FIG. 1 is a top perspective view of a retainer ring for substrate showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top view thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is a front view thereof;
FIG. 6 is a rear view thereof;
FIG. 7 is a right side view thereof;
FIG. 8 is a left side view thereof;
FIG. 9 is an enlarged cross-section view thereof, taken along the line 9-9 of part 9 of FIG. 3;
FIG. 10 is an enlarged cross-section view thereof, taken along the line 10-10 of part 10 of FIG. 3;
FIG. 11 is an enlarged cross-section view thereof, taken along the line 11-11 of part 11 of FIG. 3;
FIG. 12 is an enlarged perspective view thereof, observed from an inside of the retainer ring and taken along the line 12,13-12,13 of FIG. 4; and,
FIG. 13 is an enlarged perspective view thereof, observed from an outside of the retainer ring and taken along the line 12,13-12,13 of FIG. 4.
The broken lines depict environmental subject matter only and form no part of the claimed design.
| Patent |
Priority |
Assignee |
Title |
| D836573, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Ring for a plasma processing apparatus |
| D845568, |
May 14 2015 |
Ebara Corporation |
Pad holder for polishing apparatus |
| D918848, |
Jul 18 2019 |
KOKUSAI ELECTRIC CORPORATION |
Retainer of ceiling heater for semiconductor fabrication apparatus |
| D940670, |
Sep 26 2019 |
WILLBE S&T CO., LTD.; WILLBE S&T CO , LTD |
Retainer ring for chemical mechanical polishing device |
| D947789, |
May 22 2020 |
Hosiden Corporation |
Electric connection terminal |
| D962183, |
Jul 11 2019 |
KOKUSAI ELECTRIC CORPORATION |
Retainer plate of top heater for wafer processing furnace |
| D962184, |
Jul 11 2019 |
KOKUSAI ELECTRIC CORPORATION |
Retainer plate of top heater for wafer processing furnace |
| D981459, |
Jun 16 2021 |
Ebara Corporation |
Retaining ring for substrate |
| Patent |
Priority |
Assignee |
Title |
| 5944593, |
Sep 03 1997 |
United Microelectronics Corp. |
Retainer ring for polishing head of chemical-mechanical polish machines |
| 6186880, |
Sep 29 1999 |
Semiconductor Equipment Technology |
Recyclable retaining ring assembly for a chemical mechanical polishing apparatus |
| 6224472, |
Jun 24 1999 |
Samsung Austin Semiconductor, LLC |
Retaining ring for chemical mechanical polishing |
| 6602116, |
Dec 30 1997 |
Applied Materials Inc. |
Substrate retaining ring |
| 6869335, |
Jul 08 2002 |
U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT |
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces |
| 7029375, |
Aug 31 2004 |
TECH Semiconductor Singapore Pte Ltd |
Retaining ring structure for edge control during chemical-mechanical polishing |
| 7029386, |
Jun 10 2004 |
M & R ENGINEERING, INC |
Retaining ring assembly for use in chemical mechanical polishing |
| 7186171, |
Apr 22 2005 |
Applied Materials, Inc |
Composite retaining ring |
| 7326105, |
Aug 31 2005 |
U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT |
Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces |
| 7344434, |
Nov 13 2003 |
Applied Materials, Inc |
Retaining ring with shaped surface |
| 7459057, |
May 15 1998 |
Applied Materials, Inc. |
Substrate retainer |
| 7819723, |
Mar 22 2007 |
Renesas Electronics Corporation |
Retainer ring and polishing machine |
| 8298046, |
Oct 21 2009 |
ESP SPARES, INC |
Retaining rings |
| 8517803, |
Sep 16 2009 |
SPM Technology, Inc.; SPM TECHNOLOGY, INC |
Retaining ring for chemical mechanical polishing |
| CN302820523, |
|
|
|
| D557226, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
| D559993, |
Mar 30 2005 |
Tokyo Electron Limited |
Cover ring |
| D697038, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate |
| D699200, |
Sep 30 2011 |
Tokyo Electron Limited |
Electrode member for a plasma processing apparatus |
| D729730, |
Jun 06 2013 |
BAND OF ANGELS ACORN FUND, LLC; MACRAE, J , MR ; GILLESPIE-BROWN, JON SIMON; MEYERHOFFER, THOMAS ERIK |
Power charging ring |
| D734377, |
Mar 28 2013 |
HIRATA CORPORATION |
Top cover of a load lock chamber |
| D766849, |
May 15 2013 |
Ebara Corporation |
Substrate retaining ring |