|
The ornamental design of a target for shooting, as shown and described. |
FIG. 1 is a perspective view of a target for shooting showing my new design;
FIG. 2 is a plan view thereof;
FIG. 3 is an inverted plan view thereof;
FIG. 4 is a cross-sectional view thereof, taken generally along the line 4--4 of FIG. 2;
FIG. 5 is a sectional perspective view thereof, taken generally along the line 5--5 of FIG. 1; and,
FIG. 6 is a side elevational view thereof.
Patent | Priority | Assignee | Title |
6068742, | Aug 23 1996 | Unaxis Balzers Aktiengesellschaft | Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source |
D750728, | Dec 02 2014 | Laser target | |
D853521, | Apr 27 2018 | Shooting clay | |
D868124, | Dec 11 2017 | Applied Materials, Inc | Target profile for a physical vapor deposition chamber target |
D869409, | Sep 30 2016 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D877101, | Mar 09 2018 | Applied Materials, Inc | Target profile for a physical vapor deposition chamber target |
D894137, | Oct 05 2017 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D902165, | Mar 09 2018 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D908645, | Aug 26 2019 | Applied Materials, Inc | Sputtering target for a physical vapor deposition chamber |
D933725, | Feb 08 2019 | Applied Materials, Inc | Deposition ring for a substrate processing chamber |
D933774, | Jan 17 2020 | OPCW Holdings Limited | Clay pigeon |
D937329, | Mar 23 2020 | Applied Materials, Inc | Sputter target for a physical vapor deposition chamber |
D940765, | Dec 02 2020 | Applied Materials, Inc | Target profile for a physical vapor deposition chamber target |
D941371, | Mar 20 2020 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D941372, | Mar 20 2020 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D942516, | Feb 08 2019 | Applied Materials, Inc | Process shield for a substrate processing chamber |
D946638, | Dec 11 2017 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D966357, | Dec 02 2020 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
D970566, | Mar 23 2020 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
D978276, | Nov 18 2022 | Jianmei, Wang | Laser target |
ER6877, |
Patent | Priority | Assignee | Title |
1203147, | |||
1227966, | |||
2148063, | |||
2250252, | |||
2418936, | |||
2650829, | |||
362744, | |||
899123, | |||
960359, | |||
26912, | |||
28298, |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
May 19 1993 | Riteflite Pty. Limited | (assignment on the face of the patent) | / | |||
Jun 09 1993 | MARYSKA, WALTER LUDWIG | RITEFLITE PTY LIMITED | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 006595 | /0171 |
Date | Maintenance Fee Events |
Date | Maintenance Schedule |