Patent
   D914620
Priority
Jan 17 2019
Filed
Jan 17 2019
Issued
Mar 30 2021
Expiry
Mar 30 2036
Assg.orig
Entity
unknown
268
134
n/a
The ornamental design for a vented susceptor, as shown and described.

FIG. 1 is a front perspective view of a vented susceptor showing our design;

FIG. 2 is a back perspective view thereof;

FIG. 3 is a left side view thereof; and,

FIG. 4 is a right side perspective view thereof.

The even dashed circular ring that crosses the triangular panels in FIG. 1 is unclaimed, but the surrounding surface area shown in solid lines is part of the claimed design. All other even dashed broken lines in FIGS. 1-4 form no part of the claimed design.

Kim, Sam, Rokkam, Uday Kiran, Rathi, Saket, Bian, Dakai

Patent Priority Assignee Title
11164955, Jul 18 2017 ASM IP Holding B.V. Methods for forming a semiconductor device structure and related semiconductor device structures
11168395, Jun 29 2018 ASM IP Holding B.V. Temperature-controlled flange and reactor system including same
11171025, Jan 22 2019 ASM IP Holding B.V. Substrate processing device
11217444, Nov 30 2018 ASM IP HOLDING B V Method for forming an ultraviolet radiation responsive metal oxide-containing film
11222772, Dec 14 2016 ASM IP Holding B.V. Substrate processing apparatus
11227782, Jul 31 2019 ASM IP Holding B.V. Vertical batch furnace assembly
11227789, Feb 20 2019 ASM IP Holding B.V. Method and apparatus for filling a recess formed within a substrate surface
11230766, Mar 29 2018 ASM IP HOLDING B V Substrate processing apparatus and method
11232963, Oct 03 2018 ASM IP Holding B.V. Substrate processing apparatus and method
11233133, Oct 21 2015 ASM IP Holding B.V. NbMC layers
11242598, Jun 26 2015 ASM IP Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
11251035, Dec 22 2016 ASM IP Holding B.V. Method of forming a structure on a substrate
11251040, Feb 20 2019 ASM IP Holding B.V. Cyclical deposition method including treatment step and apparatus for same
11251068, Oct 19 2018 ASM IP Holding B.V. Substrate processing apparatus and substrate processing method
11270899, Jun 04 2018 ASM IP Holding B.V. Wafer handling chamber with moisture reduction
11274369, Sep 11 2018 ASM IP Holding B.V. Thin film deposition method
11282698, Jul 19 2019 ASM IP Holding B.V. Method of forming topology-controlled amorphous carbon polymer film
11286558, Aug 23 2019 ASM IP Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
11286562, Jun 08 2018 ASM IP Holding B.V. Gas-phase chemical reactor and method of using same
11289326, May 07 2019 ASM IP Holding B.V. Method for reforming amorphous carbon polymer film
11295980, Aug 30 2017 ASM IP HOLDING B V Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
11296189, Jun 21 2018 ASM IP Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
11306395, Jun 28 2017 ASM IP HOLDING B V Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
11315794, Oct 21 2019 ASM IP Holding B.V. Apparatus and methods for selectively etching films
11339476, Oct 08 2019 ASM IP Holding B.V. Substrate processing device having connection plates, substrate processing method
11342216, Feb 20 2019 ASM IP Holding B.V. Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
11345999, Jun 06 2019 ASM IP Holding B.V. Method of using a gas-phase reactor system including analyzing exhausted gas
11355338, May 10 2019 ASM IP Holding B.V. Method of depositing material onto a surface and structure formed according to the method
11361990, May 28 2018 ASM IP Holding B.V. Substrate processing method and device manufactured by using the same
11374112, Jul 19 2017 ASM IP Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
11378337, Mar 28 2019 ASM IP Holding B.V. Door opener and substrate processing apparatus provided therewith
11387106, Feb 14 2018 ASM IP Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
11387120, Sep 28 2017 ASM IP Holding B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
11390945, Jul 03 2019 ASM IP Holding B.V. Temperature control assembly for substrate processing apparatus and method of using same
11390946, Jan 17 2019 ASM IP Holding B.V. Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
11390950, Jan 10 2017 ASM IP HOLDING B V Reactor system and method to reduce residue buildup during a film deposition process
