We claim the ornamental design for a cover of seal cap for reaction chamber for semiconductor manufacturing, as shown (and described).
FIG. 1 is a front, bottom and right side perspective view of a cover of seal cap for reaction chamber for semiconductor manufacturing showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof; and
FIG. 7 is a bottom plan view thereof.
FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 6; and,
FIG. 9 is a cross-sectional view take along line 9-9 in FIG. 7.