FIG. 1 is a top isometric view of a confinement liner for a substrate processing chamber showing my new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a front elevation view thereof;
FIG. 5 is a rear elevation view thereof;
FIG. 6 is a left side elevation view thereof;
FIG. 7 is a right side elevation view thereof; and,
FIG. 8 is an enlarged cross sectional view taken along line 8-8 of FIG. 2.
The broken lines shown in the drawings represent portions of a confinement liner for a substrate processing chamber that form no part of the claimed design.
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