FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to one embodiment of the novel design.
FIG. 2 is a bottom isometric view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a top plan view thereof.
FIG. 5 is a front elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a left side elevation view thereof.
FIG. 8 is a right side elevation view thereof.
FIG. 9 is cross-sectional view taken along line 9-9 of FIG. 3.
FIG. 10 is a top isometric view of a process shield for a substrate processing chamber, according to another embodiment of the novel design.
FIG. 11 is a bottom isometric view thereof.
FIG. 12 is a bottom plan view thereof.
FIG. 13 is a top plan view thereof.
FIG. 14 is a front elevation view thereof.
FIG. 15 is a back elevation view thereof.
FIG. 16 is a left side elevation view thereof.
FIG. 17 is a right side elevation view thereof.
FIG. 18 is cross-sectional view taken along line 18-18 of FIG. 12; and,
FIG. 19 is cross-sectional view taken along line 19-19 of FIG. 14.
The dashed lines in FIGS. 1-19 represent unclaimed environment forming no part of the claimed design.
| Patent |
Priority |
Assignee |
Title |
| 5320728, |
Mar 30 1990 |
Applied Materials, Inc. |
Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity |
| 8043487, |
Dec 12 2008 |
FUJIFILM Corporation |
Chamber shield for vacuum physical vapor deposition |
| 8371904, |
Aug 08 2008 |
CHARTERED SEMICONDUCTOR MANUFACTURING PTE LTD ; GLOBALFOUNDRIES SINGAPORE PTE LTD |
Polishing with enhanced uniformity |
| 9475996, |
Oct 17 2012 |
|
Centrifugal fluid ring plasma reactor |
| 20030029564, |
|
|
|
| 20120263569, |
|
|
|
| 20150357169, |
|
|
|
| 20170009367, |
|
|
|
| 20200090915, |
|
|
|
| D351450, |
May 19 1993 |
RITEFLITE PTY LIMITED |
Target for shooting |
| D376744, |
Aug 03 1994 |
Gerd Eisenblatter GmbH |
Support plate |
| D381030, |
Nov 21 1995 |
Applied Materials, Inc |
Sputtering target |
| D395483, |
Jun 07 1996 |
Riteflite Pty Limited |
Design for a target |
| D401252, |
Jan 27 1998 |
Semiconductor Equipment Technology |
Shield and cover for target of sputter coating apparatus |
| D403002, |
Jan 27 1998 |
Semiconductor Equipment Technology, Inc. |
Shield and cover for target of sputter coating apparatus |
| D403334, |
Jan 27 1998 |
Semiconductor Equipment Technology, Inc |
Shield and cover for target of sputter coating apparatus |
| D403337, |
Aug 05 1997 |
Applied Materials, Inc.; Applied Materials, Inc |
High conductance low wall deposition upper shield |
| D491963, |
Nov 20 2002 |
Tokyo Electron Limited |
Inner wall shield for a process chamber for manufacturing semiconductors |
| D559066, |
Oct 26 2004 |
JSR Corporation |
Polishing pad |
| D584591, |
Oct 26 2004 |
JSR Corporation |
Polishing pad |
| D592029, |
Oct 26 2004 |
JSR Corporation |
Polishing pad |
| D592030, |
Oct 26 2004 |
JSR Corporation |
Polishing pad |
| D600989, |
Oct 26 2004 |
JSR Corporation |
Polishing pad |
| D616389, |
Oct 20 2008 |
Ebara Corporation |
Vacuum contact pad |
| D665491, |
Jan 25 2012 |
Applied Materials, Inc. |
Deposition chamber cover ring |
| D678745, |
Jul 07 2011 |
|
Spinning insert polishing pad |
| D703162, |
Oct 17 2012 |
Sumitomo Electric Industries, Ltd. |
Wafer holder for stepper |
| D738451, |
Nov 11 2014 |
|
Golf ball target for chipping and putting |
| D741823, |
Jul 10 2013 |
KOKUSAI ELECTRIC CORPORATION |
Vaporizer for substrate processing apparatus |
| D741921, |
Apr 15 2014 |
Q-LINEA AB |
Positive mold for manufacturing a sample holding disc |
| D795208, |
Aug 18 2015 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment |
| D796458, |
Jan 08 2016 |
ASM IP Holding B.V. |
Gas flow control plate for semiconductor manufacturing apparatus |
| D810705, |
Apr 01 2016 |
VEECO INSTRUMENTS, INC |
Self-centering wafer carrier for chemical vapor deposition |
| D819580, |
Apr 01 2016 |
VEECO INSTRUMENTS, INC |
Self-centering wafer carrier for chemical vapor deposition |
| D877101, |
Mar 09 2018 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
| D888903, |
Dec 17 2018 |
Applied Materials, Inc |
Deposition ring for physical vapor deposition chamber |
| D891382, |
Feb 08 2019 |
Applied Materials, Inc |
Process shield for a substrate processing chamber |
| D913979, |
Aug 28 2019 |
Applied Materials, Inc |
Inner shield for a substrate processing chamber |
| D913980, |
Feb 01 2018 |
ASM IP Holding B.V. |
Gas supply plate for semiconductor manufacturing apparatus |
| JP1481081, |
|
|
|
| JP1509910, |
|
|
|
| JP1549498, |
|
|
|
| JP1570910, |
|
|
|
| JP1575876, |
|
|
|
| JP1584875, |
|
|
|
| JP1584906, |
|
|
|
| TW161030, |
|
|
|
| TW166431, |
|
|
|
| TW166552, |
|
|
|
| TW167109, |
|
|
|
| TW187432, |
|
|
|