inc.	Multi-port gas injector for a vertical furnace used in semiconductor processing
6335049,	Jan 03 2000	Micron Technology, Inc.	Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor
6346419,	Jun 26 2000	University Technology Corporation	Photolysis system for fast-response NO2 measurements and method therefor
6379466,	Jan 17 1992	Applied Materials, Inc.	Temperature controlled gas distribution plate
6390754,	May 21 1997	Tokyo Electron Limited	Wafer processing apparatus, method of operating the same and wafer detecting system
6439822,	Sep 22 1998	Tokyo Electron Limited	Substrate processing apparatus and substrate processing method
6450117,	Aug 07 2000	Applied Materials, Inc	Directing a flow of gas in a substrate processing chamber
6455098,	Mar 09 2000	Semix Incorporated	Wafer processing apparatus and method
6481945,	Jun 05 1998	ASM IP HOLDING B V	Method and device for transferring wafers
6498091,	Nov 01 2000	Applied Materials, Inc	Method of using a barrier sputter reactor to remove an underlying barrier layer
6502530,	Apr 26 2000	EVATEC AG	Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
6503365,	Apr 21 1998	Samsung Electronics Co., Ltd.	Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing
6506009,	Mar 16 2000	Applied Materials, Inc	Apparatus for storing and moving a cassette
6527884,	Jan 20 2000	KOKUSAI ELECTRIC CORPORATION	Hydrogen annealing process and apparatus therefor
6558517,	May 26 2000	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Physical vapor deposition methods
6582174,	Jan 26 1999	KOKUSAI ELECTRIC CORPORATION	Substrate processing apparatus and substrate processing method
6589352,	Dec 10 1999	Applied Materials, Inc	Self aligning non contact shadow ring process kit
6696367,	Sep 27 2002	ASM IP HOLDING B V	System for the improved handling of wafers within a process tool
6812157,	Jun 24 1999	ATOMIC PRECISION SYSTEMS, INC	Apparatus for atomic layer chemical vapor deposition
6815352,	Nov 09 1999	Shin-Etsu Chemical Co., Ltd.	Silicon focus ring and method for producing the same
6838122,	Jul 13 2001	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers
6841201,	Dec 21 2001	The Procter & Gamble Company; Procter and Gamble Company	Apparatus and method for treating a workpiece using plasma generated from microwave radiation
6861642,	Mar 26 2001	ASM IP HOLDING B V	Neutral particle beam processing apparatus
6867859,	Aug 03 1999	Lightwind Corporation	Inductively coupled plasma spectrometer for process diagnostics and control
6876191,	Feb 25 2002	ASM INTERNATIONAL N V	Apparatus for treating wafers, provided with a sensor box
6878206,	Jul 16 2001	Applied Materials, Inc.; Applied Materials, Inc	Lid assembly for a processing system to facilitate sequential deposition techniques
6883733,	Mar 28 2002	Novellus Systems, Inc.; Novellus Systems, Inc	Tapered post, showerhead design to improve mixing on dual plenum showerheads
6884475,	May 26 2000	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Chemical vapor deposition method for depositing a high k dielectric film
6916398,	Oct 26 2001	Applied Materials, Inc	Gas delivery apparatus and method for atomic layer deposition
6949204,	Aug 08 2000	Lam Research Corporation	Deformation reduction at the main chamber
6963052,	Jun 05 2002	SUMITOMO ELECTRIC INDUSTRIES, LTD	Heater module for semiconductor manufacturing equipment
6982103,	Jul 13 2001	Micron Technology, Inc.	Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer
6984591,	Apr 20 2000	GLOBALFOUNDRIES Inc	Precursor source mixtures
7049226,	Sep 26 2001	Applied Materials, Inc.	Integration of ALD tantalum nitride for copper metallization
7052584,	May 26 2000	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Method of forming a capacitor
7109098,	May 17 2005	Applied Materials, Inc	Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing
7144809,	Oct 15 1999	ASM International N.V.	Production of elemental films using a boron-containing reducing agent
7202512,	Feb 17 2004	Industrial Technology Research Institute	Construction of thin strain-relaxed SiGe layers and method for fabricating the same
