Supply nozzle for applying liquid resist to a semiconductor wafer

Abstract

Description

FIG. 1 is a top, front and left side perspective view of supply nozzle for applying liquid resist to a semiconductor wafer showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a front elevational view thereof, the rear being a mirror image;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a cross-sectional view thereof taken on line 7--7 in FIG. 3; and,

FIG. 8 is a cross-sectional view thereof taken on line 8--8 in FIG. 2.

Claims

The ornamental design for supply nozzle for applying liquid resist to a semiconductor wafer, as shown and described.