|
The ornamental design for a sputtering target, as shown and described. |
FIG. 1 is a perspective view showing substantially the top of a sputtering target of the present invention;
FIG. 2 is a perspective view showing substantially the bottom of a sputtering target of the present invention;
FIG. 3 is a top view of a sputtering target of the present invention;
FIG. 4 is a side view of a sputtering target of the present invention;
FIG. 5 is a bottom view of a sputtering target of the present invention; and,
FIG. 6 is a cross-sectional view of a sputtering target of the present invention.
Patent | Priority | Assignee | Title |
11581166, | Jul 31 2020 | Applied Materials, Inc | Low profile deposition ring for enhanced life |
D529057, | Aug 16 2004 | MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC | Sputtering target |
D665491, | Jan 25 2012 | Applied Materials, Inc. | Deposition chamber cover ring |
D666227, | Sep 17 2008 | Transparent oil monitoring and maintenance cover | |
D699772, | Nov 16 2012 | Transparent oil monitoring and maintenance cover | |
D700227, | Nov 16 2012 | Transparent oil monitoring and maintenance cover | |
D725688, | Apr 22 2013 | Transparent oil monitoring and maintenance cover | |
D828190, | Oct 03 2016 | Sintokogio, Ltd.; Sintokogio, Ltd | Probe |
D830865, | Oct 03 2016 | Sintokogio, Ltd; Sintokogio, Ltd. | Probe |
D868124, | Dec 11 2017 | Applied Materials, Inc | Target profile for a physical vapor deposition chamber target |
D876299, | Feb 02 2018 | AMSTED Rail Company, Inc | Vented brake cylinder |
D894137, | Oct 05 2017 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D902165, | Mar 09 2018 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
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D933725, | Feb 08 2019 | Applied Materials, Inc | Deposition ring for a substrate processing chamber |
D933726, | Jul 31 2020 | Applied Materials, Inc | Deposition ring for a semiconductor processing chamber |
D937329, | Mar 23 2020 | Applied Materials, Inc | Sputter target for a physical vapor deposition chamber |
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D941371, | Mar 20 2020 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D941372, | Mar 20 2020 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D942516, | Feb 08 2019 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D946638, | Dec 11 2017 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D966357, | Dec 02 2020 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D970566, | Mar 23 2020 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
ER6877, |
Patent | Priority | Assignee | Title |
5460708, | Nov 30 1990 | Texas Instruments Incorporated | Semiconductor processing system |
5480530, | Mar 09 1993 | Leybold Aktiengesellschaft | Mask for covering the margin of a disk-shaped substrate |
5529673, | Feb 17 1995 | PRAXAIR S T TECHNOLOGY, INC | Mechanically joined sputtering target and adapter therefor |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Mar 20 1996 | TEPMAN, AVI | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 008131 | /0227 |
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