7204886,	Nov 14 2002	Applied Materials, Inc	Apparatus and method for hybrid chemical processing
7208198,	Jul 13 2001	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer
7217617,	May 26 2000	U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT	Methods of forming a capacitor
7326656,	Sep 30 2004	TAHOE RESEARCH, LTD	Method of forming a metal oxide dielectric
7422636,	Mar 25 2005	Tokyo Electron Limited	Plasma enhanced atomic layer deposition system having reduced contamination
7456429,	Mar 29 2006	Eastman Kodak Company	Apparatus for atomic layer deposition
7467632,	Jan 05 2004	Hynix Semiconductor Inc.	Method for forming a photoresist pattern
7504344,	Jun 30 2005	ASM JAPAN K K	Method of forming a carbon polymer film using plasma CVD
7544398,	Apr 26 2005	Novellus Systems, Inc	Controlled nano-doping of ultra thin films
7712435,	Sep 28 2004	ASM JAPAN K K	Plasma processing apparatus with insulated gas inlet pore
7758698,	Nov 28 2006	Applied Materials, Inc.	Dual top gas feed through distributor for high density plasma chamber
7780789,	Oct 26 2001	Applied Materials, Inc	Vortex chamber lids for atomic layer deposition
7799706,	Feb 11 2008	Sungkyunkwan University Foundation for Corporate Collaboration	Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same
7833348,	Sep 21 2005	Sumco Corporation	Temperature control method of epitaxial growth apparatus
7894474,	Sep 10 1999	HOME CONTROL SINGAPORE PTE LTD	Remote control of an electronic device through downloading of a control interface of the electronic device in a mobile station
7919142,	Mar 22 2005	Sungkyunkwan University Foundation for Corporate Collaboration	Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same
7994070,	Sep 30 2010	Tokyo Electron Limited	Low-temperature dielectric film formation by chemical vapor deposition
8206506,	Jul 07 2008	Lam Research Corporation	Showerhead electrode
8402918,	Apr 07 2009	Lam Research Corporation	Showerhead electrode with centering feature
8419959,	Sep 18 2009	Lam Research Corporation	Clamped monolithic showerhead electrode
8465903,	Oct 06 2010	Applied Materials, Inc	Radiation patternable CVD film
8557712,	Dec 15 2008	Novellus Systems, Inc.	PECVD flowable dielectric gap fill
8573152,	Sep 03 2010	Lam Research Corporation	Showerhead electrode
8573154,	Jan 13 2010	Honda Motor Co., Ltd.	Plasma film forming apparatus
8586484,	Mar 04 2009	FUJI ELECTRIC CO , LTD	Film forming method and film forming apparatus
8647993,	Apr 11 2011	Novellus Systems, Inc.	Methods for UV-assisted conformal film deposition
8728956,	Apr 15 2010	Novellus Systems, Inc	Plasma activated conformal film deposition
8741062,	Apr 22 2008	Picosun Oy	Apparatus and methods for deposition reactors
8828886,	Oct 05 2009	TOHOKU UNIVERSITY	Low dielectric constant insulating film and method for forming the same
8859368,	Sep 04 2012	GLOBALFOUNDRIES Inc.; GLOBALFOUNDRIES Inc	Semiconductor device incorporating a multi-function layer into gate stacks
8876974,	Jul 28 2009	LIDADP CO , LTD	Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
8900999,	Aug 16 2013	Applied Materials, Inc.	Low temperature high pressure high H2/WF6 ratio W process for 3D NAND application
8980006,	Jan 11 2011	DMS CO , LTD	Apparatus for chemical vapor deposition
9004744,	Mar 30 2009	TECHNIBLEND, INC	Fluid mixer using countercurrent injection
9029244,	Jan 19 2005	ASM KOREA LTD	Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus
9076726,	Dec 31 2012	IMEC	Method for tuning the effective work function of a gate structure in a semiconductor device
9127358,	Jan 14 2011	Tokyo Electron Limited	Film forming apparatus
9184054,	Apr 25 2014	Taiwan Semiconductor Manufacturing Company, Ltd	Method for integrated circuit patterning
9252238,	Aug 18 2014	GLOBALFOUNDRIES U S INC	Semiconductor structures with coplanar recessed gate layers and fabrication methods
9267204,	Sep 04 2008	Tokyo Electron Limited	Film deposition apparatus, substrate processing apparatus, film deposition method, and storage medium
