FIG. 1 is a front, top and right side perspective view of a cover of seal cap for reaction chamber of semiconductor showing my new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a front elevational view thereof;
FIG. 5 is a rear elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a left side elevational view; and,
FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 4.
Patent |
Priority |
Assignee |
Title |
D827592, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D840364, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D840981, |
Oct 20 2017 |
Avery Dennison Retail Information Services, LLC |
RFID inlay |
D854506, |
Mar 26 2018 |
Veeco Instruments INC |
Chemical vapor deposition wafer carrier with thermal cover |
D855027, |
Jan 22 2018 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber of semiconductor |
D858469, |
Mar 26 2018 |
Veeco Instruments INC |
Chemical vapor deposition wafer carrier with thermal cover |
D860146, |
Nov 30 2017 |
Veeco Instruments INC |
Wafer carrier with a 33-pocket configuration |
D860147, |
Mar 26 2018 |
Veeco Instruments INC |
Chemical vapor deposition wafer carrier with thermal cover |
D863239, |
Mar 26 2018 |
Veeco Instruments INC |
Chemical vapor deposition wafer carrier with thermal cover |
D866491, |
Mar 26 2018 |
Veeco Instruments INC |
Chemical vapor deposition wafer carrier with thermal cover |
D868124, |
Dec 11 2017 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D869409, |
Sep 30 2016 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target |
D872037, |
Aug 09 2017 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber for semiconductor manufacturing |
D877101, |
Mar 09 2018 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D891382, |
Feb 08 2019 |
Applied Materials, Inc |
Process shield for a substrate processing chamber |
D894137, |
Oct 05 2017 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target |
D902165, |
Mar 09 2018 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target |
D908645, |
Aug 26 2019 |
Applied Materials, Inc |
Sputtering target for a physical vapor deposition chamber |
D909322, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for use in semiconductor production apparatus |
D909323, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for use in semiconductor production apparatus |
D916037, |
May 18 2018 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber for semiconductor |
D931240, |
Jul 30 2019 |
Applied Materials, Inc |
Substrate support pedestal |
D933031, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for semiconductor production apparatus |
D933032, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for semiconductor production apparatus |
D933033, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for semiconductor production apparatus |
D933619, |
Oct 12 2018 |
VALQUA, LTD. |
Seal member for semiconductor production apparatus |
D937329, |
Mar 23 2020 |
Applied Materials, Inc |
Sputter target for a physical vapor deposition chamber |
D940765, |
Dec 02 2020 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D946638, |
Dec 11 2017 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target |
D966357, |
Dec 02 2020 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target |
D970566, |
Mar 23 2020 |
Applied Materials, Inc. |
Sputter target for a physical vapor deposition chamber |
D980813, |
May 11 2021 |
ASM IP HOLDING B V |
Gas flow control plate for substrate processing apparatus |
D980814, |
May 11 2021 |
ASM IP HOLDING B V |
Gas distributor for substrate processing apparatus |
ER6877, |
|
|
|