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Patent
   D918848
Priority
Jul 18 2019
Filed
Dec 27 2019
Issued
May 11 2021
Expiry
May 11 2036
Inventors
Kosugi, Te…
Assg.orig
KOKUSAI EL…
Assg.curr
KOKUSAI EL…
Entity
unknown
Referenced by
13
References
40
Maint.:
n/a
The ornamental design for a retainer of ceiling heater for semiconductor fabrication apparatus, as shown and described.

FIG. 1 is a front, top and right side perspective view of a retainer of ceiling heater for semiconductor fabrication apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof; and

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a rear elevational view.
INVENTORS:

Kosugi, Tetsuya, Yamaguchi, Takatomo, Sugiura, Shinobu

THIS PATENT IS REFERENCED BY THESE PATENTS:
Patent Priority Assignee Title
D940131, Jul 29 2019 Samsung Display Co., Ltd. Display panel
D954567, Jun 25 2019 Ebara Corporation Measurement jig
D958094, Jul 29 2019 Samsung Display Co., Ltd. Display panel
D959393, Sep 24 2020 KOKUSAI ELECTRIC CORPORATION Ceiling heater for substrate processing apparatus
D962183, Jul 11 2019 KOKUSAI ELECTRIC CORPORATION Retainer plate of top heater for wafer processing furnace
D962184, Jul 11 2019 KOKUSAI ELECTRIC CORPORATION Retainer plate of top heater for wafer processing furnace
D966276, Jul 29 2019 Samsung Display Co., Ltd. Display module for wearable device
D980177, Sep 24 2020 KOKUSAI ELECTRIC CORPORATION Ceiling heater for substrate processing apparatus
ER4116,
ER4518,
ER6791,
ER6966,
ER8863,
THIS PATENT REFERENCES THESE PATENTS:
Patent Priority Assignee Title
10500694, Jan 11 2013 Applied Materials, Inc. Chemical mechanical polishing apparatus and methods
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7326105, Aug 31 2005 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
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D601521, Sep 28 2006 Tokyo Electron Limited Heater for manufacturing semiconductor
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D633452, Aug 27 2009 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
D649126, Oct 20 2008 Ebara Corporation Vacuum contact pad
D732094, Jul 20 2012 Ivoclar Vivadent AG Firing plate for a dental furnace
D766849, May 15 2013 Ebara Corporation Substrate retaining ring
D769200, May 15 2013 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
D794585, Oct 06 2015 Ebara Corporation Retainer ring for substrate
D797690, Mar 16 2015 NUFLARE TECHNOLOGY, INC Heater for semiconductor manufacturing apparatus
D798250, Dec 01 2015 NuFlare Technology, Inc. Heater
D814432, Feb 09 2016 WiTricity Corporation Resonator coil
D825503, Jun 07 2017 WiTricity Corporation Resonator coil
D826185, Oct 14 2016 KOKUSAI ELECTRIC CORPORATION Ceiling heater for substrate processing apparatus
D859332, Jun 29 2017 Ebara Corporation Elastic membrane for semiconductor wafer polishing
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ASSIGNMENT RECORDS    Assignment records on the USPTO
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Dec 10 2019SUGIURA, SHINOBUKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0513750501 pdf
Dec 10 2019KOSUGI, TETSUYAKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0513750501 pdf
Dec 10 2019YAMAGUCHI, TAKATOMOKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0513750501 pdf
Dec 27 2019KOKUSAI ELECTRIC CORPORATION(assignment on the face of the patent)
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