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Patent
D799437
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Priority
Aug 25 2015
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Filed
Feb 24 2016
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Issued
Oct 10 2017
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Expiry
Oct 10 2032
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Assg.orig
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Entity
unknown
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12
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25
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n/a
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The ornamental design for substrate retaining ring, as shown and described.
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FIG. 1 is a perspective view, observed from top of a substrate retaining ring showing our new design;
FIG. 2 is a perspective view, observed from bottom thereof;
FIG. 3 is a top view thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is a front view, rear view, right side view and left side view thereof;
FIG. 6 is an enlarged cross-section view, taken along the line 6-6 of part 6 of FIG. 3 thereof;
FIG. 7 is an enlarged cross-section view, taken along the line 7-7 of part 7 of FIG. 3 thereof; and,
FIG. 8 is an enlarged cross-section view, taken along the line 8-8 of part 8 of FIG. 3 thereof.
Yasuda, Hozumi, Fukushima, Makoto, Nabeya, Osamu, Namiki, Keisuke, Togashi, Shingo, Yamaki, Satoru
Patent |
Priority |
Assignee |
Title |
D836573, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Ring for a plasma processing apparatus |
D845568, |
May 14 2015 |
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D861449, |
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Wire repair and refurbishment tool |
D940670, |
Sep 26 2019 |
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Retainer ring for chemical mechanical polishing device |
D947789, |
May 22 2020 |
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Electric connection terminal |
D949116, |
May 03 2019 |
LUMILEDS HOLDING B.V.; LUMILEDS HOLDING B V |
Flexible circuit board with connectors |
D981459, |
Jun 16 2021 |
Ebara Corporation |
Retaining ring for substrate |
ER1922, |
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ER2449, |
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ER2608, |
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ER511, |
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ER9340, |
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HITACHI HIGH-TECH CORPORATION |
Grounded electrode for a plasma processing apparatus |
D709536, |
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Tokyo Electron Limited |
Focusing ring |
D766849, |
May 15 2013 |
Ebara Corporation |
Substrate retaining ring |
D770992, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a