FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to the first embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a left side elevation view thereof.
FIG. 5 is a right side elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a front elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8′ of FIG. 2.
FIG. 9 is a top isometric view of a process shield for a substrate processing chamber, according to the second embodiment of the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a left side elevation view thereof.
FIG. 13 is a right side elevation view thereof.
FIG. 14 is a back elevation view thereof.
FIG. 15 is a front elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16′ of FIG. 10.
The dashed lines in FIGS. 1-16 represent unclaimed environment forming no part of the claimed design.
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