Patent
   D616392
Priority
Mar 06 2009
Filed
Sep 02 2009
Issued
May 25 2010
Expiry
May 25 2024
Assg.orig
Entity
unknown
10
9
n/a
The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.

FIG. 1 is front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers illustrating my new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view thereof taken through line 88 of FIG. 6;

FIG. 9 is a cross-sectional view thereof taken through line 99 of FIG. 6; and,

FIG. 10 is a front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers in use.

The broken lines are shown for illustrative purposes only and form no part of the claimed design.

Sato, Izumi

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Patent Priority Assignee Title
5421595, Mar 28 1994 Motorola, Inc. Vacuum chuck with venturi jet for converting positive pressure to a vacuum
6056123, Dec 10 1997 Novus Corporation Semiconductor wafer carrier having the same composition as the wafers
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Aug 21 2009SATO, IZUMITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0231810307 pdf
Sep 02 2009Tokyo Electron Limited(assignment on the face of the patent)
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