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Patent
D962183
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Priority
Jul 11 2019
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Filed
Dec 27 2019
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Issued
Aug 30 2022
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Expiry
Aug 30 2037
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Assg.orig
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Entity
unknown
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0
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24
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n/a
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The ornamental design for a retainer plate of top heater for wafer processing furnace, as shown and described.
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FIG. 1 is a front, top and right side perspective view of a retainer plate of top heater for wafer processing furnace showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof; and
FIG. 6 is a bottom plan view thereof.
FIG. 7 is a rear elevational view thereof; and,
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.
Kosugi, Tetsuya, Yamaguchi, Takatomo, Sugiura, Shinobu
Patent |
Priority |
Assignee |
Title |
Patent |
Priority |
Assignee |
Title |
10500694, |
Jan 11 2013 |
Applied Materials, Inc. |
Chemical mechanical polishing apparatus and methods |
6436228, |
May 15 1998 |
Applied Materials, Inc. |
Substrate retainer |
6659850, |
Mar 31 2000 |
Novellus Systems, Inc |
Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece |
7326105, |
Aug 31 2005 |
U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT |
Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces |
9227297, |
Mar 20 2013 |
Applied Materials, Inc |
Retaining ring with attachable segments |
20080171500, |
|
|
|
20170009367, |
|
|
|
20190024232, |
|
|
|
20190284696, |
|
|
|
D589471, |
Sep 28 2006 |
Tokyo Electron Limited |
Heater for manufacturing semiconductor |
D601521, |
Sep 28 2006 |
Tokyo Electron Limited |
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D633452, |
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D649126, |
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D716742, |
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D724553, |
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ASM IP Holding B.V. |
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D732094, |
Jul 20 2012 |
Ivoclar Vivadent AG |
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D769200, |
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Ebara Corporation |
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D794585, |
Oct 06 2015 |
Ebara Corporation |
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D797690, |
Mar 16 2015 |
NUFLARE TECHNOLOGY, INC |
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D798250, |
Dec 01 2015 |
NuFlare Technology, Inc. |
Heater |
D826185, |
Oct 14 2016 |
KOKUSAI ELECTRIC CORPORATION |
Ceiling heater for substrate processing apparatus |
D859332, |
Jun 29 2017 |
Ebara Corporation |
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D918848, |
Jul 18 2019 |
KOKUSAI ELECTRIC CORPORATION |
Retainer of ceiling heater for semiconductor fabrication apparatus |
D940670, |
Sep 26 2019 |
WILLBE S&T CO., LTD.; WILLBE S&T CO , LTD |
Retainer ring for chemical mechanical polishing device |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a