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Patent
D916037
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Priority
May 18 2018
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Filed
Nov 16 2018
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Issued
Apr 13 2021
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Expiry
Apr 13 2036
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Assg.orig
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Entity
unknown
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6
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9
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n/a
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We claim the ornamental design for a cover of seal cap for reaction chamber for semiconductor, as shown and described.
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FIG. 1 is a rear, top and left side perspective view of a cover of seal cap for reaction chamber for semiconductor showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a cross-sectional view thereof taken in the direction of line 8-8 in FIG. 2.
The broken lines are included for the purpose of illustrating portions of the article that form no part of the claimed design.
Sasaki, Takafumi, Yoshida, Hidenari, Okajima, Yusaku, Saido, Shuhei
Patent |
Priority |
Assignee |
Title |
D616390, |
Mar 06 2009 |
Tokyo Electron Limited |
Quartz cover for manufacturing semiconductor wafers |
D654883, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D654884, |
Oct 21 2010 |
Tokyo Electron Limited |
Top plate for reactor for manufacturing semiconductor |
D797067, |
Apr 21 2015 |
Applied Materials, Inc |
Target profile for a physical vapor deposition chamber target |
D813181, |
Jul 26 2016 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber of semiconductor |
D855027, |
Jan 22 2018 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber of semiconductor |
D872037, |
Aug 09 2017 |
KOKUSAI ELECTRIC CORPORATION |
Cover of seal cap for reaction chamber for semiconductor manufacturing |
JP1579504, |
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JP1598442, |
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Date |
Maintenance Fee Events |
n/a
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Maintenance Schedule |
n/a