Patent
   D600660
Priority
Mar 28 2008
Filed
Sep 26 2008
Issued
Sep 22 2009
Expiry
Sep 22 2023
Assg.orig
Entity
unknown
19
11
n/a
The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.

FIG. 1 is a perspective view;

FIG. 2 is a front view;

FIG. 3 is a rear view;

FIG. 4 is a right side view the left side being a mirror image thereof;

FIG. 5 is a plan view the bottom view being a mirror image thereof; and;

FIG. 6 is a sectional view along 66 of a front view of FIG. 2.

Sato, Izumi

Patent Priority Assignee Title
D716742, Sep 13 2013 ASM IP Holding B.V. Substrate supporter for semiconductor deposition apparatus
D724553, Sep 13 2013 ASM IP Holding B.V. Substrate supporter for semiconductor deposition apparatus
D798250, Dec 01 2015 NuFlare Technology, Inc. Heater
D868124, Dec 11 2017 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D869409, Sep 30 2016 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D877101, Mar 09 2018 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D894137, Oct 05 2017 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D902165, Mar 09 2018 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D908645, Aug 26 2019 Applied Materials, Inc Sputtering target for a physical vapor deposition chamber
D918848, Jul 18 2019 KOKUSAI ELECTRIC CORPORATION Retainer of ceiling heater for semiconductor fabrication apparatus
D937329, Mar 23 2020 Applied Materials, Inc Sputter target for a physical vapor deposition chamber
D940765, Dec 02 2020 Applied Materials, Inc Target profile for a physical vapor deposition chamber target
D946638, Dec 11 2017 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D966357, Dec 02 2020 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
D970566, Mar 23 2020 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
D980813, May 11 2021 ASM IP HOLDING B V Gas flow control plate for substrate processing apparatus
D980814, May 11 2021 ASM IP HOLDING B V Gas distributor for substrate processing apparatus
ER2011,
ER6877,
Patent Priority Assignee Title
5567986, Jun 04 1993 Diamond Electric Mfg. Co., Ltd. Heat sink
5718574, Mar 01 1995 ESC MEDICAL SYSTEMS, INC Heat treatment apparatus
6099302, Jun 23 1998 Samsung Electronics Co., Ltd. Semiconductor wafer boat with reduced wafer contact area
6575231, Aug 27 2002 Spiral step-shaped heat dissipating module
6716027, Jan 18 2001 Samsung Electronics Co., Ltd. Semiconductor wafer boat having stackable independently replaceable boat parts and vertical heat-treating apparatus comprising the same
7163393, Feb 02 2004 Sumitomo Mitsubishi Silicon Corporation Heat treatment jig for semiconductor silicon substrate
7204887, Oct 16 2000 Nippon Steel Corporation Wafer holding, wafer support member, wafer boat and heat treatment furnace
20030000472,
20040069453,
D404373, Aug 20 1997 Tokyo Electron Limited Fin for use in a semiconductor wafer heat processing apparatus
D404374, Aug 20 1997 Tokyo Electron Limited Fin for use in a semiconductor wafer heat processing apparatus
//
Executed onAssignorAssigneeConveyanceFrameReelDoc
Sep 26 2008Tokyo Electron Limited(assignment on the face of the patent)
Feb 26 2009SATO, IZUMITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0224470945 pdf
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule