Patent
   D954986
Priority
Oct 18 2019
Filed
Apr 16 2020
Issued
Jun 14 2022
Expiry
Jun 14 2037
Assg.orig
Entity
unknown
0
19
n/a
The ornamental design for an electrode cover for a plasma processing device, as shown and described.

FIG. 1 is a front, bottom and right side perspective view of an electrode cover for a plasma processing device according to the design;

FIG. 2 is a rear, bottom and right side perspective view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a rear view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3;

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9;

FIG. 11 is an enlarged front, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3; and,

FIG. 12 is an enlarged rear, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Nakatani, Shintarou

Patent Priority Assignee Title
Patent Priority Assignee Title
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JP1598998,
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Apr 16 2020HITACHI HIGH-TECH CORPORATION(assignment on the face of the patent)
May 26 2020NAKATANI, SHINTAROUHITACHI HIGH-TECH CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0528250030 pdf
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