11393690, Jan 19 2018 ASM IP HOLDING B V Deposition method
11396702, Nov 15 2016 ASM IP Holding B.V. Gas supply unit and substrate processing apparatus including the gas supply unit
11398382, Mar 27 2018 ASM IP Holding B.V. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
11401605, Nov 26 2019 ASM IP Holding B.V. Substrate processing apparatus
11404302, May 22 2019 ASM IP Holding B.V. Substrate susceptor using edge purging
11410851, Feb 15 2017 ASM IP Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
11411088, Nov 16 2018 ASM IP Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
11414760, Oct 08 2018 ASM IP Holding B.V. Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same
11417545, Aug 08 2017 ASM IP Holding B.V. Radiation shield
11424119, Mar 08 2019 ASM IP HOLDING B V Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
11430640, Jul 30 2019 ASM IP Holding B.V. Substrate processing apparatus
11430674, Aug 22 2018 ASM IP Holding B.V.; ASM IP HOLDING B V Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
11437241, Apr 08 2020 ASM IP Holding B.V. Apparatus and methods for selectively etching silicon oxide films
11443926, Jul 30 2019 ASM IP Holding B.V. Substrate processing apparatus
11447861, Dec 15 2016 ASM IP HOLDING B V Sequential infiltration synthesis apparatus and a method of forming a patterned structure
11447864, Apr 19 2019 ASM IP Holding B.V. Layer forming method and apparatus
11450529, Nov 26 2019 ASM IP Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
11453943, May 25 2016 ASM IP Holding B.V.; ASM IP HOLDING B V Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
11453946, Jun 06 2019 ASM IP Holding B.V. Gas-phase reactor system including a gas detector
11469098, May 08 2018 ASM IP Holding B.V. Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
11473195, Mar 01 2018 ASM IP Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
11476109, Jun 11 2019 ASM IP Holding B.V. Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
11482412, Jan 19 2018 ASM IP HOLDING B V Method for depositing a gap-fill layer by plasma-assisted deposition
11482418, Feb 20 2018 ASM IP Holding B.V. Substrate processing method and apparatus
11482533, Feb 20 2019 ASM IP Holding B.V. Apparatus and methods for plug fill deposition in 3-D NAND applications
11488819, Dec 04 2018 ASM IP Holding B.V. Method of cleaning substrate processing apparatus
11488854, Mar 11 2020 ASM IP Holding B.V. Substrate handling device with adjustable joints
11492703, Jun 27 2018 ASM IP HOLDING B V Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
11495459, Sep 04 2019 ASM IP Holding B.V. Methods for selective deposition using a sacrificial capping layer
11499222, Jun 27 2018 ASM IP HOLDING B V Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
11499226, Nov 02 2018 ASM IP Holding B.V. Substrate supporting unit and a substrate processing device including the same
11501956, Oct 12 2012 ASM IP Holding B.V. Semiconductor reaction chamber showerhead
11501968, Nov 15 2019 ASM IP Holding B.V.; ASM IP HOLDING B V Method for providing a semiconductor device with silicon filled gaps
11501973, Jan 16 2018 ASM IP Holding B.V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
11515187, May 01 2020 ASM IP Holding B.V.; ASM IP HOLDING B V Fast FOUP swapping with a FOUP handler
11515188, May 16 2019 ASM IP Holding B.V. Wafer boat handling device, vertical batch furnace and method
11521851, Feb 03 2020 ASM IP HOLDING B V Method of forming structures including a vanadium or indium layer
11527400, Aug 23 2019 ASM IP Holding B.V. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
11527403, Dec 19 2019 ASM IP Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
11530483, Jun 21 2018 ASM IP Holding B.V. Substrate processing system
11530876, Apr 24 2020 ASM IP Holding B.V. Vertical batch furnace assembly comprising a cooling gas supply
11532757, Oct 27 2016 ASM IP Holding B.V. Deposition of charge trapping layers
11551912, Jan 20 2020 ASM IP Holding B.V. Method of forming thin film and method of modifying surface of thin film
11551925, Apr 01 2019 ASM IP Holding B.V. Method for manufacturing a semiconductor device
11557474, Jul 29 2019 ASM IP Holding B.V. Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
11562901, Sep 25 2019 ASM IP Holding B.V. Substrate processing method
11572620, Nov 06 2018 ASM IP Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
11581186, Dec 15 2016 ASM IP HOLDING B V Sequential infiltration synthesis apparatus
11581220, Aug 30 2017 ASM IP Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
11587814, Jul 31 2019 ASM IP Holding B.V. Vertical batch furnace assembly
11587815, Jul 31 2019 ASM IP Holding B.V. Vertical batch furnace assembly
11587821, Aug 08 2017 ASM IP Holding B.V. Substrate lift mechanism and reactor including same
11594450, Aug 22 2019 ASM IP HOLDING B V Method for forming a structure with a hole
11594600, Nov 05 2019 ASM IP Holding B.V. Structures with doped semiconductor layers and methods and systems for forming same
11605528, Jul 09 2019 ASM IP Holding B.V. Plasma device using coaxial waveguide, and substrate treatment method
11610774, Oct 02 2019 ASM IP Holding B.V. Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
11610775, Jul 28 2016 ASM IP HOLDING B V Method and apparatus for filling a gap
11615970, Jul 17 2019 ASM IP HOLDING B V Radical assist ignition plasma system and method
11615980, Feb 20 2019 ASM IP Holding B.V. Method and apparatus for filling a recess formed within a substrate surface
11626308, May 13 2020 ASM IP Holding B.V. Laser alignment fixture for a reactor system
11626316, Nov 20 2019 ASM IP Holding B.V. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
11629406, Mar 09 2018 ASM IP Holding B.V.; ASM IP HOLDING B V Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
11629407, Feb 22 2019 ASM IP Holding B.V. Substrate processing apparatus and method for processing substrates
11637011, Oct 16 2019 ASM IP Holding B.V. Method of topology-selective film formation of silicon oxide
11637014, Oct 17 2019 ASM IP Holding B.V. Methods for selective deposition of doped semiconductor material
11639548, Aug 21 2019 ASM IP Holding B.V. Film-forming material mixed-gas forming device and film forming device
11639811, Nov 27 2017 ASM IP HOLDING B V Apparatus including a clean mini environment
11643724, Jul 18 2019 ASM IP Holding B.V. Method of forming structures using a neutral beam
11644758, Jul 17 2020 ASM IP Holding B.V. Structures and methods for use in photolithography
11646184, Nov 29 2019 ASM IP Holding B.V. Substrate processing apparatus
11646197, Jul 03 2018 ASM IP Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
11646204, Jun 24 2020 ASM IP Holding B.V.; ASM IP HOLDING B V Method for forming a layer provided with silicon
11646205, Oct 29 2019 ASM IP Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
11649546, Jul 08 2016 ASM IP Holding B.V. Organic reactants for atomic layer deposition
11658029, Dec 14 2018 ASM IP HOLDING B V Method of forming a device structure using selective deposition of gallium nitride and system for same
11658035, Jun 30 2020 ASM IP HOLDING B V Substrate processing method
11664199, Oct 19 2018 ASM IP Holding B.V. Substrate processing apparatus and substrate processing method
11664245, Jul 16 2019 ASM IP Holding B.V. Substrate processing device
11664267, Jul 10 2019 ASM IP Holding B.V. Substrate support assembly and substrate processing device including the same
11674220, Jul 20 2020 ASM IP Holding B.V. Method for depositing molybdenum layers using an underlayer
11676812, Feb 19 2016 ASM IP Holding B.V. Method for forming silicon nitride film selectively on top/bottom portions
11680839, Aug 05 2019 ASM IP Holding B.V. Liquid level sensor for a chemical source vessel
11682572, Nov 27 2017 ASM IP Holdings B.V. Storage device for storing wafer cassettes for use with a batch furnace
11685991, Feb 14 2018 ASM IP HOLDING B V ; Universiteit Gent Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
11688603, Jul 17 2019 ASM IP Holding B.V. Methods of forming silicon germanium structures
11694892, Jul 28 2016 ASM IP Holding B.V. Method and apparatus for filling a gap
11695054, Jul 18 2017 ASM IP Holding B.V. Methods for forming a semiconductor device structure and related semiconductor device structures
11705333, May 21 2020 ASM IP Holding B.V. Structures including multiple carbon layers and methods of forming and using same
11718913, Jun 04 2018 ASM IP Holding B.V.; ASM IP HOLDING B V Gas distribution system and reactor system including same
11725277, Jul 20 2011 ASM IP HOLDING B V Pressure transmitter for a semiconductor processing environment
11725280, Aug 26 2020 ASM IP Holding B.V. Method for forming metal silicon oxide and metal silicon oxynitride layers
11735414, Feb 06 2018 ASM IP Holding B.V. Method of post-deposition treatment for silicon oxide film
11735422, Oct 10 2019 ASM IP HOLDING B V Method of forming a photoresist underlayer and structure including same
11735445, Oct 31 2018 ASM IP Holding B.V. Substrate processing apparatus for processing substrates
11742189, Mar 12 2015 ASM IP Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
11742198, Mar 08 2019 ASM IP Holding B.V. Structure including SiOCN layer and method of forming same
11746414, Jul 03 2019 ASM IP Holding B.V. Temperature control assembly for substrate processing apparatus and method of using same
11749562, Jul 08 2016 ASM IP Holding B.V. Selective deposition method to form air gaps
11764101, Oct 24 2019 ASM IP Holding, B.V. Susceptor for semiconductor substrate processing
11767589, May 29 2020 ASM IP Holding B.V. Substrate processing device
11769670, Dec 13 2018 ASM IP Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
11769682, Aug 09 2017 ASM IP Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
11776846, Feb 07 2020 ASM IP Holding B.V. Methods for depositing gap filling fluids and related systems and devices
11781221, May 07 2019 ASM IP Holding B.V. Chemical source vessel with dip tube
11781243, Feb 17 2020 ASM IP Holding B.V. Method for depositing low temperature phosphorous-doped silicon
11795545, Oct 07 2014 ASM IP Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
11798830, May 01 2020 ASM IP Holding B.V. Fast FOUP swapping with a FOUP handler
11798834, Feb 20 2019 ASM IP Holding B.V. Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
11798999, Nov 16 2018 ASM IP Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
11802338, Jul 26 2017 ASM IP Holding B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
11804364, May 19 2020 ASM IP Holding B.V. Substrate processing apparatus
11804388, Sep 11 2018 ASM IP Holding B.V. Substrate processing apparatus and method
11810788, Nov 01 2016 ASM IP Holding B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
11814715, Jun 27 2018 ASM IP Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
11814747, Apr 24 2019 ASM IP Holding B.V. Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
11821078, Apr 15 2020 ASM IP HOLDING B V Method for forming precoat film and method for forming silicon-containing film
11823866, Apr 02 2020 ASM IP Holding B.V. Thin film forming method
11823876, Sep 05 2019 ASM IP Holding B.V.; ASM IP HOLDING B V Substrate processing apparatus
11827978, Aug 23 2019 ASM IP Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
11827981, Oct 14 2020 ASM IP HOLDING B V Method of depositing material on stepped structure
11828707, Feb 04 2020 ASM IP Holding B.V. Method and apparatus for transmittance measurements of large articles
11830730, Aug 29 2017 ASM IP HOLDING B V Layer forming method and apparatus
11830738, Apr 03 2020 ASM IP Holding B.V. Method for forming barrier layer and method for manufacturing semiconductor device
11837483, Jun 04 2018 ASM IP Holding B.V. Wafer handling chamber with moisture reduction
11837494, Mar 11 2020 ASM IP Holding B.V. Substrate handling device with adjustable joints
11840761, Dec 04 2019 ASM IP Holding B.V. Substrate processing apparatus
11848200, May 08 2017 ASM IP Holding B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
11851755, Dec 15 2016 ASM IP Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
11866823, Nov 02 2018 ASM IP Holding B.V. Substrate supporting unit and a substrate processing device including the same
11873557, Oct 22 2020 ASM IP HOLDING B V Method of depositing vanadium metal
11876008, Jul 31 2019 ASM IP Holding B.V. Vertical batch furnace assembly
11876356, Mar 11 2020 ASM IP Holding B.V. Lockout tagout assembly and system and method of using same
11885013, Dec 17 2019 ASM IP Holding B.V. Method of forming vanadium nitride layer and structure including the vanadium nitride layer
11885020, Dec 22 2020 ASM IP Holding B.V. Transition metal deposition method
