Patent
   D981972
Priority
Mar 22 2021
Filed
Sep 21 2021
Issued
Mar 28 2023
Expiry
Mar 28 2038
Assg.orig
Entity
unknown
0
9
n/a
The ornamental design for an adiabatic plate for substrate processing appratus, as shown and described.

FIG. 1 is a front, top and right side perspective view of an adiabatic plate for substrate processing appratus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

Morita, Shinya, Murata, Satoru, Nakashima, Seiyo

Patent Priority Assignee Title
Patent Priority Assignee Title
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D654883, Oct 21 2010 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
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D655259, Oct 21 2010 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
D916037, May 18 2018 KOKUSAI ELECTRIC CORPORATION Cover of seal cap for reaction chamber for semiconductor
D924823, Jul 19 2018 KOKUSAI ELECTRIC CORPORATION Adiabatic plate for substrate processing apparatus
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Sep 07 2021MORITA, SHINYKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0626700115 pdf
Sep 13 2021NAKASHIMA, SEIYOKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0626700115 pdf
Sep 21 2021KOKUSAI ELECTRIC CORPORATION(assignment on the face of the patent)
Oct 12 2021MURATA, SATORUKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0626700115 pdf
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