9287273,	Jun 06 2014	IMEC VZW	Method for manufacturing a semiconductor device comprising transistors each having a different effective work function
9309978,	Mar 14 2013	SIEMENS ENERGY, INC	Low head to stem ratio poppet valve
9337057,	Jul 21 2014	Samsung Electronics Co., Ltd.	Semiconductor device and method for fabricating the same
9362137,	Aug 18 2014	Samsung Electronics Co., Ltd.	Plasma treating apparatus, substrate treating method, and method of manufacturing a semiconductor device
9362180,	Feb 25 2014	GLOBALFOUNDRIES U S INC	Integrated circuit having multiple threshold voltages
9399228,	Feb 06 2013	Novellus Systems, Inc.	Method and apparatus for purging and plasma suppression in a process chamber
9523148,	Aug 25 2015	ASM IP HOLDING B V	Process for deposition of titanium oxynitride for use in integrated circuit fabrication
9570302,	Feb 10 2016	TAIWAN SEMICONDUCTOR MANUFACTURING CO , LTD	Method of patterning a material layer
9576952,	Feb 25 2014	GLOBALFOUNDRIES U S INC	Integrated circuits with varying gate structures and fabrication methods
9583345,	Dec 26 2013	Taiwan Semiconductor Manufacturing Company, Ltd	Method for overcoming broken line and photoresist scum issues in tri-layer photoresist patterning
9684234,	Mar 24 2011	UChicago Argonne, LLC	Sequential infiltration synthesis for enhancing multiple-patterning lithography
9748145,	Feb 29 2016	GLOBALFOUNDRIES U S INC	Semiconductor devices with varying threshold voltage and fabrication methods thereof
9786491,	Nov 12 2015	ASM IP HOLDING B V	Formation of SiOCN thin films
9820289,	Dec 18 2014	Sprint Spectrum LLC	Method and system for managing quantity of carriers in air interface connection based on type of content
9865455,	Sep 07 2016	Lam Research Corporation	Nitride film formed by plasma-enhanced and thermal atomic layer deposition process
9865815,	Sep 24 2015	Lam Research Coporation	Bromine containing silicon precursors for encapsulation layers
9868131,	Apr 07 2011	Picosun Oy	Atomic layer deposition with plasma source
9875893,	Nov 04 2011	ASM International N.V.	Methods for forming doped silicon oxide thin films
9951421,	Dec 10 2014	Lam Research Corporation	Inlet for effective mixing and purging
9997357,	Apr 15 2010	Lam Research Corporation	Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
9997373,	Dec 04 2014	Lam Research Corporation	Technique to deposit sidewall passivation for high aspect ratio cylinder etch
20010000141,
20010014267,
20010031541,
20010039922,
20010039966,
20010041250,
20010054388,
20020008270,
20020025688,
20020027945,
20020043337,
20020048634,
20020073922,
20020090735,
20020099470,
20020100418,
20020104751,
20020123237,
20020160112,
20030000647,
20030008528,
20030017265,
20030017266,
20030040120,
20030040196,
20030041971,
20030045961,
20030049372,
20030066482,
20030072882,
20030077857,
20030077883,
20030101938,
20030111013,
20030124792,
20030140851,
20030170945,
20030176074,
20030190804,
20030213435,
20030213560,
20030232511,
20040011504,
20040015300,
20040025787,
20040035358,
20040043544,
20040048452,
20040056017,
20040065255,
20040069226,
20040083975,
20040089236,
20040092073,
20040105738,
20040127069,
20040142577,
20040185177,
20040187784,
20040202786,
20040223893,
20040228968,
20040241322,
20050009325,
20050017272,
20050046825,
20050056218,
20050056780,
20050059261,
20050059264,
20050095859,
20050107627,
20050109461,
20050115946,
20050148162,
20050161434,
20050183827,
20050186688,
20050193948,
20050208217,
20050208219,
20050229849,
20050252447,
20050252455,
20050253061,
20050271812,
20050284991,
20060009044,
20060048710,
20060057799,
20060108221,
20060113038,
20060137608,
20060141155,
20060151117,
20060165892,
20060166428,
20060228898,
20060240187,
20060257563,
20060275710,
20070020160,
20070026162,
20070032045,
20070062646,
20070066038,
20070087296,
20070095283,
20070095286,
20070128858,
20070131168,
20070134919,
20070148347,
20070184179,
20070190362,
20070190782,
20070231488,
20070252233,
20070258855,
20070261868,
20070269983,
20070292974,
20080026162,
20080044938,
20080063798,
20080067146,
20080102205,
