Electrode plate for plasma processing apparatus

Abstract

Description

FIG. 1 is a front view of an electrode plate for plasma processing apparatus of the present invention.

FIG. 2 is a rear view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom view thereof.

FIG. 5 is a right side view thereof.

FIG. 6 is a left side view thereof.

FIG. 7 is a perspective view thereof.

FIG. 8 is an enlarged partial view thereof, taken at the area identified as FIG. 8 on FIG. 1.

FIG. 9 is an enlarged partial view thereof, taken at the area identified as FIG. 9 on FIG. 1.

FIG. 10 is an enlarged partial view thereof, taken at the area identified as FIG. 9 on FIG. 2;

FIG. 11 is an enlarged partial view thereof, taken at the area identified as FIG. 9 on FIG. 2;

FIG. 12 is a sectional view thereof, taken along line 12-12 of FIG. 2; and,

FIG. 13 is an enlarged partial sectional view thereof, taken at the area identified as FIG. 13 on FIG. 12.

The broken lines shown represent portions of the electrode plate for plasma processing apparatus that form no part of the claimed design. Where the dot-dash broken lines abut the shaded surface it is understood that those broken lines represent an unclaimed boundary between claimed and unclaimed surfaces. None of the broken lines form any part of the claimed design.

Claims

The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.