Patent
   D940670
Priority
Sep 26 2019
Filed
Mar 23 2020
Issued
Jan 11 2022
Expiry
Jan 11 2037
Assg.orig
Entity
unknown
3
19
n/a
I claim the ornamental design for a retainer ring for chemical mechanical polishing device, as shown and described.

FIG. 1 is a top perspective view of a retainer ring for chemical mechanical polishing device showing my new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left-side view thereof;

FIG. 5 is a right-side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is a bottom perspective view thereof.

The broken lines in the figures depict portions of the retainer ring for chemical mechanical polishing device which form no part of the claimed design.

Kim, Jinwoo

Patent Priority Assignee Title
D962183, Jul 11 2019 KOKUSAI ELECTRIC CORPORATION Retainer plate of top heater for wafer processing furnace
D962184, Jul 11 2019 KOKUSAI ELECTRIC CORPORATION Retainer plate of top heater for wafer processing furnace
D981459, Jun 16 2021 Ebara Corporation Retaining ring for substrate
Patent Priority Assignee Title
8517803, Sep 16 2009 SPM Technology, Inc.; SPM TECHNOLOGY, INC Retaining ring for chemical mechanical polishing
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D767234, Mar 02 2015 MORGAN STANLEY SENIOR FUNDING, INC Wafer support ring
D783922, Dec 08 2014 MORGAN STANLEY SENIOR FUNDING, INC Wafer support ring
D793976, May 15 2013 Ebara Corporation Substrate retaining ring
D794585, Oct 06 2015 Ebara Corporation Retainer ring for substrate
D799437, Aug 25 2015 Ebara Corporation Substrate retaining ring
D815385, Oct 13 2016 MORGAN STANLEY SENIOR FUNDING, INC Wafer support ring
D917825, Jul 16 2019 Entegris, Inc. Wafer support ring
//
Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 23 2020WILLBE S&T CO., LTD.(assignment on the face of the patent)
Mar 23 2020KIM, JINWOOWILLBE S&T CO , LTD ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0521950520 pdf
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