Patent
   D799437
Priority
Aug 25 2015
Filed
Feb 24 2016
Issued
Oct 10 2017
Expiry
Oct 10 2032
Assg.orig
Entity
unknown
12
25
n/a
The ornamental design for substrate retaining ring, as shown and described.

FIG. 1 is a perspective view, observed from top of a substrate retaining ring showing our new design;

FIG. 2 is a perspective view, observed from bottom thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a front view, rear view, right side view and left side view thereof;

FIG. 6 is an enlarged cross-section view, taken along the line 6-6 of part 6 of FIG. 3 thereof;

FIG. 7 is an enlarged cross-section view, taken along the line 7-7 of part 7 of FIG. 3 thereof; and,

FIG. 8 is an enlarged cross-section view, taken along the line 8-8 of part 8 of FIG. 3 thereof.

Yasuda, Hozumi, Fukushima, Makoto, Nabeya, Osamu, Namiki, Keisuke, Togashi, Shingo, Yamaki, Satoru

Patent Priority Assignee Title
D836573, Jan 31 2017 HITACHI HIGH-TECH CORPORATION Ring for a plasma processing apparatus
D845568, May 14 2015 Ebara Corporation Pad holder for polishing apparatus
D861449, Feb 05 2018 QuickCinch, LLC Wire repair and refurbishment tool
D940670, Sep 26 2019 WILLBE S&T CO., LTD.; WILLBE S&T CO , LTD Retainer ring for chemical mechanical polishing device
D947789, May 22 2020 Hosiden Corporation Electric connection terminal
D949116, May 03 2019 LUMILEDS HOLDING B.V.; LUMILEDS HOLDING B V Flexible circuit board with connectors
D981459, Jun 16 2021 Ebara Corporation Retaining ring for substrate
ER1922,
ER2449,
ER2608,
ER511,
ER9340,
Patent Priority Assignee Title
6068548, Dec 17 1997 Intel Corporation Mechanically stabilized retaining ring for chemical mechanical polishing
6186880, Sep 29 1999 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
8491267, Aug 27 2010 Pratt & Whitney Canada Corp. Retaining ring arrangement for a rotary assembly
20030070757,
20030089697,
20040065412,
20040077167,
20050191947,
20050277375,
20070224864,
20080096467,
20110092142,
20140123469,
20150133038,
20160158910,
20160256981,
CN302820523,
D605206, May 07 2008 Komatsu Ltd Fan shroud for construction machinery
D638951, Nov 13 2009 DIASORIN ITALIA S P A Sample processing disk cover
D667561, Nov 13 2009 DIASORIN ITALIA S P A Sample processing disk cover
D699200, Sep 30 2011 Tokyo Electron Limited Electrode member for a plasma processing apparatus
D703160, Jan 27 2011 HITACHI HIGH-TECH CORPORATION Grounded electrode for a plasma processing apparatus
D709536, Sep 30 2011 Tokyo Electron Limited Focusing ring
D766849, May 15 2013 Ebara Corporation Substrate retaining ring
D770992, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Electrode cover for a plasma processing apparatus
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Feb 04 2016NABEYA, OSAMUEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 04 2016YASUDA, HOZUMIEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 04 2016FUKUSHIMA, MAKOTOEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 04 2016TOGASHI, SHINGOEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 04 2016NAMIKI, KEISUKEEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 04 2016YAMAKI, SATORUEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0378160281 pdf
Feb 24 2016Ebara Corporation(assignment on the face of the patent)
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