20080102208,
20080124945,
20080128726,
20080153308,
20080176335,
20080176412,
20080182411,
20080193643,
20080194105,
20080210278,
20080223130,
20080241052,
20080268171,
20080272424,
20080274369,
20080277647,
20090047433,
20090053900,
20090056112,
20090087585,
20090104594,
20090116936,
20090117717,
20090124131,
20090137055,
20090159002,
20090165721,
20090165722,
20090166616,
20090186571,
20090197411,
20090223441,
20090250004,
20090267225,
20090275210,
20090280248,
20090298257,
20090324989,
20100025766,
20100034719,
20100051584,
20100055312,
20100055316,
20100055898,
20100075037,
20100086703,
20100111648,
20100119439,
20100129548,
20100140684,
20100159707,
20100166630,
20100209598,
20100279008,
20110021033,
20110031562,
20110042200,
20110065289,
20110070740,
20110089166,
20110092077,
20110117492,
20110143461,
20110159200,
20110204025,
20110217838,
20110223334,
20110264250,
20120024223,
20120028469,
20120088031,
20120108048,
20120126300,
20120149207,
20120164846,
20120180719,
20120258257,
20120295449,
20120309181,
20120318773,
20130005147,
20130019944,
20130019945,
20130042811,
20130059078,
20130078376,
20130093048,
20130122722,
20130168353,
20130196502,
20130203267,
20130228225,
20130234203,
20130280891,
20130299944,
20130302520,
20130309876,
20130312663,
20130323859,
20140017414,
20140017908,
20140034632,
20140120678,
20140141165,
20140162401,
20140209976,
20140227444,
20140231922,
20140234992,
20140262193,
20140322862,
20150031218,
20150056821,
20150091134,
20150147875,
20150167162,
20150167165,
20150167705,
20150170975,
20150179640,
20150203961,
20150240357,
20150262828,
20150287591,
20150287612,
20150311151,
20150322569,
20150345018,
20150372056,
20160002776,
20160002786,
20160024655,
20160042954,
20160071750,
20160085003,
20160148800,
20160148806,
20160163558,
20160172189,
20160196970,
20160222504,
20160273106,
20160276212,
20160281223,
20160365414,
20160372321,
20160379826,
20170009367,
20170018570,
20170044664,
20170051405,
20170051406,
20170104061,
20170110601,
20170140925,
20170145564,
20170148918,
20170200622,
20170226636,
20170278705,
20170338111,
20170338133,
20170338134,
20170358482,
20170373188,
20180005814,
20180019165,
20180053660,
20180068862,
20180090583,
20180094351,
20180127876,
20180151588,
20180158716,
20180163305,
20180174801,
20180180509,
20180189923,
20180211834,
20180258532,
20180269057,
20180286638,
20180286672,
20180294187,
20180308701,
20180323055,
20180323056,
20180323059,
20180325414,
20180350587,
20180350588,
20180350620,
20180350653,
20180355480,
20180363131,
20180363139,
20180366314,
20190003050,
20190003052,
20190013199,
20190019670,
20190027573,
20190027583,
20190027584,
20190027605,
20190032209,
20190032998,
20190035605,
20190035647,
20190035810,
20190040529,
20190051544,
20190051548,
20190051555,
20190057857,
20190057858,
20190062907,
20190066978,
20190066997,
20190067003,
20190067004,
20190067014,
20190067016,
20190067094,
20190067095,
20190080903,
20190081072,
20190086807,
20190088555,
20190093221,
20190096708,
20190106788,
20190109002,
20190109009,
20190115206,
20190115237,
20190131124,
20190140067,
20190148224,
20190148398,
20190153593,
20190157054,
20190163056,
20190164763,
20190244803,
CN102373440,
142841,
D363464,	Aug 27 1992	Tokyo Electron Limited	Electrode for a semiconductor processing apparatus
D386076,	May 14 1996	Camco Manufacturing, Inc.; Camco Manufacturing, Inc	Awning clamp
D404370,	Aug 20 1997	Tokyo Electron Limited	Cap for use in a semiconductor wafer heat processing apparatus
D404372,	Aug 20 1997	Tokyo Electron Limited	Ring for use in a semiconductor wafer heat processing apparatus
D411516,	Mar 15 1996	Tokyo Electron Limited	Gas diffusion plate for electrode of semiconductor wafer processing apparatus
D494552,	Dec 12 2002	Tokyo Electron Limited	Exhaust ring for manufacturing semiconductors
D496008,	Dec 12 2002	Tokyo Electron Limited	Exhaust ring for manufacturing semiconductors
D556704,	Aug 25 2005	HITACHI HIGH-TECH CORPORATION	Grounded electrode for a plasma processing apparatus
D557226,	Aug 25 2005	HITACHI HIGH-TECH CORPORATION	Electrode cover for a plasma processing apparatus
D558021,	Jan 30 2003		Metal fabrication clamp
D559993,	Mar 30 2005	Tokyo Electron Limited	Cover ring
D559994,	Mar 30 2005	Tokyo Electron Limited	Cover ring
D571383,	Jul 29 2005	Tokyo Electron Limited	Top panel for microwave introduction window of a plasma processing apparatus
D571831,	Jul 29 2005	Tokyo Electron Limited	Top panel for microwave introduction window of a plasma processing apparatus
D583395,	Dec 15 2006	Tokyo Electron Limited	Cover for a heater stage of a plasma processing apparatus
D593585,	Jul 29 2005	Tokyo Electron Limited	Top panel for microwave introduction window of a plasma processing apparatus
D609652,	Jul 22 2008	Tokyo Electron Limited	Wafer attracting plate
D614593,	Jul 21 2008	ASM KOREA LTD	Substrate support for a semiconductor deposition apparatus
D616394,	Mar 06 2009	Tokyo Electron Limited	Support of wafer boat for manufacturing semiconductor wafers
D625977,	Feb 25 2010	Tower IPCO Company Limited	Spacer tool
D649986,	Aug 17 2010	Ebara Corporation	Sealing ring
D654882,	Oct 21 2010	Tokyo Electron Limited	Gas-separating plate for reactor for manufacturing semiconductor
D655260,	Oct 21 2010	Tokyo Electron Limited	Gas-separating plate for reactor for manufacturing semiconductor
D655261,	Oct 21 2010	Tokyo Electron Limited	Gas-separating plate for reactor for manufacturing semiconductor
D694790,	Sep 20 2011	Tokyo Electron Limited	Baffle plate for manufacturing semiconductor
D697038,	Sep 20 2011	Tokyo Electron Limited	Baffle plate
D709536,	Sep 30 2011	Tokyo Electron Limited	Focusing ring
D709537,	Sep 30 2011	Tokyo Electron Limited	Focusing ring
D716742,	Sep 13 2013	ASM IP Holding B.V.	Substrate supporter for semiconductor deposition apparatus
D724553,	Sep 13 2013	ASM IP Holding B.V.	Substrate supporter for semiconductor deposition apparatus
D733257,	Feb 14 2014	Hansgrohe SE	Overhead shower
D733262,	May 22 2014		Disposer of connection member for kitchen sink bowl
D736348,	Jul 07 2014	JIANGMEN TRIUMPH RAIN SHOWERS CO., LTD	Spray head for a shower
D745641,	Jun 20 2011	Neoperl GmbH	Stream straightener for faucet
D751176,	Aug 07 2014	Hansgrohe SE	Overhead shower
D793976,	May 15 2013	Ebara Corporation	Substrate retaining ring
D795208,	Aug 18 2015	Tokyo Electron Limited	Electrostatic chuck for semiconductor manufacturing equipment
D810705,	Apr 01 2016	VEECO INSTRUMENTS, INC	Self-centering wafer carrier for chemical vapor deposition
D819580,	Apr 01 2016	VEECO INSTRUMENTS, INC	Self-centering wafer carrier for chemical vapor deposition
D827592,	Jan 31 2017	HITACHI HIGH-TECH CORPORATION	Electrode cover for a plasma processing apparatus
D840364,	Jan 31 2017	HITACHI HIGH-TECH CORPORATION	Electrode cover for a plasma processing apparatus
DE3836696,
JP2001015698,
JP2001287180,
JP2002237375,
JP2003053688,
JP2004163293,
JP2006049352,
JP2008085129,
JP2008089320,
JP2008172083,
JP2010123843,
JP2011181681,
JP2012164736,
JP2016098406,
JP2017183242,
JP429313,
JP6319177,
JP7225214,
JP9064149,
KR100253664,
KR20100079920,
RE43023,	Apr 17 2000	KOKUSAI ELECTRIC CORPORATION	Dual loading port semiconductor processing equipment
SU1408319,
SU494614,
TW540093,
WO2004008491,
WO2005112082,
WO2006035281,
WO2007131051,
WO2008045972,
WO2015112728,
WO2018013778,
WO48579,

ASSIGNMENT RECORDS Assignment records on the USPTO

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Executed on	Assignor	Assignee	Conveyance	Frame	Reel	Doc
May 11 2017	LEE, JU IL	ASM IP HOLDING B V	ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS	042385	0173	pdf
May 11 2017	JUNG, DONG RAK	ASM IP HOLDING B V	ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS	042385	0173	pdf
May 12 2017	JUN, SUNG HOON	ASM IP HOLDING B V	ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS	042385	0173	pdf
May 15 2017		ASM IP Holding B.V.	(assignment on the face of the patent)
May 15 2017	KIM, SEUNG WOOK	ASM IP HOLDING B V	ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS	042385	0173	pdf

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