11885023, Oct 01 2018 ASM IP Holding B.V. Substrate retaining apparatus, system including the apparatus, and method of using same
11887857, Apr 24 2020 ASM IP Holding B.V. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
11891696, Nov 30 2020 ASM IP Holding B.V. Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
11898242, Aug 23 2019 ASM IP Holding B.V. Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
11898243, Apr 24 2020 ASM IP Holding B.V. Method of forming vanadium nitride-containing layer
11901175, Mar 08 2019 ASM IP Holding B.V. Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
11901179, Oct 28 2020 ASM IP HOLDING B V Method and device for depositing silicon onto substrates
11908684, Jun 11 2019 ASM IP Holding B.V. Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
11908733, May 28 2018 ASM IP Holding B.V. Substrate processing method and device manufactured by using the same
11915929, Nov 26 2019 ASM IP Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
11923181, Nov 29 2019 ASM IP Holding B.V. Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
11923190, Jul 03 2018 ASM IP Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
11929251, Dec 02 2019 ASM IP Holding B.V. Substrate processing apparatus having electrostatic chuck and substrate processing method
11939673, Feb 23 2018 ASM IP Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
11946137, Dec 16 2020 ASM IP HOLDING B V Runout and wobble measurement fixtures
11952658, Jun 27 2018 ASM IP Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
11956977, Dec 29 2015 ASM IP Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
11959168, Apr 29 2020 ASM IP HOLDING B V ; ASM IP Holding B.V. Solid source precursor vessel
11959171, Jan 17 2019 ASM IP Holding B.V. Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
11961741, Mar 12 2020 ASM IP Holding B.V. Method for fabricating layer structure having target topological profile
11961756, Jan 17 2019 ASM IP Holding B.V. Vented susceptor
11967488, Feb 01 2013 ASM IP Holding B.V. Method for treatment of deposition reactor
11970766, Dec 15 2016 ASM IP Holding B.V. Sequential infiltration synthesis apparatus
11972944, Jan 19 2018 ASM IP Holding B.V. Method for depositing a gap-fill layer by plasma-assisted deposition
11976359, Jan 06 2020 ASM IP Holding B.V. Gas supply assembly, components thereof, and reactor system including same
11976361, Jun 28 2017 ASM IP Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
11986868, Feb 28 2020 ASM IP Holding B.V. System dedicated for parts cleaning
11987881, May 22 2020 ASM IP Holding B.V. Apparatus for depositing thin films using hydrogen peroxide
11993847, Jan 08 2020 ASM IP HOLDING B V Injector
11996289, Apr 16 2020 ASM IP HOLDING B V Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
11996292, Oct 25 2019 ASM IP Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
11996304, Jul 16 2019 ASM IP Holding B.V. Substrate processing device
11996309, May 16 2019 ASM IP HOLDING B V ; ASM IP Holding B.V. Wafer boat handling device, vertical batch furnace and method
12055863, Jul 17 2020 ASM IP Holding B.V. Structures and methods for use in photolithography
12057314, May 15 2020 ASM IP Holding B.V. Methods for silicon germanium uniformity control using multiple precursors
12068154, Apr 13 2020 ASM IP Holding B.V. Method of forming a nitrogen-containing carbon film and system for performing the method
12074022, Aug 27 2020 ASM IP Holding B.V. Method and system for forming patterned structures using multiple patterning process
12087586, Apr 15 2020 ASM IP HOLDING B V Method of forming chromium nitride layer and structure including the chromium nitride layer
12106944, Jun 02 2020 ASM IP Holding B.V. Rotating substrate support
12106965, Feb 15 2017 ASM IP Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
12107000, Jul 10 2019 ASM IP Holding B.V. Substrate support assembly and substrate processing device including the same
12107005, Oct 06 2020 ASM IP Holding B.V. Deposition method and an apparatus for depositing a silicon-containing material
12112940, Jul 19 2019 ASM IP Holding B.V. Method of forming topology-controlled amorphous carbon polymer film
12119220, Dec 19 2019 ASM IP Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
12119228, Jan 19 2018 ASM IP Holding B.V. Deposition method
12125700, Jan 16 2020 ASM IP Holding B.V. Method of forming high aspect ratio features
12129545, Dec 22 2020 ASM IP Holding B.V. Precursor capsule, a vessel and a method
12129548, Jul 18 2019 ASM IP Holding B.V. Method of forming structures using a neutral beam
12130084, Apr 24 2020 ASM IP Holding B.V. Vertical batch furnace assembly comprising a cooling gas supply
12131885, Dec 22 2020 ASM IP Holding B.V. Plasma treatment device having matching box
12148609, Sep 16 2020 ASM IP HOLDING B V Silicon oxide deposition method
12154824, Aug 14 2020 ASM IP Holding B.V. Substrate processing method
12159788, Dec 14 2020 ASM IP Holding B.V. Method of forming structures for threshold voltage control
12169361, Jul 30 2019 ASM IP HOLDING B V Substrate processing apparatus and method
12173402, Feb 15 2018 ASM IP Holding B.V. Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
12173404, Mar 17 2020 ASM IP Holding B.V. Method of depositing epitaxial material, structure formed using the method, and system for performing the method
12176243, Feb 20 2019 ASM IP Holding B.V. Method and apparatus for filling a recess formed within a substrate surface
D940837, Aug 22 2019 ASM IP Holding B.V. Electrode
D944946, Jun 14 2019 ASM IP Holding B.V. Shower plate
D947913, May 17 2019 ASM IP Holding B.V.; ASM IP HOLDING B V Susceptor shaft
D948463, Oct 24 2018 ASM IP Holding B.V. Susceptor for semiconductor substrate supporting apparatus
D949319, Aug 22 2019 ASM IP Holding B.V. Exhaust duct
D958764, Jan 07 2019 ASM IP Holding B.V. Higher temperature vented susceptor
D965044, Aug 19 2019 ASM IP Holding B.V.; ASM IP HOLDING B V Susceptor shaft
D965524, Aug 19 2019 ASM IP Holding B.V. Susceptor support
D975665, May 17 2019 ASM IP Holding B.V. Susceptor shaft
D979506, Aug 22 2019 ASM IP Holding B.V. Insulator
D980813, May 11 2021 ASM IP HOLDING B V Gas flow control plate for substrate processing apparatus
D980814, May 11 2021 ASM IP HOLDING B V Gas distributor for substrate processing apparatus
D981973, May 11 2021 ASM IP HOLDING B V Reactor wall for substrate processing apparatus
ER1077,
ER1413,
ER1726,
ER195,
ER2810,
ER315,
ER375,
ER3883,
ER3967,
ER4264,
ER4403,
ER4489,
ER4496,
ER4646,
ER4732,
ER6015,
ER6261,
ER6328,
ER6881,
ER7009,
ER7353,
ER7365,
ER7895,
ER8714,
ER8750,
ER9386,
ER9483,
ER9931,
Patent Priority Assignee Title
3407783,
3549847,
3641974,
3796182,
4499354, Oct 06 1982 General Instrument Corporation; GENERAL SEMICONDUCTOR, INC Susceptor for radiant absorption heater system
4522149, Nov 21 1983 General Instrument Corporation; GENERAL SEMICONDUCTOR, INC Reactor and susceptor for chemical vapor deposition process
4560420, Jun 13 1984 AT&T Technologies, Inc. Method for reducing temperature variations across a semiconductor wafer during heating
4710428, Mar 10 1986 Toshiba Ceramics Co., Ltd. Sintered silicon carbide porous body impregnated with metallic silicon
4821674, Mar 31 1987 ASM America, Inc Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
4958061, Jun 27 1988 Tokyo Electron Limited Method and apparatus for heat-treating a substrate
4978567, Mar 31 1988 SGL Carbon, LLC Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
4986215, Sep 01 1988 Sumitomo Mitsubishi Silicon Corporation Susceptor for vapor-phase growth system
4990374, Nov 28 1989 Rohm and Haas Chemicals LLC Selective area chemical vapor deposition
5033407, Feb 14 1989 Anelva Corporation Low pressure vapor phase growth apparatus
5044943, Aug 16 1990 Applied Materials, Inc. Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus
5074017, Jan 13 1989 TOSHIBA CERAMICS CO , LTD Susceptor
5098198, Apr 19 1990 Applied Materials, Inc. Wafer heating and monitor module and method of operation
5108792, Mar 09 1990 Applied Materials, Inc Double-dome reactor for semiconductor processing
5119540, Jul 24 1990 Cree, Inc Apparatus for eliminating residual nitrogen contamination in epitaxial layers of silicon carbide and resulting product
5119541, Jan 28 1987 Foundation for Advancement of International Science Wafer succeptor apparatus
5121531, Jul 06 1990 Applied Materials, Inc. Refractory susceptors for epitaxial deposition apparatus
5156820, May 15 1989 STEAG CVD SYSTEMS, LTD Reaction chamber with controlled radiant energy heating and distributed reactant flow
5188501, Apr 27 1990 Shin-Etsu Handotai Co., Ltd. Wafer transfer system
5199483, May 15 1991 Applied Materials, Inc.; APPLIED MATERIALS, INC A CORP OF DELAWARE Method and apparatus for cooling wafers
5200157, Feb 17 1986 Toshiba Ceramics Co., Ltd. Susceptor for vapor-growth deposition
5242501, Sep 10 1982 Lam Research Corporation Susceptor in chemical vapor deposition reactors
5292554, Nov 12 1992 Applied Materials, Inc. Deposition apparatus using a perforated pumping plate
5298465, Aug 16 1990 Applied Materials, Inc. Plasma etching system
5304248, Dec 05 1990 Applied Materials, Inc. Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
5306699, Aug 31 1988 SUPERCONDUCTOR TECHNOLOGIES, INC , A CORP OF CALIFORNIA Reactor vessel for manufacture of superconducting films
5308645, Aug 07 1992 Delphi Technologies Inc Method and apparatus for through hole substrate printing
5332442, Nov 15 1991 Tokyo Electron Kabushiki Kaisha Surface processing apparatus
5343938, Dec 24 1992 VLSI Technology, Inc Method and apparatus for thermally insulating a wafer support
5354715, Jan 23 1991 Applied Materials, Inc. Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
5356486, Mar 04 1991 APPLIED MATERIALS, INC , Combined wafer support and temperature monitoring device
5370739, Jun 15 1992 Tokyo Electron Limited Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
5383971, Oct 12 1990 Genus, Inc. Differential pressure CVD chuck
5393349, Aug 16 1991 Tokyo Electron Limited Semiconductor wafer processing apparatus
5403401, Mar 04 1993 XYCARB B V A DUTCH CORPORATION Substrate carrier
5421893, Feb 26 1993 Applied Materials, Inc. Susceptor drive and wafer displacement mechanism
5427620, Mar 31 1987 ASM America, Inc Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
5444217, Jan 21 1993 MOORE EPITAXIAL INC Rapid thermal processing apparatus for processing semiconductor wafers
5455069, Jun 01 1992 Motorola, Inc. Method of improving layer uniformity in a CVD reactor
5456757, May 27 1993 Applied Materials, Inc Susceptor for vapor deposition
5461214, Jun 15 1992 THERMTEC, INC A CORPORATION OF CA High performance horizontal diffusion furnace system
5467220, Feb 18 1994 Applied Materials, Inc.; Applied Materials, Inc Method and apparatus for improving semiconductor wafer surface temperature uniformity
5492566, Feb 08 1993 LAM RESEARCH AG Support for disk-shaped articles using the Bernoulli principle
5514439, Oct 14 1994 COORSTEK, INC , A DELAWARE CORPORATION Wafer support fixtures for rapid thermal processing
5527393, Mar 19 1990 Kabushiki Kaisha Toshiba Vapor-phase deposition apparatus and vapor-phase deposition method
5549756, Feb 02 1994 Applied Materials, Inc.; Applied Materials, Inc Optical pyrometer for a thin film deposition system
5551985, Aug 18 1995 Applied Materials, Inc Method and apparatus for cold wall chemical vapor deposition
5558717, Nov 30 1994 Applied Materials, Inc CVD Processing chamber
5584936, Dec 14 1995 Rohm and Haas Chemicals LLC Susceptor for semiconductor wafer processing
5588827, Dec 17 1993 Brooks Automation Inc. Passive gas substrate thermal conditioning apparatus and method
5620525, Jul 16 1990 Novellus Systems, Inc Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate
5645646, Feb 25 1994 Applied Materials, Inc. Susceptor for deposition apparatus
5656093, Mar 08 1996 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
5683518, Jan 21 1993 MOORE EPITAXIAL INC Rapid thermal processing apparatus for processing semiconductor wafers
5690742, Feb 26 1996 KOMATSU ELECTRONIC METALS CO , LTD Susceptor for an epitaxial growth apparatus
5700725, Jun 26 1995 Bell Semiconductor, LLC Apparatus and method for making integrated circuits
5738165, May 07 1993 Nikon Corporation Substrate holding apparatus
5761023, Apr 25 1996 Applied Materials, Inc. Substrate support with pressure zones having reduced contact area and temperature feedback
5800622, Jul 21 1995 Mitsubishi Denki Kabushiki Kaisha Vapor-phase growth apparatus and compound semiconductor device fabricated thereby
5803977, Jun 02 1995 Applied Materials, Inc Apparatus for full wafer deposition
5834737, May 12 1995 Tokyo Electron Limited Heat treating apparatus
5895530, Feb 26 1996 Applied Materials, Inc. Method and apparatus for directing fluid through a semiconductor processing chamber
