Liquid discharge nozzle for semiconductor substrate processing apparatus

Abstract

Description

FIG. 1 a front, top perspective view of a liquid discharge nozzle for semiconductor substrate processing apparatus;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left-side elevational view thereof;

FIG. 5 is a right-side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a liquid discharge nozzle for semiconductor substrate processing apparatus, as shown and described herein.