Patent
   D845568
Priority
May 14 2015
Filed
Nov 13 2015
Issued
Apr 09 2019
Expiry
Apr 09 2034
Assg.orig
Entity
unknown
2
14
n/a
The ornamental design for a pad holder for polishing apparatus, as shown and described.

FIG. 1 is a first perspective view, observed from top of a pad holder for polishing apparatus showing our new design;

FIG. 2 is a second perspective view, observed from bottom thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a front view thereof;

FIG. 6 is a rear view thereof;

FIG. 7 is a right side view thereof; and,

FIG. 8 is a left side view thereof.

Ito, Kenya, Ishii, Yu, Ueda, Hirohiko

Patent Priority Assignee Title
D917813, Jul 19 2019 LG Electronics Inc Watertube for drum type washing machine gaskets
D981459, Jun 16 2021 Ebara Corporation Retaining ring for substrate
Patent Priority Assignee Title
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9842783, Oct 26 2011 Ebara Corporation Polishing method and polishing apparatus
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D583603, Nov 20 2007 Turnils AB Core for slat material for venetian blinds
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D794585, Oct 06 2015 Ebara Corporation Retainer ring for substrate
D799037, Oct 27 2015 Orthogrid Systems Holdings, LLC Grid positioning device
D799437, Aug 25 2015 Ebara Corporation Substrate retaining ring
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Nov 13 2015Ebara Corporation(assignment on the face of the patent)
Nov 30 2015ITO, KENYAEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0372260759 pdf
Dec 01 2015ISHII, YUEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0372260759 pdf
Dec 01 2015UEDA, HIROHIKOEbara CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0372260759 pdf
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