The ornamental design for a sealmember for semiconductorproduction apparatus, as shown and described.
1.1 : Perspective
1.2 : Front
1.3 : Back
1.4 : Left
1.5 : Right
1.6 : Top
1.7 : Bottom
1.8 : Cross-sectional
1.9 : Partial enlargement of cross-sectional view 1.8
1.10 : Reference
The present article is a seal member for semiconductor production apparatuses, such as chemical vapor deposition apparatuses and dry etching apparatuses; as illustrated in the reproduction 1.10, the article is to be inserted into the groove of a semiconductor production apparatus; the semiconductor production apparatus itself forms no part of the claimed design; the reproduction 1.8 shows a transverse cross-sectional front view taken along the horizontal center of the reproduction 1.6; and the reproduction 1.9 is an enlarged view showing a left end portion of the cross-sectional view 1.8.
The broken lines shown in Reproduction 1.10 are for the purposes of illustrating environmental structure and form no part of the claimed design.