5938850, Aug 04 1995 Tokyo Electron Limited Single wafer heat treatment apparatus
5960159, Oct 14 1997 KOKUSAI ELECTRIC CO , LTD Heat treatment of semiconductor wafers where upper heater directly heats upper wafer in its entirety and lower heater directly heats lower wafer in its entirety
6001183, Jun 10 1996 Veeco Instruments INC Wafer carriers for epitaxial growth processes
6020212, Jun 09 1995 CIS Bio International Phycobiliprotein-linker peptide complex fluorescent tracer and methods of using the same
6077357, May 29 1997 Applied Materials, Inc Orientless wafer processing on an electrostatic chuck
6086680, Aug 22 1995 ASM America, Inc Low-mass susceptor
6090212, Aug 15 1997 Kokusai Semiconductor Equipment Corporation Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate
6093252, Aug 03 1995 ASM America, Inc Process chamber with inner support
6167834, Jun 13 1990 Applied Materials, Inc. Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
6293749, Nov 21 1997 ASM America, Inc Substrate transfer system for semiconductor processing equipment
6325858, Nov 03 1997 ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC Long life high temperature process chamber
6343183, Sep 01 1995 ASM America, Inc. Wafer support system
6394797, Apr 02 1997 Hitachi, Ltd. Substrate temperature control system and method for controlling temperature of substrate
6402850, Jan 13 1993 Applied Materials, Inc. Depositing polysilicon films having improved uniformity and apparatus therefor
6608287, Aug 03 1995 ASM America, Inc. Process chamber with rectangular temperature compensation ring
6634882, Dec 22 2000 ASM IP HOLDING B V Susceptor pocket profile to improve process performance
6709267, Dec 27 2002 ASM IP HOLDING B V Substrate holder with deep annular groove to prevent edge heat loss
6893507, Nov 03 1997 ASM America, Inc. Self-centering wafer support system
7033445, Dec 27 2001 ASM IP HOLDING B V Gridded susceptor
7601224, Mar 08 2002 ASM IP HOLDING B V Method of supporting a substrate in a gas cushion susceptor system
7602224, May 16 2007 Hynix Semiconductor, Inc. Semiconductor device having delay locked loop and method for driving the same
7648579, Feb 13 2004 ASM IP HOLDING B V Substrate support system for reduced autodoping and backside deposition
8088225, Feb 13 2004 ASM IP HOLDING B V Substrate support system for reduced autodoping and backside deposition
8366830, Mar 04 2003 Cree, Inc Susceptor apparatus for inverted type MOCVD reactor
8394229, Aug 07 2008 ASM IP HOLDING B V Susceptor ring
8801857, Oct 31 2008 ASM IP HOLDING B V Self-centering susceptor ring assembly
20020011211,
20030000472,
20030049580,
20040060512,
20040229002,
20050092439,
20050284372,
20060057826,
20090280248,
20100031884,
20100107974,
20130109192,
20180094350,
D404370, Aug 20 1997 Tokyo Electron Limited Cap for use in a semiconductor wafer heat processing apparatus
D496008, Dec 12 2002 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
D525127, Mar 01 2004 Societe des Produits Nestle S A Susceptor ring
D600223, Aug 07 2008 ASM IP HOLDING B V Susceptor ring
D743357, Mar 01 2013 ASM IP Holding B.V.; ASM IP HOLDING B V Susceptor
D784276, Aug 06 2013 Applied Materials, Inc Susceptor assembly
D830981, Apr 07 2017 ASM IP HOLDING B V ; ASM IP Holding B.V. Susceptor for semiconductor substrate processing apparatus
D864134, Oct 24 2018 ASM IP Holding B.V. Susceptor
EP339279,
EP445596,
EP448346,
EP634785,
EP669640,
EP766289,
EP840358,
GB2181458,
JP2000269310,
JP2002184843,
JP2002526915,
JP2003124167,
JP2006228802,
JP2007502022,
JP758039,
KR100460338,
KR1019990069084,
KR1020070098025,
WO2010016964,
WO9630713,
WO9708743,
/////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Jan 07 2019RATHI, SAKETASM IP HOLDING B V ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0482220332 pdf
Jan 10 2019BIAN, DAKAIASM IP HOLDING B V ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0482220332 pdf
Jan 11 2019ROKKAM, UDAY KIRANASM IP HOLDING B V ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0482220332 pdf
Jan 16 2019KIM, SAMASM IP HOLDING B V ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0482220332 pdf
Jan 17 2019ASM IP Holding B.V.(assignment on the face of the patent)
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule