Patent
   D941372
Priority
Mar 20 2020
Filed
Mar 20 2020
Issued
Jan 18 2022
Expiry
Jan 18 2037
Assg.orig
Entity
unknown
7
55
n/a
The ornamental design for a process shield for a substrate processing chamber, as shown and described.

FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to the first embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a front elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8′ of FIG. 2.

FIG. 9 is a top isometric view of a process shield for a substrate processing chamber, according to the second embodiment of the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a left side elevation view thereof.

FIG. 13 is a right side elevation view thereof.

FIG. 14 is a back elevation view thereof.

FIG. 15 is a front elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16′ of FIG. 10.

The dashed lines in FIGS. 1-16 represent unclaimed environment forming no part of the claimed design.

Yoshidome, Goichi, Lavitsky, Ilya, Miller, Keith A

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 20 2020Applied Materials, Inc.(assignment on the face of the patent)
Mar 23 2020MILLER, KEITH A Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522220783 pdf
Mar 23 2020YOSHIDOME, GOICHIApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522220783 pdf
Mar 24 2020LAVITSKY, ILYAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0522220783 pdf
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