Patent
   D376744
Priority
Aug 03 1994
Filed
Aug 03 1994
Issued
Dec 24 1996
Expiry
Dec 24 2010
Assg.orig
Entity
unknown
22
8
n/a
The ornamental design for a support plate, as shown and described.

FIG. 1 is a top plan view of a support plate, showing my new design;

FIG. 2 is a front elevational view thereof, the rear, right side and left side elevational views being identical thereto; and,

FIG. 3 is a bottom plan view thereof.

Eisenblatter, Gerd

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ER6877,
Patent Priority Assignee Title
1525225,
2307312,
3252775,
4644610, Sep 06 1984 Disc shaped holder with an expandable center hole
4711610, Apr 04 1986 SOLITEC WAFER PROCESSING INC Balancing chuck
5201149, Jun 27 1990 GERD EISENBLATTER GMBH, A CORPORATION OF THE FEDERAL REPUBLIC OF GERMANY Lamellar end grinding tool
242053,
D282671, Nov 21 1983 PTL Engineering Circle drafting template
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jul 20 1994EISENBLATTER, GERDGerd Eisenblatter GmbHASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070990566 pdf
Aug 03 1994Gerd Eisenblatter GmbH(assignment on the face of the patent)
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